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Thomas Kuech
Thomas Kuech
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Catalyst design with atomic layer deposition
BJ O’Neill, DHK Jackson, J Lee, C Canlas, PC Stair, CL Marshall, ...
Acs Catalysis 5 (3), 1804-1825, 2015
8012015
Long-Range Order in
TS Kuan, TF Kuech, WI Wang, EL Wilkie
Physical review letters 54 (3), 201, 1985
571*1985
Surface chemistry of prototypical bulk II− VI and III− V semiconductors and implications for chemical sensing
F Seker, K Meeker, TF Kuech, AB Ellis
Chemical reviews 100 (7), 2505-2536, 2000
4592000
Determination of the interdiffusion of Al and Ga in undoped (Al, Ga) As/GaAs quantum wells
TE Schlesinger, T Kuech
Applied physics letters 49 (9), 519-521, 1986
3241986
Mechanism of carbon incorporation in MOCVD GaAs
TF Kuech, E Veuhoff
Journal of Crystal Growth 68 (1), 148-156, 1984
3081984
Effects of hydrogen implantation damage on the performance of InP/InGaAs/InP pin photodiodes transferred on silicon
P Chen, WV Chen, PKL Yu, CW Tang, KM Lau, L Mawst, C Paulson, ...
Applied Physics Letters 94 (1), 2009
2592009
InP Layer Transfer with Masked Implantation
W Chen, P Bandaru, CW Tang, KM Lau, TF Kuech, SS Lau
Electrochemical and Solid-State Letters 12 (4), H149, 2009
2532009
Nonalloyed ohmic contacts to n‐GaAs by solid‐phase epitaxy of Ge
ED Marshall, B Zhang, LC Wang, PF Jiao, WX Chen, T Sawada, SS Lau, ...
Journal of applied physics 62 (3), 942-947, 1987
2481987
Stabilization of copper catalysts for liquid‐phase reactions by atomic layer deposition
BJ O'Neill, DHK Jackson, AJ Crisci, CA Farberow, F Shi, AC Alba‐Rubio, ...
Angewandte Chemie 125 (51), 14053-14057, 2013
2372013
Pressure dependence of GaAs/AlxGa1−xAs quantum‐well bound states: The determination of valence‐band offsets
DJ Wolford, TF Kuech, JA Bradley, MA Gell, D Ninno, M Jaros
Journal of Vacuum Science & Technology B: Microelectronics Processing and …, 1986
2331986
Method of making a single crystals Ga* N article
MA Tischler, TF Kuech
US Patent 5,679,152, 1997
2231997
Controlled carbon doping of GaAs by metalorganic vapor phase epitaxy
TF Kuech, MA Tischler, PJ Wang, G Scilla, R Potemski, F Cardone
Applied physics letters 53 (14), 1317-1319, 1988
2081988
High temperature adduct formation of trimethylgallium and ammonia
A Thon, TF Kuech
Applied physics letters 69 (1), 55-57, 1996
2061996
Properties of high‐purity AlxGa1−xAs grown by the metalorganic vapor‐phase‐epitaxy technique using methyl precursors
TF Kuech, DJ Wolford, E Veuhoff, V Deline, PM Mooney, R Potemski, ...
Journal of applied physics 62 (2), 632-643, 1987
1941987
Metal-organic vapor phase epitaxy of compound semiconductors
TF Kuech
Materials science reports 2 (1), 1-49, 1987
1841987
surface treatments for metal contacts
J Sun, KA Rickert, JM Redwing, AB Ellis, FJ Himpsel, TF Kuech
Applied physics letters 76 (4), 415-417, 2000
1822000
Role of the Cu-ZrO2 Interfacial Sites for Conversion of Ethanol to Ethyl Acetate and Synthesis of Methanol from CO2 and H2
I Ro, Y Liu, MR Ball, DHK Jackson, JP Chada, C Sener, TF Kuech, ...
ACS Catalysis 6 (10), 7040-7050, 2016
1772016
Dependence of the AlxGa1− xAs band edge on alloy composition based on the absolute measurement of x
TF Kuech, DJ Wolford, R Potemski, JA Bradley, KH Kelleher, D Yan, ...
Applied physics letters 51 (7), 505-507, 1987
1771987
The influence of growth chemistry on the MOVPE growth of GaAs and AlxGa1− xAs layers and heterostructures
TF Kuech, E Veuhoff, TS Kuan, V Deline, R Potemski
journal of crystal growth 77 (1-3), 257-271, 1986
1771986
Ionic conductivity of calcia, yttria, and rare earth‐doped cerium dioxide
RT Dirstine, RN Blumenthal, TF Kuech
Journal of the electrochemical society 126 (2), 264, 1979
1701979
En aquests moments el sistema no pot dur a terme l'operació. Torneu-ho a provar més tard.
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