| EUV-induced plasma: A peculiar phenomenon of a modern lithographic technology J Beckers, T van de Ven, R van der Horst, D Astakhov, V Banine Applied Sciences 9 (14), 2827, 2019 | 68 | 2019 |
| Exploring the electron density in plasma induced by EUV radiation: I. Experimental study in hydrogen RM Van Der Horst, J Beckers, EA Osorio, DI Astakhov, WJ Goedheer, ... Journal of physics D: applied physics 49 (14), 145203, 2016 | 43 | 2016 |
| Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen DI Astakhov, WJ Goedheer, CJ Lee, VV Ivanov, VM Krivtsun, KN Koshelev, ... Journal of physics D: applied physics 49 (29), 295204, 2016 | 37 | 2016 |
| EUV-induced hydrogen plasma: pulsed mode operation and confinement in scanner M van de Kerkhof, AM Yakunin, D Astakhov, M van Kampen, ... Journal of Micro/Nanopatterning, Materials, and Metrology 20 (3), 033801-033801, 2021 | 30 | 2021 |
| EUV-induced hydrogen plasma and particle release M van de Kerkhof, AM Yakunin, V Kvon, A Nikipelov, D Astakhov, ... Radiation Effects and Defects in Solids 177 (5-6), 486-512, 2022 | 25 | 2022 |
| Measurements of hydrogen gas stopping efficiency for tin ions from laser-produced plasma DB Abramenko, MV Spiridonov, PV Krainov, VM Krivtsun, DI Astakhov, ... Applied Physics Letters 112 (16), 164102, 2018 | 25 | 2018 |
| Numerical study of extreme-ultra-violet generated plasmas in hydrogen D Astakhov University of Twente, 2016 | 22 | 2016 |
| Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection (50th anniversary of the Institute of Spectroscopy, Russian Academy of Sciences) DB Abramenko, PS Antsiferov, DI Astakhov, AY Vinokhodov, IY Vichev, ... Physics-Uspekhi 62 (3), 304, 2019 | 19 | 2019 |
| Plasma probe characteristics in low density hydrogen pulsed plasmas DI Astakhov, WJ Goedheer, CJ Lee, VV Ivanov, VM Krivtsun, AI Zotovich, ... Plasma sources science and technology 24 (5), 055018, 2015 | 13 | 2015 |
| Numerical simulations based on probe measurements in EUV-induced hydrogen plasma A Abrikosov, V Reshetnyak, D Astakhov, A Dolgov, O Yakushev, ... Plasma sources science and technology 26 (4), 045011, 2017 | 11 | 2017 |
| Dielectric particle lofting from dielectric substrate exposed to low-energy electron beam PV Krainov, VV Ivanov, DI Astakhov, VV Medvedev, VV Kvon, AM Yakunin, ... Plasma Sources Science and Technology 29 (8), 085013, 2020 | 10 | 2020 |
| Miniature source of accelerated ions with focusing ion-optical system MS Mikhailenko, AE Pestov, NI Chkhalo, LA Goncharov, AK Chernyshev, ... Nuclear Instruments and Methods in Physics Research Section A: Accelerators …, 2021 | 4 | 2021 |
| Vector bosons escaping from the brane: nothing DI Astakhov, DV Kirpichnikov Physical Review D 83 (10), 104031, 2011 | 4 | 2011 |
| Numerical and experimental studies of the carbon etching in EUV-induced plasma DI Astakhov, WJ Goedheer, CJ Lee, VV Ivanov, VM Krivtsun, O Yakushev, ... arXiv preprint arXiv:1507.02705, 2015 | 3 | 2015 |
| Dynamics of H atoms surface recombination in low-temperature plasma V Gubarev, D Lopaev, A Zotovich, V Medvedev, P Krainov, D Astakhov, ... Journal of Applied Physics 132 (19), 193301, 2022 | 2 | 2022 |
| Miniature plasma source for in situ extreme ultraviolet lithographic scanner cleaning M de Kerkhof, E Osorio, V Krivtsun, M Spiridonov, D Astakhov, ... Journal of Vacuum Science & Technology B, Nanotechnology and …, 2022 | 2 | 2022 |
| Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection VV Medvedev, AS Grushin, VM Krivtsun, AY Vinokhodov, PS Antsiferov, ... Phys. Usp 61, 2018 | 2 | 2018 |
| 2D PIC modeling of the EUV induced hydrogen plasma and comparison to the observed carbon etching rate D Astakhov, WJ Goedheer, D Lopaev, V Ivanov, VM Krivtsun, O Yakushev, ... | 2 | 2013 |
| Role of ion accumulation in lofting of submicrometer-sized dielectric particle from dielectric surface by plasma and low-energy electron beam P Krainov, V Ivanov, D Astakhov, S Medvedev, M van de Kerkhof Optical and EUV Nanolithography XXXV 12051, 12-17, 2022 | 1 | 2022 |
| Particle lofting from substrate exposed to plasma and electron beam PV Krainov, VV Ivanov, DI Astakhov, VV Medvedev, VV Kvon, AM Yakunin, ... arXiv preprint arXiv:2011.09204, 2020 | 1 | 2020 |
