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Hojoon Ryu
Hojoon Ryu
Verified email at intel.com
Title
Cited by
Cited by
Year
Ferroelectric tunneling junctions based on aluminum oxide/zirconium-doped hafnium oxide for neuromorphic computing
H Ryu, H Wu, F Rao, W Zhu
Scientific reports 9 (1), 20383, 2019
1912019
Exploring new metal electrodes for ferroelectric aluminum-doped hafnium oxide
H Ryu, K Xu, J Kim, S Kang, J Guo, W Zhu
IEEE Transactions on Electron Devices 66 (5), 2359-2364, 2019
462019
Empowering 2D nanoelectronics via ferroelectricity
H Ryu, K Xu, D Li, X Hong, W Zhu
Applied Physics Letters 117 (8), 2020
442020
Strong Temperature Effect on the Ferroelectric Properties of CuInP2S6 and Its Heterostructures
Z Zhao, K Xu, H Ryu, W Zhu
ACS applied materials & interfaces 12 (46), 51820-51826, 2020
372020
Demonstration of a Stacked CMOS Inverter at 60nm Gate Pitch with Power Via and Direct Backside Device Contacts
M Radosavljević, CY Huang, R Galatage, MF Qayyum, JA Wiedemer, ...
2023 International Electron Devices Meeting (IEDM), 1-4, 2023
132023
High temperature operation of E-mode and D-mode AlGaN/GaN MIS-HEMTs with recessed gates
H Lee, H Ryu, J Kang, W Zhu
IEEE Journal of the Electron Devices Society 11, 167-173, 2023
132023
Content-Addressable Memories and Transformable Logic Circuits Based on Ferroelectric Reconfigurable Transistors for In-Memory Computing
Z Zhao, J Kang, A Tunga, H Ryu, A Shukla, S Rakheja, W Zhu
ACS nano 18 (4), 2763-2771, 2024
102024
Stable high temperature operation of p-GaN gate HEMT with etch-stop layer
H Lee, H Ryu, J Kang, W Zhu
IEEE Electron Device Letters, 2024
72024
Thermally hardened AlGaN/GaN MIS-HEMTs based on multilayer dielectrics and silicon nitride passivation
H Lee, H Ryu, W Zhu
Applied Physics Letters 122 (11), 2023
72023
Nonconventional analog comparators based on graphene and ferroelectric hafnium zirconium oxide
J Liu, H Ryu, W Zhu
IEEE Transactions on Electron Devices 68 (3), 1334-1339, 2021
62021
Ferroelectric tunneling junctions for neurosynaptic computing
H Ryu, H Wu, F Rao, W Zhu
2019 Device Research Conference (DRC), 191-192, 2019
52019
Ferroelectric Zr-doped Hafnium Oxide for Memory Applications
H Ryu, K Xu, D Kim, F Rao, W Zhu
49th IEEE Semiconductor Interface Specialists Conference 2018, 2018
22018
Low-Thermal-Budget Ferroelectric Field-Effect Transistors Based on CuInP2S6 and InZnO
H Ryu, J Kang, M Park, B Bae, Z Zhao, S Rakheja, K Lee, W Zhu
ACS Applied Materials & Interfaces 15 (46), 53671-53677, 2023
12023
Nanoscale Devices Based on Two-dimensional Materials and Ferroelectric Materials
Z Yao, H Ryu, K Xu, J Liu, Y Cai, Y Yan, W Zhu
2018 14th IEEE International Conference on Solid-State and Integrated …, 2018
12018
Ferroelectric Aluminum-Doped Hafnium Oxide for Memory Applications
H Ryu, K Xu, J Guo, W Zhu
2018 76th Device Research Conference (DRC), 1-2, 2018
12018
TWO-TERMINAL FERROELECTRIC PEROVSKITE DIODE MEMORY ELEMENT
P Debashis, DA Adams, G Auluck, SB Clendenning, A Sen Gupta, ...
US Patent App. 18/346,212, 2025
2025
Ultra-High-k Ferroelectric BaTiO3 Perovskite in the Gate Stack for Two-Dimensional WSe2 p-Type High-Performance Transistors
P Debashis, H Ryu, R Steinhardt, P Buragohain, JJ Plombon, K Maxey, ...
Nano Letters 24 (40), 12353-12360, 2024
2024
Field effect transistor comprising transition metal dichalcogenide (tmd) and ferroelectric material
H Ryu, P Debashis, RA Steinhardt, KP O'brien, JJ Plombon, DE Nikonov, ...
US Patent App. 18/148,871, 2024
2024
High temperature operation of p-GaN/AlGaN/GaN based devices
H Lee, H Ryu, W Zhu
APS March Meeting Abstracts 2023, M34. 005, 2023
2023
Nanoscale Devices Based on Two-dimensional and Ferroelectric Materials
Z Zhao, K Xu, J Liu, W Jiang, H Ryu, S Rakheja, T Low, W Zhu
2022 Device Research Conference (DRC), 1-2, 2022
2022
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