| Apparatus for generating remote plasma HT Jeon, IH Kim, SH Kim, CW Chung, SK Lee US Patent App. 11/703,621, 2007 | 211 | 2007 |
| Floating probe for electron temperature and ion density measurement applicable to processing plasmas MH Lee, SH Jang, CW Chung Journal of Applied Physics 101 (3), 2007 | 209 | 2007 |
| Apparatus for generating remote plasma HT Jeon, S Woo, HC Kim, CW Chung US Patent 8,207,470, 2012 | 145 | 2012 |
| On the E to H and H to E transition mechanisms in inductively coupled plasma MH Lee, CW Chung Physics of plasmas 13 (6), 2006 | 113 | 2006 |
| Effects of rf-bias power on plasma parameters in a low gas pressure inductively coupled plasma HC Lee, MH Lee, CW Chung Applied Physics Letters 96 (7), 2010 | 103 | 2010 |
| Experimental observation of the transition from nonlocal to local electron kinetics in inductively coupled plasmas HC Lee, MH Lee, CW Chung Applied Physics Letters 96 (4), 2010 | 96 | 2010 |
| Self-consistent global model with multi-step ionizations in inductively coupled plasmas MH Lee, CW Chung Physics of plasmas 12 (7), 2005 | 93 | 2005 |
| Nonlocal electron kinetics in a planar inductive helium discharge SH Seo, CW Chung, JI Hong, HY Chang Physical Review E 62 (5), 7155, 2000 | 86 | 2000 |
| On the hysteresis in E to H and H to E transitions and the multistep ionization in inductively coupled plasma MH Lee, KH Lee, DS Hyun, CW Chung Applied physics letters 90 (19), 2007 | 81 | 2007 |
| Evolution of the electron energy distribution and EH mode transition in inductively coupled nitrogen plasma HC Lee, JK Lee, CW Chung Physics of Plasmas 17 (3), 2010 | 79 | 2010 |
| Heating-mode transition in the capacitive mode of inductively coupled plasmas CW Chung, HY Chang Applied physics letters 80 (10), 1725-1727, 2002 | 78 | 2002 |
| On the multistep ionizations in an argon inductively coupled plasma MH Lee, SH Jang, CW Chung Physics of plasmas 13 (5), 2006 | 75 | 2006 |
| Ultrathin gutter layer for high-performance thin-film composite membranes for CO2 separation MJ Yoo, KH Kim, JH Lee, TW Kim, CW Chung, YH Cho, HB Park Journal of Membrane Science 566, 336-345, 2018 | 65 | 2018 |
| Collisionless electron heating by radio frequency bias in low gas pressure inductive discharge HC Lee, CW Chung Applied Physics Letters 101 (24), 2012 | 61 | 2012 |
| Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma HC Lee, JY Bang, CW Chung Thin Solid Films 519 (20), 7009-7013, 2011 | 54 | 2011 |
| Power dissipation mode transition by a magnetic field SJ You, CW Chung, KH Bai, HY Chang Applied physics letters 81 (14), 2529-2531, 2002 | 54 | 2002 |
| Electron cyclotron resonance in a weakly magnetized radio-frequency inductive discharge CW Chung, SS Kim, HY Chang Physical review letters 88 (9), 095002, 2002 | 52 | 2002 |
| Review of heating mechanism in inductively coupled plasma SH Seo, CW Chung, HY Chang Surface and Coatings Technology 131 (1-3), 1-11, 2000 | 49 | 2000 |
| Effect of multistep ionizations on the electron temperature in an argon inductively coupled plasma MH Lee, CW Chung Applied Physics Letters 87 (13), 2005 | 48 | 2005 |
| Comparison of pressure dependence of electron energy distributions in oxygen capacitively and inductively coupled plasmas MH Lee, HC Lee, CW Chung Physical Review E—Statistical, Nonlinear, and Soft Matter Physics 81 (4 …, 2010 | 47 | 2010 |
