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Lin Qunying, Lin Q Y, QY Lin, Q. Lin. Lin Q.
Lin Qunying, Lin Q Y, QY Lin, Q. Lin. Lin Q.
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Verified email at ime.a-star.edu.sg
Title
Cited by
Cited by
Year
Demonstration of color display metasurfaces via immersion lithography on a 12-inch silicon wafer
T Hu, CK Tseng, YH Fu, Z Xu, Y Dong, S Wang, KH Lai, V Bliznetsov, ...
Optics express 26 (15), 19548-19554, 2018
972018
Laser etching of glass substrates by 1064 nm laser irradiation
ZQ Huang, MH Hong, TBM Do, QY Lin
Applied Physics A 93, 159-163, 2008
842008
CMOS-compatible a-Si metalenses on a 12-inch glass wafer for fingerprint imaging
T Hu, Q Zhong, N Li, Y Dong, Z Xu, YH Fu, D Li, V Bliznetsov, Y Zhou, ...
Nanophotonics 9 (4), 823-830, 2020
762020
Large-area pixelated metasurface beam deflector on a 12-inch glass wafer for random point generation
N Li, YH Fu, Y Dong, T Hu, Z Xu, Q Zhong, D Li, KH Lai, S Zhu, Q Lin, ...
Nanophotonics 8 (10), 1855-1861, 2019
762019
Si metasurface half-wave plates demonstrated on a 12-inch CMOS platform
Y Dong, Z Xu, N Li, J Tong, YH Fu, Y Zhou, T Hu, Q Zhong, V Bliznetsov, ...
Nanophotonics 9 (1), 149-157, 2020
522020
Large‐Scale Huygens’ Metasurfaces for Holographic 3D Near‐Eye Displays
W Song, X Liang, S Li, D Li, R Paniagua‐Domínguez, KH Lai, Q Lin, ...
Laser & Photonics Reviews 15 (9), 2000538, 2021
502021
CMOS-compatible all-Si metasurface polarizing bandpass filters on 12-inch wafers
Z Xu, Y Dong, CK Tseng, T Hu, J Tong, Q Zhong, N Li, L Sim, KH Lai, ...
Optics Express 27 (18), 26060-26069, 2019
502019
Four beams evanescent waves interference lithography for patterning of two dimensional features
JK Chua, VM Murukeshan, SK Tan, QY Lin
Optics express 15 (6), 3437-3451, 2007
502007
Nano-scale three dimensional surface relief features using single exposure counter-propagating multiple evanescent waves interference phenomenon
VM Murukeshan, JK Chua, SK Tan, QY Lin
Optics express 16 (18), 13857-13870, 2008
392008
Effects of process parameters on pattern-edge roughness of chemically amplified resists
HP Koh, Q Lin, X Hu, LH Chan
Advances in Resist Technology and Processing XVII 3999, 240-251, 2000
372000
Direct determination of second-order derivatives in plate bending using multiple-exposure shearography
CJ Tay, SL Toh, HM Shang, QY Lin
Optics & Laser Technology 26 (2), 91-98, 1994
231994
Comparison of selected chemical component levels in Cordyceps guangdongensis, C. sinensis and C. militaris
QY Lin, TH Li, B Song, H Huang
Acta Edulis Fungi 16 (4), 54-57, 2009
212009
Time-average shearography in vibration analysis
SL Toh, CJ Tay, HM Shang, QY Lin
Optics & Laser Technology 27 (1), 51-55, 1995
211995
Customized illumination shapes for 193nm immersion lithography
ML Ling, GS Chua, Q Lin, CJ Tay, C Quan
Optical Microlithography XXI 6924, 1066-1076, 2008
192008
Quality glass processing by laser induced backside wet etching
ZQ Huang, MH Hong, KS Tiaw, QY Lin
J Laser Micro Nanoen 2, 194-199, 2007
182007
Advances in the studies on Cordyceps militaris
L Qunying, S Bin, L Taihui
Wei Sheng wu xue Tong bao 33 (4), 154-157, 2006
172006
Multiple-image shearography: a direct method to determine curvatures
CJ Tay, SL Toh, HM Shang, QY Lin
Applied optics 34 (13), 2202-2206, 1995
171995
Large-area metalens directly patterned on a 12-inch glass wafer using immersion lithography for mass production
Q Zhong, Y Dong, D Li, N Li, T Hu, Z Xu, Y Zhou, KH Lai, YH Fu, ...
Optical Fiber Communication Conference, Th2A. 8, 2020
162020
Embedded dielectric metasurface based subtractive color filter on a 300mm glass wafer
Z Xu, Y Dong, YH Fu, Q Zhong, T Hu, D Li, Y Li, N Li, Y Lin, Q Lin, S Zhu, ...
2019 conference on lasers and electro-optics (CLEO), 1-2, 2019
152019
Demonstration of a-Si metalenses on a 12-inch glass wafer by CMOS-compatible technology
T Hu, Q Zhong, N Li, Y Dong, YH Fu, Z Xu, D Li, V Bliznetsov, KH Lai, ...
arXiv preprint arXiv:1906.11764, 2019
142019
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