| Characterization of sp2/sp3 hybridization ratios of hydrogenated amorphous carbon films deposited in C2H2 inductively coupled plasmas J Li, SJ Kim, S Han, H Chae Surface and Coatings Technology 422, 127514, 2021 | 27 | 2021 |
| Electrospray deposition of silver nanowire films for transparent electrodes J Li, SM Cho, H Chae Journal of Nanoscience and Nanotechnology 12 (7), 5981-5985, 2012 | 14 | 2012 |
| Dual‐logic‐in‐memory implementation with orthogonal polarization of van der Waals ferroelectric heterostructure J Niu, S Jeon, D Kim, S Baek, HH Yoo, J Li, JS Park, Y Lee, S Lee InfoMat 6 (2), e12490, 2024 | 13 | 2024 |
| Etching characteristics of hydrogenated amorphous carbon with different sp2/sp3 hybridization ratios in CF4/O2 plasmas J Li, SJ Kim, S Han, Y Kim, H Chae Plasma Processes and Polymers 18 (11), 2100075, 2021 | 11 | 2021 |
| Ion-Enhanced Etching Characteristics of sp2-Rich Hydrogenated Amorphous Carbons in CF4 Plasmas and O2 Plasmas J Li, Y Kim, S Han, H Chae Materials 14 (11), 2941, 2021 | 9 | 2021 |
| Surface wettability control and fluorination modeling of amorphous carbon films fluorinated with CF4 plasma J Li, J Niu, Y Kim, H Chae Applied Surface Science 635, 157668, 2023 | 7 | 2023 |
| Quantitative Analysis of Mass Spectrometric Signals for the Estimation of Fluorine Radical Densities in CF4 and CF4/O2 Plasmas J Li, Y Kim, S Han, J Niu, H Chae Plasma Chemistry and Plasma Processing 42 (4), 989-1002, 2022 | 5 | 2022 |
| Hydrogenated amorphous carbon films deposited using plasma enhanced chemical vapor deposition processes J Li, H Chae Korean Journal of Chemical Engineering 40 (6), 1268-1276, 2023 | 3 | 2023 |
| Reconfigurable Sequential-Logic-in-Memory Implementation Utilizing Ferroelectric Field-Effect Transistors J Niu, D Kim, J Li, J Lyu, Y Lee, S Lee ACS nano, 2025 | | 2025 |
| In-poor IGZO: superior resilience to hydrogen in forming gas anneal and PBTI A Kruv, MJ van Setten, A Chasin, D Matsubayashi, HFW Dekkers, A Pavel, ... arXiv preprint arXiv:2412.07362, 2024 | | 2024 |
| Plasma Etch of IGZO Thin Film and IGZO/SiO2 Interface Diffusion in Inductively Coupled CH4/Ar Plasmas J Li, L Souriau, S Kundu, P Bezard, F Lazzarino Electrochemical Society Meeting Abstracts prime2024, 1788-1788, 2024 | | 2024 |
| Bidirectional Polarization-Integrated Van Der Waals Ferroelectric Field-Effect Transistor for Multi-State Storage and Dual-Logic-in-Memory Computing J Niu, S Jeon, D Kim, S Baek, HH Yoo, J Li, J Park, Y Lee, S Lee Electrochemical Society Meeting Abstracts prime2024, 4895-4895, 2024 | | 2024 |
| Plasma Etch of IGZO Thin Film and IGZO/SiO2 Interface Diffusion in Inductively Coupled CH4/Ar Plasmas J Li, S Kundu, L Souriau, P Bezard, R Izmailov, F Lazzarino Plasma Processes and Polymers, e2400186, 2024 | | 2024 |
| First Demonstration of 3D Stacked FeFET Memory Devices with Vertical IGZO Channel-Last Process for Dense Non-Volatile Memory R Izmailov, N Ronchi, J Li, MI Popovici, K Katcko, Z Chen, L Breuil, ... International Conference on Solid State Devices and Materials, 2024 | | 2024 |
| Transformer-Coupled Toroidal Remote Plasma Source for Chamber Cleaning with NF₃ and CF₄ D Ka, J Li, H Chae 한국진공학회 학술발표회초록집, 214-214, 2018 | | 2018 |
