| Code generation using machine learning: A systematic review E Dehaerne, B Dey, S Halder, S De Gendt, W Meert Ieee Access 10, 82434-82455, 2022 | 82 | 2022 |
| Deep learning-based defect classification and detection in SEM images B Dey, D Goswami, S Halder, K Khalil, P Leray, MA Bayoumi Metrology, Inspection, and Process Control XXXVI 12053, 2022 | 35 | 2022 |
| Neuro-NoC: Energy optimization in heterogeneous many-core NoC using neural networks in dark silicon era MF Reza, TT Le, B De, M Bayoumi, D Zhao 2018 IEEE International Symposium on Circuits and Systems (ISCAS), 1-5, 2018 | 32 | 2018 |
| A novel reconfigurable hardware architecture of neural network K Khalil, O Eldash, B Dey, A Kumar, M Bayoumi 2019 IEEE 62nd International Midwest Symposium on Circuits and Systems …, 2019 | 31 | 2019 |
| SEM image denoising with unsupervised machine learning for better defect inspection and metrology B Dey, S Halder, K Khalil, G Lorusso, J Severi, P Leray, MA Bayoumi Metrology, Inspection, and Process Control for Semiconductor Manufacturing …, 2021 | 29 | 2021 |
| A novel design gate based low-cost configurable ro puf using reversible logic B Dey, K Khalil, A Kumar, M Bayoumi 2019 IEEE 62nd International Midwest Symposium on Circuits and Systems …, 2019 | 19 | 2019 |
| Optimizing YOLOv7 for semiconductor defect detection E Dehaerne, B Dey, S Halder, S De Gendt Metrology, Inspection, and Process Control XXXVII 12496, 635-642, 2023 | 18 | 2023 |
| A reversible-logic based architecture for long short-term memory (LSTM) network K Khalil, B Dey, A Kumar, M Bayoumi 2021 IEEE International Symposium on Circuits and Systems (ISCAS), 1-5, 2021 | 17 | 2021 |
| Towards improving challenging stochastic defect detection in SEM images based on improved YOLOv5 B Dey, E Dehaerne, S Halder Photomask Technology 2022 12293, 28-37, 2022 | 15 | 2022 |
| Unsupervised machine learning based SEM image denoising for robust contour detection B Dey, S Wu, S Das, K Khalil, S Halder, P Leray, S Bhamidipati, K Ahi, ... International Conference on Extreme Ultraviolet Lithography 2021 11854, 88-102, 2021 | 10 | 2021 |
| Architecture of a novel low-cost hardware neural network K Khalil, O Eldash, B Dey, A Kumar, M Bayoumi 2020 IEEE 63rd International Midwest Symposium on Circuits and Systems …, 2020 | 10 | 2020 |
| A reversible-logic based architecture for artificial neural network B Dey, K Khalil, A Kumar, M Bayoumi 2020 IEEE 63rd International Midwest Symposium on Circuits and Systems …, 2020 | 10 | 2020 |
| Unsupervised machine learning based CD-SEM image segregator for OPC and process window estimation B Dey, D Cerbu, K Khalil, S Halder, P Leray, S Das, Y Sherazi, ... Design-Process-Technology Co-optimization for Manufacturability XIV 11328 …, 2020 | 10 | 2020 |
| Yolov8 for defect inspection of hexagonal directed self-assembly patterns: a data-centric approach E Dehaerne, B Dey, H Esfandiar, L Verstraete, HS Suh, S Halder, ... 38th European Mask and Lithography Conference (EMLC 2023) 12802, 286-299, 2023 | 9 | 2023 |
| SEMI-DiffusionInst: A Diffusion Model Based Approach for Semiconductor Defect Classification and Segmentation V De Ridder, B Dey, S Halder, B Van Waeyenberge 2023 International Symposium ELMAR, 61-66, 2023 | 9 | 2023 |
| Automated semiconductor defect inspection in scanning electron microscope images: a systematic review T Lechien, E Dehaerne, B Dey, V Blanco, S Halder, S De Gendt, W Meert arXiv preprint arXiv:2308.08376, 2023 | 9 | 2023 |
| SEMI-PointRend: improved semiconductor wafer defect classification and segmentation as rendering MJ Hwang, B Dey, E Dehaerne, S Halder, Y Shin Metrology, Inspection, and Process Control XXXVII 12496, 25-31, 2023 | 9 | 2023 |
| A deep learning framework for verilog autocompletion towards design and verification automation E Dehaerne, B Dey, S Halder, S De Gendt arXiv preprint arXiv:2304.13840, 2023 | 8 | 2023 |
| A comparative study of deep-learning object detectors for semiconductor defect detection E Dehaerne, B Dey, S Halder 2022 29th IEEE International Conference on Electronics, Circuits and Systems …, 2022 | 8 | 2022 |
| Machine learning-based edge placement error analysis and optimization: a systematic review AT Ngo, B Dey, S Halder, S De Gendt, C Wang IEEE Transactions on Semiconductor Manufacturing 36 (1), 1-13, 2022 | 6 | 2022 |
Kasem KhalilAssistant ProfessorVerified email at aun.edu.eg