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Xiuguo Chen (陈修国)
Xiuguo Chen (陈修国)
Bestätigte E-Mail-Adresse bei hust.edu.cn
Titel
Zitiert von
Zitiert von
Jahr
(Invited review) Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology
S Liu, X Chen, C Zhang
Thin Solid Films 584, 176-185, 2015
1592015
An insight into optical metrology in manufacturing
Y Shimizu, LC Chen, DW Kim, X Chen, X Li, H Matsukuma
Measurement Science and Technology 32 (4), 042003, 2021
1162021
Layer-dependent dielectric and optical properties of centimeter-scale 2D WSe 2: evolution from a single layer to few layers
H Gu, B Song, M Fang, Y Hong, X Chen, H Jiang, W Ren, S Liu
Nanoscale 11 (47), 22762-22771, 2019
952019
Broadband optical properties of graphene and HOPG investigated by spectroscopic Mueller matrix ellipsometry
B Song, H Gu, S Zhu, H Jiang, X Chen, C Zhang, S Liu
Applied Surface Science 439, 1079-1087, 2018
942018
Layer‐Dependent Dielectric Function of Wafer‐Scale 2D MoS2
B Song, H Gu, M Fang, X Chen, H Jiang, R Wang, T Zhai, YT Ho, S Liu
Advanced Optical Materials 7 (2), 1801250, 2019
882019
Mueller matrix imaging ellipsometry for nanostructure metrology
S Liu, W Du, X Chen, H Jiang, C Zhang
Optics Express 23 (13), 17316-17329, 2015
732015
Optimal broadband Mueller matrix ellipsometer using multi-waveplates with flexibly oriented axes
H Gu, X Chen, H Jiang, C Zhang, S Liu
Journal of Optics 18 (2), 025702, 2016
672016
Ultrathin polymer nanofibrils for solar-blind deep ultraviolet light photodetectors application
LZ Qiu, SY Wei, HS Xu, ZX Zhang, ZY Guo, XG Chen, SY Liu, D Wu, ...
Nano Letters 20 (1), 644-651, 2019
522019
Estimation of the convergence order of rigorous coupled-wave analysis for binary gratings in optical critical dimension metrology
S Liu, Y Ma, X Chen, C Zhang
Optical Engineering 51 (8), 081504-081504, 2012
482012
Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometry
X Chen, S Liu, C Zhang, H Jiang, Z Ma, T Sun, Z Xu
Optics Express 22 (12), 15165-15177, 2014
472014
Layer-dependent dielectric permittivity of topological insulator Bi2Se3 thin films
M Fang, Z Wang, H Gu, M Tong, B Song, X Xie, T Zhou, X Chen, H Jiang, ...
Applied Surface Science 509, 144822, 2020
462020
Complex Optical Conductivity of Two-Dimensional MoS2: A Striking Layer Dependency
B Song, H Gu, M Fang, YT Ho, X Chen, H Jiang, S Liu
The Journal of Physical Chemistry Letters 10 (20), 6246-6252, 2019
452019
Laser autocollimation based on an optical frequency comb for absolute angular position measurement
YL Chen, Y Shimizu, J Tamada, K Nakamura, H Matsukuma, X Chen, ...
Precision Engineering 54, 284-293, 2018
442018
Depolarization artifacts in dual rotating-compensator Mueller matrix ellipsometry
W Li, C Zhang, H Jiang, X Chen, S Liu
Journal of Optics 18 (5), 055701, 2016
402016
Measurement configuration optimization for accurate grating reconstruction by Mueller matrix polarimetry
X Chen, S Liu, C Zhang, H Jiang
Journal of Micro/Nanolithography, MEMS, and MOEMS 12 (3), 033013-033013, 2013
392013
Complete Dielectric Tensor and Giant Optical Anisotropy in Quasi-One-Dimensional ZrTe5
Z Guo, H Gu, M Fang, B Song, W Wang, X Chen, C Zhang, H Jiang, ...
ACS Materials Letters 3 (5), 525-534, 2021
382021
A chromatic confocal probe with a mode-locked femtosecond laser source
X Chen, T Nakamura, Y Shimizu, C Chen, YL Chen, H Matsukuma, ...
Optics & Laser Technology 103, 359-366, 2018
382018
Improved measurement accuracy in optical scatterometry using correction-based library search
X Chen, S Liu, C Zhang, H Jiang
Applied optics 52 (27), 6726-6734, 2013
382013
Study of the retardance of a birefringent waveplate at tilt incidence by Mueller matrix ellipsometer
H Gu, X Chen, C Zhang, H Jiang, S Liu
Journal of Optics 20 (1), 015401, 2017
372017
Depolarization effects from nanoimprinted grating structures as measured by Mueller matrix polarimetry
X Chen, C Zhang, S Liu
Applied Physics Letters 103 (15), 2013
352013
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