Следене
Dennis H. van Dorp
Dennis H. van Dorp
Principal Member of Technical Staff
Потвърден имейл адрес: imec.be
Заглавие
Позовавания
Позовавания
Година
An InGaAs/InP quantum well finfet using the replacement fin process integrated in an RMG flow on 300mm Si substrates
N Waldron, C Merckling, W Guo, P Ong, L Teugels, S Ansar, ...
2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical …, 2014
1082014
Anodic etching of n-GaN epilayer into porous GaN and its photoelectrochemical properties
WJ Tseng, DH Van Dorp, RR Lieten, PM Vereecken, G Borghs
The Journal of Physical Chemistry C 118 (51), 29492-29498, 2014
1032014
SiC: a photocathode for water splitting and hydrogen storage
DH Van Dorp, N Hijnen, M Di Vece, JJ Kelly
ANGEWANDTE CHEMIE. INTERNATIONAL EDITION 48 (33), 6085-6088, 2009
992009
Photoetching mechanisms of GaN in alkaline S2O82− solution
DH Van Dorp, JL Weyher, MR Kooijman, JJ Kelly
Journal of The Electrochemical Society 156 (10), D371, 2009
732009
Large area copper plated silicon solar cell exceeding 19.5% efficiency
L Tous, R Russell, J Das, R Labie, M Ngamo, J Horzel, H Philipsen, ...
Energy Procedia 21, 58-65, 2012
712012
The K2S2O8–KOH photoetching system for GaN
JL Weyher, FD Tichelaar, DH Van Dorp, JJ Kelly, A Khachapuridze
Journal of Crystal Growth 312 (18), 2607-2610, 2010
682010
Gate-all-around InGaAs nanowire FETS with peak transconductance of 2200μS/μm at 50nm Lg using a replacement Fin RMG flow
N Waldron, S Sioncke, J Franco, L Nyns, A Vais, X Zhou, HC Lin, ...
2015 IEEE International Electron Devices Meeting (IEDM), 31.1. 1-31.1. 4, 2015
632015
Electroless nickel deposition and silicide formation for advanced front side metallization of industrial silicon solar cells
L Tous, DH Van Dorp, R Russell, J Das, M Aleman, H Bender, ...
Energy Procedia 21, 39-46, 2012
522012
Anodic etching of SiC in alkaline solutions
DH Van Dorp, JL Weyher, JJ Kelly
Journal of micromechanics and microengineering 17 (4), S50, 2007
492007
Wet-chemical approaches for atomic layer etching of semiconductors: Surface chemistry, oxide removal and reoxidation of InAs (100)
DH van Dorp, S Arnauts, F Holsteyns, S De Gendt
ECS Journal of Solid State Science and Technology 4 (6), N5061, 2015
412015
Electrochemistry of anodic etching of 4H and 6H–SiC in fluoride solution of pH 3
DH Van Dorp, J Sattler, JH Den Otter, JJ Kelly
Electrochimica acta 54 (26), 6269-6275, 2009
402009
Photoelectrochemistry of 4H–SiC in KOH solutions
DH Van Dorp, JJ Kelly
Journal of Electroanalytical Chemistry 599 (2), 260-266, 2007
392007
Electrochemical photodegradation study of semiconductor pigments: Influence of environmental parameters
W Anaf, S Trashin, O Schalm, D van Dorp, K Janssens, K De Wael
Analytical Chemistry 86 (19), 9742-9748, 2014
362014
Study of InP surfaces after wet chemical treatments
D Cuypers, DH Van Dorp, M Tallarida, S Brizzi, T Conard, LNJ Rodriguez, ...
ECS Journal of Solid State Science and Technology 3 (1), N3016, 2013
342013
Sacrificial self-assembled monolayers for the passivation of GaAs (100) surfaces and interfaces
D Cuypers, C Fleischmann, DH van Dorp, S Brizzi, M Tallarida, M Müller, ...
Chemistry of Materials 28 (16), 5689-5701, 2016
322016
Wet chemical etching of InP for cleaning applications: I. An oxide formation/oxide dissolution model
D Cuypers, S De Gendt, S Arnauts, K Paulussen, DH van Dorp
ECS Journal of Solid State Science and Technology 2 (4), P185, 2013
272013
Scalability of InGaAs gate-all-around FET integrated on 300mm Si platform: Demonstration of channel width down to 7nm and Lg down to 36nm
X Zhou, N Waldron, G Boccardi, F Sebaai, C Merckling, G Eneman, ...
2016 IEEE Symposium on VLSI Technology, 1-2, 2016
232016
Nanoscale etching of In0. 53Ga0. 47As in H2O2/HCl solutions for advanced CMOS processing
DH van Dorp, S Arnauts, D Cuypers, J Rip, F Holsteyns, S De Gendt, ...
ECS Journal of Solid State Science and Technology 3 (6), P179, 2014
232014
Wet chemical etching of InP for cleaning applications: II. Oxide removal
DH Van Dorp, D Cuypers, S Arnauts, A Moussa, L Rodriguez, S De Gendt
ECS Journal of Solid State Science and Technology 2 (4), P190, 2013
232013
Electrochemical growth of micrometer-thick oxide on SiC in acidic fluoride solution
DH Van Dorp, ES Kooij, WM Arnoldbik, JJ Kelly
Chemistry of materials 21 (14), 3297-3305, 2009
232009
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