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Seungwoo Lee
Seungwoo Lee
POSTECH, Korea
E-mailová adresa ověřena na: postech.ac.kr
Název
Citace
Citace
Rok
Deep Insight into Steep‐Slope Threshold Switching with Record Selectivity (>4 × 1010) Controlled by Metal‐Ion Movement through Vacancy‐Induced‐Percolation …
W Banerjee, SH Kim, S Lee, S Lee, D Lee, H Hwang
Advanced Functional Materials 31 (37), 2104054, 2021
512021
An efficient approach based on tuned nanoionics to maximize memory characteristics in Ag‐based devices
W Banerjee, SH Kim, S Lee, D Lee, H Hwang
Advanced Electronic Materials 7 (4), 2100022, 2021
372021
Improved Threshold Switching and Endurance Characteristics Using Controlled Atomic‐Scale Switching in a 0.5 nm Thick Stoichiometric HfO2 Layer
S Lee, W Banerjee, S Lee, C Sung, H Hwang
Advanced Electronic Materials 7 (2), 2000869, 2021
262021
Highly-stable (< 3% fluctuation) Ag-based threshold switch with extreme-low OFF current of 0.1 pA, extreme-high selectivity of 10 9 and high endurance of 10 9 cycles
W Banerjee, IV Karpov, A Agrawal, S Kim, S Lee, S Lee, D Lee, H Hwang
2020 IEEE International Electron Devices Meeting (IEDM), 28.4. 1-28.4. 4, 2020
232020
Hardware neural network using hybrid synapses via transfer learning: WOx nano-resistors and TiOx RRAM synapse for energy-efficient edge-AI sensor
W Choi, M Kwak, S Heo, K Lee, S Lee, H Hwang
2021 IEEE International Electron Devices Meeting (IEDM), 23.1. 1-23.1. 4, 2021
132021
High-Speed Ternary CMOS Inverter by Monolithic Integration of NbO2 Threshold Switch with MOSFET
S Heo, J Lee, S Lee, S Lee, C Lee, RH Baek, H Hwang
2021 IEEE International Electron Devices Meeting (IEDM), 32.2. 1-32.2. 4, 2021
102021
Effect of the Oxygen Composition Control of HfOx Films on Threshold and Memory Switching Characteristics for Hybrid Memory Applications
S Lee, SH Kim, S Oh, D Lee, H Hwang
Advanced Electronic Materials 8 (5), 2101257, 2022
42022
Improved turn-off speed and uniformity of atomic threshold switch device by AgSe electrode and bipolar pulse forming
S Oh, S Lee, H Hwang
IEEE Journal of the Electron Devices Society 9, 864-867, 2021
42021
Two-step deposition of TiN capping electrodes to prevent degradation of ferroelectric properties in an in-situ crystallized TiN/Hf0. 5Zr0. 5O2/TiN device
H Kim, A Kashir, H Jang, S Oh, M Yadav, S Lee, H Hwang
Nano Express 3 (1), 015004, 2022
32022
Strategies for ultra-fast bit generation of two-terminal threshold switch-based true random number generator using drift-free Ge-doped SiO2 threshold switch device
S Lee
Solid-State Electronics 201, 108609, 2023
22023
Vacuum gap atomic switch with improved controllability of quantized conduction states and low transition energy
S Lee, S Lee, H Hwang
AIP Advances 13 (2), 2023
2023
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Články 1–11