Folgen
Khaled Hassouni
Khaled Hassouni
LSPM, CNRS-UPR 3407, Université Paris 13
Bestätigte E-Mail-Adresse bei lspm.cnrs.fr
Titel
Zitiert von
Zitiert von
Jahr
CVD diamond films: from growth to applications
A Gicquel, K Hassouni, F Silva, J Achard
Current Applied Physics 1 (6), 479-496, 2001
2882001
High quality MPACVD diamond single crystal growth: high microwave power density regime
J Achard, F Silva, A Tallaire, X Bonnin, G Lombardi, K Hassouni, ...
Journal of Physics D: Applied Physics 40 (20), 6175, 2007
2182007
Microwave engineering of plasma-assisted CVD reactors for diamond deposition
F Silva, K Hassouni, X Bonnin, A Gicquel
Journal of physics: condensed matter 21 (36), 364202, 2009
2102009
Self-consistent microwave field and plasma discharge simulations for a moderate pressure hydrogen discharge reactor
K Hassouni, TA Grotjohn, A Gicquel
Journal of Applied Physics 86 (1), 134-151, 1999
1871999
Modelling of diamond deposition microwave cavity generated plasmas
K Hassouni, F Silva, A Gicquel
Journal of physics D: Applied physics 43 (15), 153001, 2010
1692010
High quality, large surface area, homoepitaxial MPACVD diamond growth
F Silva, J Achard, O Brinza, X Bonnin, K Hassouni, A Anthonis, K De Corte, ...
Diamond and Related Materials 18 (5-8), 683-697, 2009
1552009
Plasma–wall interaction studies within the EUROfusion consortium: progress on plasma-facing components development and qualification
S Brezinsek, JW Coenen, T Schwarz-Selinger, K Schmid, A Kirschner, ...
Nuclear fusion 57 (11), 116041, 2017
1402017
Chemical kinetics and energy transfer in moderate pressure H2 plasmas used in diamond MPACVD processes
K Hassouni, A Gicquel, M Capitelli, J Loureiro
Plasma Sources Science and Technology 8 (3), 494, 1999
1271999
Hydrogen storage by adsorption on activated carbon: investigation of the thermal effects during the charging process
G Hermosilla-Lara, G Momen, PH Marty, B Le Neindre, K Hassouni
International journal of hydrogen energy 32 (10-11), 1542-1553, 2007
1242007
Non-equilibrium plasma kinetics: a state-to-state approach
M Capitelli, I Armenise, D Bruno, M Cacciatore, R Celiberto, G Colonna, ...
Plasma Sources Science and Technology 16 (1), S30, 2007
1242007
Interaction between soot particles and during dielectric barrier discharge plasma remediation of simulated diesel exhaust
R Dorai, K Hassouni, MJ Kushner
Journal of applied physics 88 (10), 6060-6071, 2000
1072000
Modeling of microwave discharges of H2 admixed with CH4 for diamond deposition
G Lombardi, K Hassouni, GD Stancu, L Mechold, J Röpcke, A Gicquel
Journal of Applied Physics 98 (5), 2005
1062005
Vibrational kinetics, electron dynamics and elementary processes in H2 and D2 plasmas for negative ion production: modelling aspects
M Capitelli, M Cacciatore, R Celiberto, O De Pascale, P Diomede, ...
Nuclear fusion 46 (6), S260, 2006
1052006
Determining electron temperature and density in a hydrogen microwave plasma
CD Scott, S Farhat, A Gicquel, K Hassouni, M Lefebvre
Journal of thermophysics and heat transfer 10 (3), 426-435, 1996
871996
Nucleation, growth and characterization of nanocrystalline diamond films
G Cicala, P Bruno, F Bénédic, F Silva, K Hassouni, GS Senesi
Diamond and Related Materials 14 (3-7), 421-425, 2005
822005
Numerical modeling of capacitively coupled hydrogen plasmas: Effects of frequency and pressure
T Novikova, B Kalache, P Bulkin, K Hassouni, W Morscheidt, ...
Journal of Applied Physics 93 (6), 3198-3206, 2003
792003
Elaboration of pure and doped TiO2 nanoparticles in sol–gel reactor with turbulent micromixing: Application to nanocoatings and photocatalysis
R Azouani, A Michau, K Hassouni, K Chhor, JF Bocquet, JL Vignes, ...
Chemical engineering research and design 88 (9), 1123-1130, 2010
732010
Determination of gas temperature and C2 absolute density in Ar/H2/CH4 microwave discharges used for nanocrystalline diamond deposition from the C2 Mulliken system
G Lombardi, F Bénédic, F Mohasseb, K Hassouni, A Gicquel
Plasma Sources Science and Technology 13 (3), 375, 2004
722004
Diamond growth mechanisms in various environments
A Gicquel, F Silva, K Hassouni
Journal of The Electrochemical Society 147 (6), 2218, 2000
712000
The role of dissociative attachment from Rydberg states in enhancing H− concentration in moderate-and low-pressure H2 plasma sources
K Hassouni, A Gicquel, M Capitelli
Chemical physics letters 290 (4-6), 502-508, 1998
711998
Das System kann den Vorgang jetzt nicht ausführen. Versuchen Sie es später erneut.
Artikel 1–20