| Review of inductively coupled plasmas: Nano-applications and bistable hysteresis physics HC Lee Applied Physics Reviews 5 (1), 2018 | 163 | 2018 |
| Effects of rf-bias power on plasma parameters in a low gas pressure inductively coupled plasma HC Lee, MH Lee, CW Chung Applied Physics Letters 96 (7), 2010 | 102 | 2010 |
| Experimental observation of the transition from nonlocal to local electron kinetics in inductively coupled plasmas HC Lee, MH Lee, CW Chung Applied Physics Letters 96 (4), 2010 | 95 | 2010 |
| Evolution of the electron energy distribution and EH mode transition in inductively coupled nitrogen plasma HC Lee, JK Lee, CW Chung Physics of Plasmas 17 (3), 2010 | 78 | 2010 |
| Collisionless electron heating by radio frequency bias in low gas pressure inductive discharge HC Lee, CW Chung Applied Physics Letters 101 (24), 2012 | 61 | 2012 |
| Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma HC Lee, JY Bang, CW Chung Thin Solid Films 519 (20), 7009-7013, 2011 | 55 | 2011 |
| Comparison of pressure dependence of electron energy distributions in oxygen capacitively and inductively coupled plasmas MH Lee, HC Lee, CW Chung Physical Review E—Statistical, Nonlinear, and Soft Matter Physics 81 (4 …, 2010 | 47 | 2010 |
| Discharge physics and atomic layer etching in Ar/C4F6 inductively coupled plasmas with a radio frequency bias MY Yoon, HJ Yeom, JH Kim, W Chegal, YJ Cho, DC Kwon, JR Jeong, ... Physics of Plasmas 28 (6), 2021 | 46 | 2021 |
| Discharge mode transition and hysteresis in inductively coupled plasma HC Lee, DH Kim, CW Chung Applied Physics Letters 102 (23), 2013 | 46 | 2013 |
| E–H mode transition in inductively coupled plasma using Ar, O2, N2, and mixture gas JK Lee, HC Lee, CW Chung Current Applied Physics 11 (5), S149-S153, 2011 | 45 | 2011 |
| Experimental measurements of spatial plasma potentials and electron energy distributions in inductively coupled plasma under weakly collisional and nonlocal electron kinetic … HC Lee, CW Chung Physics of Plasmas 19 (3), 2012 | 43 | 2012 |
| Plasma etching of the trench pattern with high aspect ratio mask under ion tilting MY Yoon, HJ Yeom, JH Kim, JR Jeong, HC Lee Applied Surface Science 595, 153462, 2022 | 38 | 2022 |
| Precise depth control and low-damage atomic-layer etching of HfO2 using BCl3 and Ar neutral beam SD Park, WS Lim, BJ Park, HC Lee, JW Bae, GY Yeom Electrochemical and Solid-State Letters 11 (4), H71, 2008 | 38 | 2008 |
| Evolution of electron temperature in inductively coupled plasma HC Lee, BH Seo, DC Kwon, JH Kim, DJ Seong, SJ Oh, CW Chung, ... Applied Physics Letters 110 (1), 2017 | 37 | 2017 |
| Effect of electron energy distribution on the hysteresis of plasma discharge: Theory, experiment and modeling HC Lee, CW Chung Scientific reports 5 (1), 15254, 2015 | 37 | 2015 |
| Experimental observation of the skin effect on plasma uniformity in inductively coupled plasmas with a radio frequency bias HC Lee, SJ Oh, CW Chung Plasma Sources Science and Technology 21 (3), 035003, 2012 | 37 | 2012 |
| Low energy electron heating and evolution of the electron energy distribution by diluted O2 in an inductive Ar/O2 mixture discharge HC Lee, MH Lee, CW Chung Physics of Plasmas 17, 013501, 2010 | 36 | 2010 |
| Effect of the surface texturing shapes fabricated using dry etching on the extraction efficiency of vertical light-emitting diodes HC Lee, JB Park, JW Bae, PTT Thuy, MC Yoo, GY Yeom Solid-state electronics 52 (8), 1193-1196, 2008 | 36 | 2008 |
| Flat cutoff probe for real-time electron density measurement in industrial plasma processing HJ Yeom, JH Kim, DH Choi, ES Choi, MY Yoon, DJ Seong, SJ You, ... Plasma Sources Science and Technology 29 (3), 035016, 2020 | 31 | 2020 |
| Effect of antenna size on electron kinetics in inductively coupled plasmas HC Lee, CW Chung Physics of Plasmas 20 (10), 2013 | 30 | 2013 |
