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Matthew Colburn
Matthew Colburn
Meta Reality Labs, Oculus Research, IBM Research, University of Texas at Austin
Correu electrònic verificat a alumni.utexas.net - Pàgina d'inici
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Step and flash imprint lithography: a new approach to high-resolution patterning
M Colburn, SC Johnson, MD Stewart, S Damle, TC Bailey, B Choi, ...
Microlithography'99, 379-389, 1999
10831999
STEP AND FLASH IMPRINT LITHOGRAPHY
CG Willson, ME Colburn
EP Patent 1,228,401, 2005
5922005
Step and flash imprint lithography
CG Willson, ME Colburn
US Patent 6,334,960, 2002
5902002
Polymer self assembly in semiconductor microelectronics
CT Black, R Ruiz, G Breyta, JY Cheng, ME Colburn, KW Guarini, HC Kim, ...
IBM Journal of Research and Development 51 (5), 605-633, 2007
5482007
Step and flash imprint lithography: Template surface treatment and defect analysis
T Bailey, BJ Choi, M Colburn, M Meissl, S Shaya, JG Ekerdt, ...
Journal of Vacuum Science & Technology B 18 (6), 3572-3577, 2000
5172000
Template for room temperature, low pressure micro-and nano-imprint lithography
T Bailey, BJ Choi, M Colburn, SV Sreenivasan, CG Willson, J Ekerdt
US Patent 6,696,220, 2004
4252004
RECOVERY OF HYDROPHOBICITY OF LOW-K AND ULTRA LOW-K ORGANOSILICATE FILMS USED AS INTER METAL DIELECTRICS
N Chakrapani, ME Colburn, CD Dimitrakopoulos, SV Nitta, D Pfeiffer, ...
EP Patent 1,812,961, 2007
4082007
Recovery of hydrophobicity of low-k and ultra low-k organosilicate films used as inter metal dielectrics
N Chakrapani, ME Colburn, CD Dimitrakopoulos, D Pfeiffer, ...
US Patent 7,687,913, 2010
4052010
Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist
JY Cheng, DP Sanders, HD Truong, S Harrer, A Friz, S Holmes, ...
Acs Nano 4 (8), 4815-4823, 2010
2862010
Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography
P Ruchhoeft, M Colburn, B Choi, H Nounu, S Johnson, T Bailey, S Damle, ...
Journal of Vacuum Science & Technology B 17 (6), 2965-2969, 1999
2151999
A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels
R Xie, P Montanini, K Akarvardar, N Tripathi, B Haran, S Johnson, T Hook, ...
2016 IEEE International Electron Devices Meeting (IEDM), 2.7. 1-2.7. 4, 2016
1932016
Design of orientation stages for step and flash imprint lithography
BJ Choi, SV Sreenivasan, S Johnson, M Colburn, CG Wilson
Precision Engineering 25 (3), 192-199, 2001
1842001
Sidewall image transfer process employing a cap material layer for a metal nitride layer
JC Arnold, SD Burns, ME Colburn, DV Horak, Y Yin
US Patent 20,120,282,779, 2012
1822012
Sidewall image transfer process employing a cap material layer for a metal nitride layer
JC Arnold, SD Burns, ME Colburn, DV Horak, Y Yin
US Patent 8,298,954, 2012
1822012
Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-b-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication
H Tsai, JW Pitera, H Miyazoe, S Bangsaruntip, SU Engelmann, CC Liu, ...
ACS nano 8 (5), 5227-5232, 2014
1812014
DSA grapho-epitaxy process with etch stop material
JA Abdallah, ME Colburn, SJ Holmes, D Kawamura, C Liu, ...
US Patent 8,859,433, 2014
1802014
Closed air gap interconnect structure
KL Saenger, M Surendra, SV Nitta, S Purushothaman, ME Colburn, ...
US Patent 7,361,991, 2008
1782008
Step and flash imprint lithography for sub-100-nm patterning
M Colburn, A Grot, MN Amistoso, BJ Choi, TC Bailey, JG Ekerdt, ...
Microlithography 2000, 453-457, 2000
1702000
Development and advantages of step-and-flash lithography
M Colburn, T Bailey, BJ Choi, JG Ekerdt, SV Sreenivasan, CG Willson
Solid State Technology 44 (7), 67-80, 2001
1692001
High-resolution overlay alignment methods for imprint lithography
SV Sreenivasan, BJ Choi, M Colburn, T Bailey
US Patent 6,921,615, 2005
1602005
En aquests moments el sistema no pot dur a terme l'operació. Torneu-ho a provar més tard.
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