| Multiple spacer steps for pitch multiplication S Sant, G Sandhu, NR Rueger US Patent 7,560,390, 2009 | 278 | 2009 |
| Waferless auto conditioning J Guha, S Sant, B Jinnai US Patent 8,784,676, 2014 | 227 | 2014 |
| Deposition and patterning of diamondlike carbon as antiwear nanoimprint templates S Ramachandran, L Tao, TH Lee, S Sant, LJ Overzet, MJ Goeckner, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006 | 48 | 2006 |
| Inductively coupled dual zone processing chamber with single planar antenna SP Sant US Patent 7,972,471, 2011 | 29 | 2011 |
| Effect of surface temperature on plasma-surface interactions in an inductively coupled modified gaseous electronics conference reactor B Zhou, EA Joseph, SP Sant, Y Liu, A Radhakrishnan, LJ Overzet, ... Journal of Vacuum Science & Technology A 23 (6), 1657-1667, 2005 | 26 | 2005 |
| Plasma detection and associated systems and methods for controlling microfeature workpiece deposition processes N Sant, SanketRueger US Patent App. 11/043,629, 2006 | 24* | 2006 |
| Multiple spacer steps for pitch multiplication S Sant, GS Sandhu, NR Rueger US Patent 8,003,542, 2011 | 22 | 2011 |
| Method and apparatus of halogen removal H Singh, S Sant, SI Chou, V Vahedi, R Casaes, S Ramachandran US Patent 8,525,139, 2013 | 21 | 2013 |
| Investigation and modeling of plasma-wall interactions in inductively coupled fluorocarbon plasmas EA Joseph, B Zhou, SP Sant, LJ Overzet, MJ Goeckner Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 22 (3 …, 2004 | 19 | 2004 |
| Edge ring assembly for plasma processing chamber and method of manufacture thereof SP Sant, RG O'neill US Patent App. 13/562,675, 2014 | 15 | 2014 |
| Surface kinetics with low ion energy bombardment in fluorocarbon plasmas CT Nelson, SP Sant, LJ Overzet, MJ Goeckner Plasma Sources Science and Technology 16 (4), 813, 2007 | 15 | 2007 |
| Plasma etching device with plasma etch resistant coating S Sant US Patent App. 15/158,397, 2016 | 14 | 2016 |
| Method for positioning spacers in pitch multiplication S Sant, G Sandhu, NR Rueger US Patent 8,865,598, 2014 | 10 | 2014 |
| Method and apparatus of halogen removal using optimal ozone and UV exposure S Sant, SI Chou US Patent 8,232,538, 2012 | 10 | 2012 |
| Relationship between gas-phase chemistries and surface processes in fluorocarbon etch plasmas: A process rate model SP Sant, CT Nelson, LJ Overzet, MJ Goeckner Journal of Vacuum Science & Technology A 27 (4), 631-642, 2009 | 10 | 2009 |
| Method for positioning spacers in pitch multiplication S Sant, G Sandhu, NR Rueger US Patent 8,598,041, 2013 | 9 | 2013 |
| Method for positioning spacers for pitch multiplication S Sant, G Sandhu, NR Rueger US Patent 8,173,550, 2012 | 9 | 2012 |
| Chemistry in long residence time fluorocarbon plasmas SP Sant, CT Nelson, LJ Overzet, MJ Goeckner Journal of Vacuum Science & Technology A 27 (2), 193-208, 2009 | 8 | 2009 |
| Role of chamber dimension in fluorocarbon based deposition and etching of SiO2 and its effects on gas and surface-phase chemistry EA Joseph, BS Zhou, SP Sant, LJ Overzet, MJ Goeckner Journal of Vacuum Science & Technology A 26 (3), 545-554, 2008 | 7 | 2008 |
| Method for positioning spacers in pitch multiplication S Sant, G Sandhu, NR Rueger US Patent 9,117,766, 2015 | 6 | 2015 |
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