| A comprehensive review on convex and concave corners in silicon bulk micromachining based on anisotropic wet chemical etching P Pal, K Sato Micro and Nano Systems Letters 3, 1-42, 2015 | 137 | 2015 |
| Fabrication techniques of convex corners in a (1 0 0)-silicon wafer using bulk micromachining: a review P Pal, K Sato, S Chandra Journal of Micromechanics and Microengineering 17 (10), R111, 2007 | 130 | 2007 |
| High speed silicon wet anisotropic etching for applications in bulk micromachining: a review P Pal, V Swarnalatha, AVN Rao, AK Pandey, H Tanaka, K Sato Micro and Nano Systems Letters 9, 1-59, 2021 | 106 | 2021 |
| Various shapes of silicon freestanding microfluidic channels and microstructures in one-step lithography P Pal, K Sato Journal of Micromechanics and Microengineering 19 (5), 055003, 2009 | 90 | 2009 |
| Study of corner compensating structures and fabrication of various shapes of MEMS structures in pure and surfactant added TMAH P Pal, K Sato, M Shikida, MA Gosálvez Sensors and actuators A: Physical 154 (2), 192-203, 2009 | 87 | 2009 |
| Study of rounded concave and sharp edge convex corners undercutting in CMOS compatible anisotropic etchants P Pal, K Sato, MA Gosalvez, M Shikida Journal of Micromechanics and Microengineering 17 (11), 2299, 2007 | 86 | 2007 |
| Surfactant Adsorption on Single-Crystal Silicon Surfaces in TMAH Solution: Orientation-Dependent Adsorption Detected by In Situ Infrared Spectroscopy P Pal, K Sato, MA Gosalvez, Y Kimura, KI Ishibashi, M Niwano, H Hida, ... Journal of microelectromechanical systems 18 (6), 1345-1356, 2009 | 80 | 2009 |
| Orientation-and concentration-dependent surfactant adsorption on silicon in aqueous alkaline solutions: explaining the changes in the etch rate, roughness and undercutting for … MA Gosalvez, B Tang, P Pal, K Sato, Y Kimura, K Ishibashi Journal of Micromechanics and Microengineering 19 (12), 125011, 2009 | 76 | 2009 |
| Fabrication methods based on wet etching process for the realization of silicon MEMS structures with new shapes P Pal, K Sato Microsystem technologies 16, 1165-1174, 2010 | 73 | 2010 |
| Silicon Wet Bulk Micromachining for MEMS P Pal, K Sato Pan Stanford Publishing Pte Ltd, Singapore 1, 424, 2017 | 64 | 2017 |
| Study of structural effect on Eu-substituted LSMO manganite for high temperature coefficient of resistance S Vadnala, TD Rao, P Pal, S Asthana Physica B: Condensed Matter 448, 277-280, 2014 | 64 | 2014 |
| Interface study of bonded wafers by digitized linear frequency modulated thermal wave imaging R Mulaveesala, P Pal, S Tuli Sensors and Actuators A: Physical 128 (1), 209-216, 2006 | 60 | 2006 |
| Etching characteristics of Si {110} in 20 wt% KOH with addition of hydroxylamine for the fabrication of bulk micromachined MEMS AVN Rao, V Swarnalatha, P Pal Micro and Nano Systems Letters 5, 1-9, 2017 | 56 | 2017 |
| Complex three-dimensional structures in Si {1 0 0} using wet bulk micromachining P Pal, K Sato Journal of Micromechanics and Microengineering 19 (10), 105008, 2009 | 55 | 2009 |
| Ellipsometry study of the adsorbed surfactant thickness on Si {1 1 0} and Si {1 0 0} and the effect of pre-adsorbed surfactant layer on etching characteristics in TMAH B Tang, P Pal, MA Gosalvez, M Shikida, K Sato, H Amakawa, S Itoh Sensors and Actuators A: Physical 156 (2), 334-341, 2009 | 52 | 2009 |
| Nano-structured ZnO films by sol-gel process H Bahadur, AK Srivastava, D Haranath, H Chander, A Basu, SB Samanta, ... CSIR, 2007 | 51 | 2007 |
| Experimental procurement of the complete 3D etch rate distribution of Si in anisotropic etchants based on vertically micromachined wagon wheel samples MA Gosalvez, P Pal, N Ferrando, H Hida, K Sato Journal of Micromechanics and Microengineering 21 (12), 125007, 2011 | 50 | 2011 |
| Fabrication of novel microstructures based on orientation-dependent adsorption of surfactant molecules in a TMAH solution P Pal, K Sato, MA Gosálvez, B Tang, H Hida, M Shikida Journal of Micromechanics and Microengineering 21 (1), 015008, 2010 | 50 | 2010 |
| Silicon micromachining based on surfactant-added tetramethyl ammonium hydroxide: etching mechanism and advanced applications P Pal, MA Gosalvez, K Sato Japanese Journal of Applied Physics 49 (5R), 056702, 2010 | 44 | 2010 |
| Anisotropic etching in low‐concentration KOH: effects of surfactant concentration P Pal, A Ashok, S Haldar, Y Xing, K Sato Micro & Nano Letters 10 (4), 224-228, 2015 | 40 | 2015 |
Miguel Angel GosalvezRamón y Cajal Researcher, University of the Basque Country UPV/EHUبريد إلكتروني تم التحقق منه على ehu.es
