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Jaewook Lee
Jaewook Lee
E-mailová adresa ověřena na: snu.ac.kr
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Citace
Citace
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Role of oxygen vacancies in ferroelectric or resistive switching hafnium oxide
J Lee, K Yang, JY Kwon, JE Kim, DI Han, DH Lee, JH Yoon, MH Park
Nano Convergence 10 (1), 55, 2023
472023
Mitigation of field-driven dynamic phase evolution in ferroelectric Hf0. 5Zr0. 5O2 films by adopting oxygen-supplying electrode
Y Lee, SH Kim, HW Jeong, GH Park, J Lee, YY Kim, MH Park
Applied Surface Science 648, 158948, 2024
132024
A perspective on the physical scaling down of hafnia-based ferroelectrics
JY Park, DH Lee, GH Park, J Lee, Y Lee, MH Park
Nanotechnology 34 (20), 202001, 2023
132023
Effect of Electrode Material on the Polarization Switching Kinetics of Hf0.5Zr0.5O2 Film
DH Lee, GH Park, SH Kim, K Yang, J Lee, H Choi, Y Lee, JJ Ryu, JI Lee, ...
IEEE Electron Device Letters 44 (9), 1440-1443, 2023
62023
Ferroelectricity of Hf0.5Zr0.5O2 Thin Film Induced at 350°C by Thermally Accelerated Nucleation During Atomic Layer Deposition
J Lee, SH Kim, H Choi, HW Jeong, K Yang, JY Park, YH Cho, SY Park, ...
IEEE Transactions on Electron Devices 71 (4), 2690-2695, 2024
12024
Texture modulation of ferroelectric Hf0. 5Zr0. 5O2 thin films by engineering the polymorphism and texture of tungsten electrodes
K Yang, HW Jeong, J Lee, YH Cho, JY Park, H Choi, YY Kim, Y Lee, ...
Journal of Materiomics, 101015, 2025
2025
An Investigation on the Low Voltage Ferroelectric Hf0.5Zr0.5O2 Capacitor Deposited on Phase-Controlled W Electrode
K Yang, HW Jeong, JY Park, J Lee, H Choi, Y Lee, MH Park
Electrochemical Society Meeting Abstracts prime2024, 2465-2465, 2024
2024
Exploring the role of TiN electrodes in the formation of ferroelectric HfxZr1-xO2 thin films through transmission electron microscopy
S Kim, J Lee, JH Seo, J Hong, JH Kwon, MH Park, SY Lee
Journal of the Korean Ceramic Society 61 (2), 327-334, 2024
2024
Low thermal budget HZO thin film by controlling deposition temperature
J Lee, SH Kim, K Yang, HW Jeong, JY Park, MH Park
한국표면공학회 학술발표회 초록집, 220-220, 2023
2023
Systém momentálně nemůže danou operaci provést. Zkuste to znovu později.
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