| High-power EUV lithography: spectral purity and imaging performance M van de Kerkhof, F Liu, M Meeuwissen, X Zhang, M Bayraktar, R de Kruif, ... Journal of micro/nanolithography, MEMS, and MOEMS 19 (3), 033801-033801, 2020 | 38 | 2020 |
| Spectral characterization of an industrial EUV light source for nanolithography F Torretti, F Liu, M Bayraktar, J Scheers, Z Bouza, W Ubachs, R Hoekstra, ... Journal of physics D: applied physics 53 (5), 055204, 2019 | 29 | 2019 |
| Spectral purity performance of high-power EUV systems M van de Kerkhof, F Liu, M Meeuwissen, X Zhang, R de Kruif, ... Extreme Ultraviolet (EUV) Lithography XI 11323, 435-450, 2020 | 9 | 2020 |
| Spatial-dependent simulation of TEA CO2 lasers J Rothe, F Liu, R Horton, R Evans, DQ Hwang Optik 125 (6), 1756-1760, 2014 | 5 | 2014 |
| Laser-driven beat-wave current drive in an unmagnetized plasma F Liu, R Horton, DQ Hwang, R Evans, ZF Huang, A Semet 38th European Physical Society Conf. Plasma Physics, Strasbourg, France, 2011 | 5 | 2011 |
| Prolonging optical element lifetime in an EUV lithography system Y Ma, ATW Kempen, KM Hummler, JHJ Moors, JH Rommers, ... US Patent 11,340,532, 2022 | 4 | 2022 |
| Lithography machine in-line broadband spectrum metrology F Liu, F van de Wetering, M Bayraktar, F Bijkerk, D Smeets, S Huang, Y Ni, ... P43), EUVL Workshop, 2019 | 3 | 2019 |
| Experimental research of a multipass transverse excitation atmospheric-pressure laser F Liu, J Rothe, R Horton, A Semet, R Evans, DQ Hwang Optical Engineering 52 (4), 049701-049701, 2013 | 3 | 2013 |
| High-speed analog fiber-optic link for electromagnetic interference suppression in infrared power measurement F Liu, S Strauch, R Horton, R Evans, D Hwang Review of Scientific Instruments 82 (8), 2011 | 3 | 2011 |
| Experimental verification of high-NA imaging simulations using SHARP N Davydova, F Liu, M Benk, E van Setten, G Bottiglieri, A van Oosten, ... Extreme Ultraviolet Lithography 2020 11517, 76-90, 2020 | 2 | 2020 |
| Optical beat-wave experiment on CTIX R Horton, D Hwang, F Liu, B Zhu, R Evans APS Division of Plasma Physics Meeting Abstracts 51, UP8. 031, 2009 | 1 | 2009 |
| Prolonging optical element lifetime in an euv lithography system Y Ma, ATW Kempen, KM Hummler, JHJ Moors, JH Rommers, ... US Patent App. 18/508,987, 2024 | | 2024 |
| Prolonging optical element lifetime in an EUV lithography system Y Ma, ATW Kempen, KM Hummler, JHJ Moors, JH Rommers, ... US Patent 11,846,887, 2023 | | 2023 |
| EUV Source Metrology M Bayraktar, F Liu, O Versolato, F Bijkerk This book is dedicated to the scientists and engineers who have believed in …, 2023 | | 2023 |
| Prolonging optical element lifetime in an EUV lithography system WO Patent WO/2019/170,503, 2019 | | 2019 |
| EUV full-band spectrum and DUV/EUV ratio dependency on source operating conditions F Liu, M Bayraktar, JK Lim, F Bijkerk, P Havermans, B Claes 20th ASML Technology Conference 2019, 2019 | | 2019 |
| Monitoring EUV and DUV spectral emission ratios of a high power EUVL source M Bayraktar, F Liu, HMJ Bastiaens, C Bruineman, B Vratzov, F Bijkerk 2018 Source Workshop, 2018 | | 2018 |
| Source plasma emission spectrum under various operating conditions F Liu, M Bayraktar, T Goossens, F Bijkerk, JQ Ramirez, T Beenhakker 19th ASML Technology Conference 2018, 2018 | | 2018 |
| Broadband spectrometer development based on high-density free-standing transmission gratings M Bayraktar, F Liu, HMJ Bastiaens, C Bruineman, B Vratzov, F Bijkerk 304. PTB-Seminar VUV and EUV Metrology, 2017 | | 2017 |
| EUV source spectroscopic measurement F Liu, M Bayraktar, O Frijns, F Bijkerk, T Goossens, J Rommers 18th ASML Technology Conference 2017, 2017 | | 2017 |
Muharrem BayraktarAssistant Professor, University of TwenteE-mailová adresa ověřena na: utwente.nl
