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Citations per year
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Cited by
All
Since 2020
Citations
33
32
h-index
3
3
i10-index
2
2
0
10
5
2019
2020
2021
2022
2023
2024
2025
1
6
2
8
6
9
1
Public access
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3 articles
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Co-authors
Tien-Chien Jen
University of Johannesburg, ASME Fellow, ASSAf Fellow, SARChI Chair
Verified email at uj.ac.za
Rigardt Alfred Maarten Coetzee
University of Johannesburg
Verified email at uj.ac.za
Peter Olubambi
Professor; University of Johannesburg, South Africa
Verified email at uj.ac.za
James Ayodele Oke
University of Johannesburg
Verified email at uj.ac.za
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Olufunsho Oladipo Olotu
Mechanical Engineering Ph.D Candidate,
University of Johannesburg
Verified email at uj.ac.za
Atomic Layer Deposition
Thin Film Technology
Simulation & Semiconductors Fabrication
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Year
Operating pressure influences over micro trenches in exposure time introduced atomic layer deposition
OO Olotu, RAM Coetzee, PA Olubambi, TC Jen
International Journal of Heat and Mass Transfer 153, 119602
, 2020
14
2020
Atomic layer deposition of chalcogenide thin films: processes, film properties, applications, and bibliometric prospect
JA Oke, OO Olotu, TC Jen
Journal of Materials Research and Technology 20, 991-1019
, 2022
11
2022
A two-dimensional simulation of atomic layer deposition process on substrate trenches
OO Olotu
PQDT-Global
, 2019
5
2019
The investigation of the exposure time effects with pressure in the atomic layer deposition process over micro-trench surface
OO Olotu, RAM Coetzee, PA Olubambia, TC Jen
International Journal of Mechanical Engineering and Robotics Research 9 (3 …
, 2020
3
2020
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