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Fida Ali
Fida Ali
Department of Electronics and Nanoengineering Aalto University, Finland
Bestätigte E-Mail-Adresse bei aalto.fi - Startseite
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Zitiert von
Zitiert von
Jahr
Electrical characterization of 2D materials-based field-effect transistors
SB Mitta, MS Choi, A Nipane, F Ali, C Kim, JT Teherani, J Hone, WJ Yoo
2D Materials 8 (1), 012002, 2020
1802020
Resonant tunnelling diodes based on twisted black phosphorus homostructures
PK Srivastava, Y Hassan, DJP de Sousa, Y Gebredingle, M Joe, F Ali, ...
Nature Electronics 4 (4), 269-276, 2021
562021
Gate-Modulated Ultrasensitive Visible and Near-Infrared Photodetection of Oxygen Plasma-Treated WSe2 Lateral pn-Homojunctions
SB Mitta, F Ali, Z Yang, I Moon, F Ahmed, TJ Yoo, BH Lee, WJ Yoo
ACS Applied Materials & Interfaces 12 (20), 23261-23271, 2020
512020
Dielectric dispersion and high field response of multilayer hexagonal boron nitride
F Ahmed, S Heo, Z Yang, F Ali, CH Ra, HI Lee, T Taniguchi, J Hone, ...
Advanced Functional Materials 28 (40), 1804235, 2018
502018
Fermi‐level pinning free high‐performance 2D CMOS inverter fabricated with van der Waals bottom contacts
TD Ngo, Z Yang, M Lee, F Ali, I Moon, DG Kim, T Taniguchi, K Watanabe, ...
Advanced Electronic Materials 7 (5), 2001212, 2021
492021
Control of the Schottky Barrier and Contact Resistance at Metal–WSe2 Interfaces by Polymeric Doping
TD Ngo, M Lee, Z Yang, F Ali, I Moon, WJ Yoo
Advanced Electronic Materials 6 (10), 2000616, 2020
332020
Phase-engineered molybdenum telluride/black phosphorus Van der Waals heterojunctions for tunable multivalued logic
Y Hassan, PK Srivastava, B Singh, MS Abbas, F Ali, WJ Yoo, C Lee
ACS Applied Materials & Interfaces 12 (12), 14119-14124, 2020
292020
Selective Electron Beam Patterning of Oxygen‐Doped WSe2 for Seamless Lateral Junction Transistors
TD Ngo, MS Choi, M Lee, F Ali, Y Hassan, N Ali, S Liu, C Lee, J Hone, ...
Advanced Science 9 (26), 2202465, 2022
252022
Traps at the hBN/WSe2 interface and their impact on polarity transition in WSe2
F Ali, F Ahmed, M Taqi, SB Mitta, TD Ngo, DJ Eom, K Watanabe, ...
2D Materials 8 (3), 035027, 2021
252021
Energy dissipation in black phosphorus heterostructured devices
F Ali, F Ahmed, Z Yang, I Moon, M Lee, Y Hassan, C Lee, WJ Yoo
Advanced Materials Interfaces 6 (2), 1801528, 2019
172019
Anomalously persistent p-type behavior of WSe 2 field-effect transistors by oxidized edge-induced Fermi-level pinning
TD Ngo, MS Choi, M Lee, F Ali, WJ Yoo
Journal of Materials Chemistry C 10 (3), 846-853, 2022
142022
Metal–Insulator Transition Driven by Traps in 2D WSe2 Field‐Effect Transistor
F Ali, N Ali, M Taqi, TD Ngo, M Lee, H Choi, WK Park, E Hwang, WJ Yoo
Advanced Electronic Materials 8 (9), 2200046, 2022
132022
Strain Engineering for Enhancing Carrier Mobility in MoTe2 Field‐Effect Transistors
AM Shafi, MG Uddin, X Cui, F Ali, F Ahmed, M Radwan, S Das, ...
Advanced Science 10 (29), 2303437, 2023
122023
Modulation of Contact Resistance of Dual‐Gated MoS2 FETs Using Fermi‐Level Pinning‐Free Antimony Semi‐Metal Contacts
TD Ngo, T Huynh, H Jung, F Ali, J Jeon, MS Choi, WJ Yoo
Advanced Science 10 (21), 2301400, 2023
112023
Self‐Powered 2D MoS2/WOx/WSe2 Heterojunction Photodetector Realized by Oxygen Plasma Treatment
H Shin, M Taqi, F Ali, S Lee, MS Choi, C Kim, BH Lee, X Liu, J Sun, B Oh, ...
Advanced Materials Interfaces 9 (32), 2201785, 2022
92022
Ultrahigh anisotropic transport properties of black phosphorus field effect transistors realized by edge contact
M Lee, N Ali, F Ali, K Watanabe, T Taniguchi, WJ Yoo
Advanced Electronic Materials 8 (3), 2100988, 2022
92022
Broadening spectral responses and achieving environmental stability in SnS 2/Ag-NPs/HfO 2 flexible phototransistors
MF Khan, S Sadaqat, MA Khan, S Rehman, WS Subhani, M Ouladsmane, ...
Nanoscale 16 (7), 3622-3630, 2024
62024
Probing Intrinsic Defect-Induced Trap States and Hopping Transport in Two-Dimensional PdSe2 Semiconductor Devices
Z Wang, N Ali, F Ali, H Choi, H Shin, WJ Yoo
ACS Applied Materials & Interfaces 14 (50), 55787-55794, 2022
52022
Percolation-Based Metal–Insulator Transition in Black Phosphorus Field Effect Transistors
N Ali, M Lee, F Ali, TD Ngo, H Park, H Shin, WJ Yoo
ACS Applied Materials & Interfaces 15 (10), 13299-13306, 2023
32023
Interface state density and barrier height improvement in ammonium sulfide treated Al2O3/Si interfaces
K Agrawal, V Patil, F Ali, M Rabelo, WJ Yoo, EC Cho, J Yi
Current Applied Physics 26, 83-89, 2021
32021
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