| Method for proximity correction JJ Shin, SJ Lin, HT Lin, BJ Lin US Patent 8,762,900, 2014 | 119 | 2014 |
| Devices and methods for improved reflective electron beam lithography CH Yu, JJ Shin, SJ Lin, BJ Lin US Patent 8,722,286, 2014 | 79 | 2014 |
| MRAM device and method for fabricating the same SH Huang, W Hung-Cho, KH Shen, SJ Lin US Patent 10,038,137, 2018 | 74 | 2018 |
| Observation of anti-damping spin–orbit torques generated by in-plane and out-of-plane spin polarizations in MnPd3 M Dc, DF Shao, VDH Hou, A Vailionis, P Quarterman, A Habiboglu, ... Nature Materials 22 (5), 591-598, 2023 | 57 | 2023 |
| Accelerating deep neural networks in processing-in-memory platforms: Analog or digital approach? S Angizi, Z He, D Reis, XS Hu, W Tsai, SJ Lin, D Fan 2019 IEEE Computer Society Annual Symposium on VLSI (ISVLSI), 197-202, 2019 | 47 | 2019 |
| Apparatus and method of inspecting phase shift masks using comparison of a mask die image to the mask image database SD Tzu, SJ Lin US Patent 6,134,014, 2000 | 45 | 2000 |
| Multiple-grid exposure method WC Wang, SJ Lin, PY Liu, JJ Shin, BJ Lin US Patent 8,530,121, 2013 | 39 | 2013 |
| Toward 100% spin–orbit torque efficiency with high spin–orbital Hall conductivity Pt–Cr alloys CY Hu, YF Chiu, CC Tsai, CC Huang, KH Chen, CW Peng, CM Lee, ... ACS Applied Electronic Materials 4 (3), 1099-1108, 2022 | 38 | 2022 |
| Large and robust charge-to-spin conversion in sputtered conductive WTex with disorder X Li, P Li, VDH Hou, DC Mahendra, CH Nien, F Xue, D Yi, C Bi, CM Lee, ... Matter 4 (5), 1639-1653, 2021 | 33 | 2021 |
| Non-directional dithering methods PY Liu, SJ Lin, WC Wang, JJ Shin, BJ Lin US Patent 8,584,057, 2013 | 31 | 2013 |
| Grid refinement method WC Wang, SJ Lin, PY Liu, JJ Shin, BJ Lin US Patent 8,822,106, 2014 | 30 | 2014 |
| Error diffusion and grid shift in lithography PY Liu, SJ Lin, WC Wang, JJ Shin, BJ Lin US Patent 8,510,687, 2013 | 29 | 2013 |
| Materials requirements of high-speed and low-power spin-orbit-torque magnetic random-access memory X Li, SJ Lin, M Dc, YC Liao, C Yao, A Naeemi, W Tsai, SX Wang IEEE Journal of the Electron Devices Society 8, 674-680, 2020 | 28 | 2020 |
| Electron beam lithography system and method for improving throughput JJ Shin, SJ Lin, WC Wang, BJ Lin US Patent 8,524,427, 2013 | 28 | 2013 |
| Providing electron beam proximity effect correction by simulating write operations of polygonal shapes HC Wang, JH Chen, SJ Lin, CP Chiang, CK Tsai, WC Huang, RG Liu US Patent 8,464,186, 2013 | 27 | 2013 |
| Electron beam lithography system and method for improving throughput JJ Shin, SJ Lin, WC Wang, BJ Lin US Patent 8,846,278, 2014 | 24 | 2014 |
| Multiple-grid exposure method WC Wang, SJ Lin, PY Liu, JJ Shin, BJ Lin US Patent 8,828,632, 2014 | 24 | 2014 |
| Reflective electron beam lithography: lithography results using CMOS controlled digital pattern generator chip T Gubiotti, JF Sun, R Freed, F Kidwingira, J Yang, C Bevis, A Carroll, ... Alternative Lithographic Technologies V 8680, 57-67, 2013 | 22 | 2013 |
| Semiconductor structure and associated operating and fabricating method C Yu, SJ Lin US Patent 10,276,784, 2019 | 21 | 2019 |
| Reflective electron-beam lithography: progress toward high-throughput production capability R Freed, T Gubiotti, J Sun, F Kidwingira, J Yang, U Ummethala, LC Hale, ... Alternative Lithographic Technologies IV 8323, 100-109, 2012 | 20 | 2012 |
