| Resistive switching mechanism of TiO2 thin films grown by atomic-layer deposition BJ Choi, DS Jeong, SK Kim, C Rohde, S Choi, JH Oh, HJ Kim, CS Hwang, ... Journal of applied physics 98 (3), 2005 | 1499 | 2005 |
| High dielectric constant TiO2 thin films on a Ru electrode grown at 250 C by atomic-layer deposition SK Kim, WD Kim, KM Kim, CS Hwang, J Jeong Applied Physics Letters 85 (18), 4112-4114, 2004 | 415 | 2004 |
| Al‐Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors SK Kim, GJ Choi, SY Lee, M Seo, SW Lee, JH Han, HS Ahn, S Han, ... Advanced Materials 20 (8), 1429-1435, 2008 | 357 | 2008 |
| First-principles study of point defects in rutile E Cho, S Han, HS Ahn, KR Lee, SK Kim, CS Hwang Physical Review B—Condensed Matter and Materials Physics 73 (19), 193202, 2006 | 277 | 2006 |
| Capacitors with an equivalent oxide thickness of< 0.5 nm for nanoscale electronic semiconductor memory SK Kim, SW Lee, JH Han, B Lee, S Han, CS Hwang Advanced Functional Materials 20 (18), 2989-3003, 2010 | 263 | 2010 |
| Atomic Layer Deposition for Semiconductors CS Hwang Atomic Layer Deposition for Semiconductors, E1-E1, 2014 | 224 | 2014 |
| Low temperature (< 100 C) deposition of aluminum oxide thin films by ALD with O3 as oxidant SK Kim, SW Lee, CS Hwang, YS Min, JY Won, J Jeong Journal of The Electrochemical Society 153 (5), F69, 2006 | 213 | 2006 |
| Comparison between ZnO films grown by atomic layer deposition using H2O or O3 as oxidant SK Kim, CS Hwang, SHK Park, SJ Yun Thin Solid Films 478 (1-2), 103-108, 2005 | 209 | 2005 |
| Wafer-scale growth of MoS 2 thin films by atomic layer deposition JJ Pyeon, SH Kim, DS Jeong, SH Baek, CY Kang, JS Kim, SK Kim Nanoscale 8 (20), 10792-10798, 2016 | 176 | 2016 |
| Atomic Layer Deposition of SrTiO3 Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors SW Lee, JH Han, S Han, W Lee, JH Jang, M Seo, SK Kim, C Dussarrat, ... Chemistry of Materials 23 (8), 2227-2236, 2011 | 164 | 2011 |
| Giant electrode effect on tunnelling electroresistance in ferroelectric tunnel junctions R Soni, A Petraru, P Meuffels, O Vavra, M Ziegler, SK Kim, DS Jeong, ... Nature Communications 5 (1), 5414, 2014 | 148 | 2014 |
| Future of dynamic random-access memory as main memory SK Kim, M Popovici MRS Bulletin 43 (5), 334-339, 2018 | 137 | 2018 |
| Atomic layer deposition of Ru thin films using 2, 4-(dimethylpentadienyl)(ethylcyclopentadienyl) Ru by a liquid injection system SK Kim, SY Lee, SW Lee, GW Hwang, CS Hwang, JW Lee, J Jeong Journal of The Electrochemical Society 154 (2), D95, 2007 | 120 | 2007 |
| Titanium dioxide thin films for next-generation memory devices SK Kim, KM Kim, DS Jeong, W Jeon, KJ Yoon, CS Hwang Journal of Materials Research 28 (3), 313, 2013 | 119 | 2013 |
| Plasma-enhanced atomic layer deposition of TiO2 and Al-doped TiO2 films using N2O and O2 reactants GJ Choi, SK Kim, SJ Won, HJ Kim, CS Hwang Journal of the Electrochemical Society 156 (9), G138, 2009 | 108 | 2009 |
| Fabrication of high-performance p-type thin film transistors using atomic-layer-deposited SnO films SH Kim, IH Baek, DH Kim, JJ Pyeon, TM Chung, SH Baek, JS Kim, ... Journal of Materials Chemistry C 5 (12), 3139-3145, 2017 | 105 | 2017 |
| Growth of p-Type Tin(II) Monoxide Thin Films by Atomic Layer Deposition from Bis(1-dimethylamino-2-methyl-2propoxy)tin and H2O JH Han, YJ Chung, BK Park, SK Kim, HS Kim, CG Kim, TM Chung Chemistry of Materials 26 (21), 6088-6091, 2014 | 98 | 2014 |
| Investigation on the growth initiation of Ru thin films by atomic layer deposition SK Kim, JH Han, GH Kim, CS Hwang Chemistry of materials 22 (9), 2850-2856, 2010 | 97 | 2010 |
| Interfacial control of oxygen vacancy doping and electrical conduction in thin film oxide heterostructures BW Veal, SK Kim, P Zapol, H Iddir, PM Baldo, JA Eastman Nature communications 7 (1), 11892, 2016 | 94 | 2016 |
| Growth Behavior of Al-Doped TiO2 Thin Films by Atomic Layer Deposition SK Kim, GJ Choi, JH Kim, CS Hwang Chemistry of Materials 20 (11), 3723-3727, 2008 | 93 | 2008 |
Seung Hyub BaekKorea Institute of Science and Technology (KIST)E-mailová adresa ověřena na: kist.re.kr