Demonstration of color display metasurfaces via immersion lithography on a 12-inch silicon wafer T Hu, CK Tseng, YH Fu, Z Xu, Y Dong, S Wang, KH Lai, V Bliznetsov, ... Optics express 26 (15), 19548-19554, 2018 | 97 | 2018 |
Laser etching of glass substrates by 1064 nm laser irradiation ZQ Huang, MH Hong, TBM Do, QY Lin Applied Physics A 93, 159-163, 2008 | 84 | 2008 |
CMOS-compatible a-Si metalenses on a 12-inch glass wafer for fingerprint imaging T Hu, Q Zhong, N Li, Y Dong, Z Xu, YH Fu, D Li, V Bliznetsov, Y Zhou, ... Nanophotonics 9 (4), 823-830, 2020 | 76 | 2020 |
Large-area pixelated metasurface beam deflector on a 12-inch glass wafer for random point generation N Li, YH Fu, Y Dong, T Hu, Z Xu, Q Zhong, D Li, KH Lai, S Zhu, Q Lin, ... Nanophotonics 8 (10), 1855-1861, 2019 | 76 | 2019 |
Si metasurface half-wave plates demonstrated on a 12-inch CMOS platform Y Dong, Z Xu, N Li, J Tong, YH Fu, Y Zhou, T Hu, Q Zhong, V Bliznetsov, ... Nanophotonics 9 (1), 149-157, 2020 | 52 | 2020 |
Large‐Scale Huygens’ Metasurfaces for Holographic 3D Near‐Eye Displays W Song, X Liang, S Li, D Li, R Paniagua‐Domínguez, KH Lai, Q Lin, ... Laser & Photonics Reviews 15 (9), 2000538, 2021 | 50 | 2021 |
CMOS-compatible all-Si metasurface polarizing bandpass filters on 12-inch wafers Z Xu, Y Dong, CK Tseng, T Hu, J Tong, Q Zhong, N Li, L Sim, KH Lai, ... Optics Express 27 (18), 26060-26069, 2019 | 50 | 2019 |
Four beams evanescent waves interference lithography for patterning of two dimensional features JK Chua, VM Murukeshan, SK Tan, QY Lin Optics express 15 (6), 3437-3451, 2007 | 50 | 2007 |
Nano-scale three dimensional surface relief features using single exposure counter-propagating multiple evanescent waves interference phenomenon VM Murukeshan, JK Chua, SK Tan, QY Lin Optics express 16 (18), 13857-13870, 2008 | 39 | 2008 |
Effects of process parameters on pattern-edge roughness of chemically amplified resists HP Koh, Q Lin, X Hu, LH Chan Advances in Resist Technology and Processing XVII 3999, 240-251, 2000 | 37 | 2000 |
Direct determination of second-order derivatives in plate bending using multiple-exposure shearography CJ Tay, SL Toh, HM Shang, QY Lin Optics & Laser Technology 26 (2), 91-98, 1994 | 23 | 1994 |
Comparison of selected chemical component levels in Cordyceps guangdongensis, C. sinensis and C. militaris QY Lin, TH Li, B Song, H Huang Acta Edulis Fungi 16 (4), 54-57, 2009 | 21 | 2009 |
Time-average shearography in vibration analysis SL Toh, CJ Tay, HM Shang, QY Lin Optics & Laser Technology 27 (1), 51-55, 1995 | 21 | 1995 |
Customized illumination shapes for 193nm immersion lithography ML Ling, GS Chua, Q Lin, CJ Tay, C Quan Optical Microlithography XXI 6924, 1066-1076, 2008 | 19 | 2008 |
Quality glass processing by laser induced backside wet etching ZQ Huang, MH Hong, KS Tiaw, QY Lin J Laser Micro Nanoen 2, 194-199, 2007 | 18 | 2007 |
Advances in the studies on Cordyceps militaris L Qunying, S Bin, L Taihui Wei Sheng wu xue Tong bao 33 (4), 154-157, 2006 | 17 | 2006 |
Multiple-image shearography: a direct method to determine curvatures CJ Tay, SL Toh, HM Shang, QY Lin Applied optics 34 (13), 2202-2206, 1995 | 17 | 1995 |
Large-area metalens directly patterned on a 12-inch glass wafer using immersion lithography for mass production Q Zhong, Y Dong, D Li, N Li, T Hu, Z Xu, Y Zhou, KH Lai, YH Fu, ... Optical Fiber Communication Conference, Th2A. 8, 2020 | 16 | 2020 |
Embedded dielectric metasurface based subtractive color filter on a 300mm glass wafer Z Xu, Y Dong, YH Fu, Q Zhong, T Hu, D Li, Y Li, N Li, Y Lin, Q Lin, S Zhu, ... 2019 conference on lasers and electro-optics (CLEO), 1-2, 2019 | 15 | 2019 |
Demonstration of a-Si metalenses on a 12-inch glass wafer by CMOS-compatible technology T Hu, Q Zhong, N Li, Y Dong, YH Fu, Z Xu, D Li, V Bliznetsov, KH Lai, ... arXiv preprint arXiv:1906.11764, 2019 | 14 | 2019 |