| Quantum interference of large organic molecules S Gerlich, S Eibenberger, M Tomandl, S Nimmrichter, K Hornberger, ... Nature communications 2 (1), 263, 2011 | 529 | 2011 |
| Realization of optical carpets in the Talbot and Talbot-Lau configurations WB Case, M Tomandl, S Deachapunya, M Arndt Optics express 17 (23), 20966-20974, 2009 | 184 | 2009 |
| Simulated interactive research experiments as educational tools for advanced science M Tomandl, T Mieling, CM Losert-Valiente Kroon, M Hopf, M Arndt Scientific reports 5 (1), 14108, 2015 | 16 | 2015 |
| Realisierung von optischen Talbot-und Talbot-Lau-Teppichen M Tomandl na, 2010 | 7 | 2010 |
| Multi-beam mask writing opens up new fields of application M Tomandl, C Spengler, C Klein, H Loeschner, E Platzgummer 38th European Mask and Lithography Conference (EMLC 2023) 12802, 28-34, 2023 | 6 | 2023 |
| Quantum interference of large organic molecules G Stefan, E Sandra, T Mathias, N Stefan, H Klaus, PJ Fagan, J Tuxen, ... Nature communications 2 (263), 1-5, 2011 | 4 | 2011 |
| Interaktive Forschungssimulationen M Tomandl, CMLV Kroon, M Hopf, M Arndt Praxis der Naturwissenschaften-Physik in der Schule 62 (8), 2013 | 3 | 2013 |
| Improvement of mask pattern placement error using novel resist charging control methodology in multi-beam mask writer H Kim, H Noh, W Shin, K Park, Y Lee, S Jo, Y Sung, H Lee, H Kim, J Choi, ... Photomask Japan 2024: XXX Symposium on Photomask and Next-Generation …, 2024 | 2 | 2024 |
| New multi-beam mask data preparation method for EUV high volume data K Shin, S Kim, J Choi, E Kim, S Lee, H Hoeller-Lugmayr, A Moqanaki, ... Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation …, 2023 | 2 | 2023 |
| Multi-beam mask writing opens up new fields of application, including curvilinear mask pattern for high numerical aperture extreme ultraviolet lithography M Tomandl, C Spengler, P Hudek, C Klein, H Loeschner, E Platzgummer Journal of Micro/Nanopatterning, Materials, and Metrology 23 (1), 011205-011205, 2024 | 1 | 2024 |
| MBMW-100 flex, the 1st electron multi-beam mask writer for mature and advanced mask nodes M Tomandl, C Klein, H Loeschner, E Platzgummer Photomask Technology 2023 12751, 2023 | 1 | 2023 |
| Multi-beam patterning technology and mask making beyond 5nm B Shamoun, Z Alberti, I Bucay, S Ellis, M Erickson, B Liu, M Chandramouli, ... Novel Patterning Technologies 2023 12497, 36-46, 2023 | 1 | 2023 |
| Multi-beam mask writers in the High-NA EUV era E Platzgummer, C Spengler, C Zillner, M Tomandl, C Klein, H Loeschner, ... Photomask Technology 2024 13216, 1321616, 2024 | | 2024 |
| Opening modern research experiments to undergraduate students with Simulated Interactive Research Experiments (SIRE). M Tomandl, CMLV Kroon, M Hopf, M Arndt | | 2014 |
| Matter wave interferometry: Exploring the importance of the internal molecular properties S Eibenberger, S Gerlich, M Tomandl, K Hornberger, S Nimmrichter, ... European Quantum Electronics Conference, EA_P9, 2011 | | 2011 |
| Matter wave interferometry with large and complex molecules S Gerlich, S Eibenberger, M Tomandl, J Tüxen, M Mayor, M Arndt APS March Meeting Abstracts 2011, Q29. 006, 2011 | | 2011 |