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Seungyeol Oh
Seungyeol Oh
Verified email at postech.ac.kr
Title
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Cited by
Year
HfZrOx-Based Ferroelectric Synapse Device With 32 Levels of Conductance States for Neuromorphic Applications
S Oh, T Kim, M Kwak, J Song, J Woo, S Jeon, IK Yoo, H Hwang
IEEE Electron Device Letters 38 (6), 732-735, 2017
2722017
Ferroelectric materials for neuromorphic computing
S Oh, H Hwang, IK Yoo
Apl Materials 7 (9), 2019
2482019
Large Remnant Polarization in a Wake-Up Free Hf0.5Zr0.5O2 Ferroelectric Film through Bulk and Interface Engineering
A Kashir, H Kim, S Oh, H Hwang
ACS Applied Electronic Materials 3 (2), 629-638, 2021
1212021
Defect Engineering to Achieve Wake‐up Free HfO2‐Based Ferroelectrics
A Kashir, S Oh, H Hwang
Advanced Engineering Materials 23 (1), 2000791, 2021
732021
Effect of dead layers on the ferroelectric property of ultrathin HfZrOx film
S Oh, H Kim, A Kashir, H Hwang
Applied Physics Letters 117 (25), 2020
682020
Improved Endurance of HfO2-Based Metal- Ferroelectric-Insulator-Silicon Structure by High-Pressure Hydrogen Annealing
S Oh, J Song, IK Yoo, H Hwang
IEEE Electron Device Letters 40 (7), 1092-1095, 2019
592019
High polarization and wake-up free ferroelectric characteristics in ultrathin Hf0. 5Zr0. 5O2 devices by control of oxygen-deficient layer
M Yadav, A Kashir, S Oh, RD Nikam, H Kim, H Jang, H Hwang
Nanotechnology 33 (8), 085206, 2021
372021
A new approach to achieving strong ferroelectric properties in TiN/Hf0. 5Zr0. 5O2/TiN devices
H Kim, A Kashir, S Oh, H Hwang
Nanotechnology 32 (5), 055703, 2020
282020
Effects of high pressure oxygen annealing on Hf0. 5Zr0. 5O2 ferroelectric device
H Kim, A Kashir, S Oh, H Jang, H Hwang
Nanotechnology 32 (31), 315712, 2021
142021
Improvement of endurance and switching speed in Hf1− x Zr x O2 thin films using a nanolaminate structure
H Jang, A Kashir, S Oh, H Hwang
Nanotechnology 33 (39), 395205, 2022
92022
Accurate Evaluation of High-k HZO/ZrO2 Films by Morphotropic Phase Boundary
S Oh, H Jang, H Hwang
IEEE Electron Device Letters, 2023
72023
Composition optimization of HfxZr1-xO2 thin films to achieve the morphotrophic phase boundary for high-k dielectrics
S Oh, H Jang, H Hwang
Journal of Applied Physics 133 (15), 2023
72023
Effect of the Oxygen Composition Control of HfOx Films on Threshold and Memory Switching Characteristics for Hybrid Memory Applications
S Lee, SH Kim, S Oh, D Lee, H Hwang
Advanced Electronic Materials 8 (5), 2101257, 2022
42022
Improved turn-off speed and uniformity of atomic threshold switch device by AgSe electrode and bipolar pulse forming
S Oh, S Lee, H Hwang
IEEE Journal of the Electron Devices Society 9, 864-867, 2021
42021
Two-step deposition of TiN capping electrodes to prevent degradation of ferroelectric properties in an in-situ crystallized TiN/Hf0. 5Zr0. 5O2/TiN device
H Kim, A Kashir, H Jang, S Oh, M Yadav, S Lee, H Hwang
Nano Express 3 (1), 015004, 2022
32022
Multi-level synaptic weight device of vertical cross-point structure in three dimension and fabrication thereof
S Oh, IK Yoo, H Hwang
US Patent 10,418,417, 2019
32019
Demonstration of 1 V Reliable FeRAM Operation: Vc Engineering Using Quasi-Chirality of Hf1–xZrxO2 in a Nanolaminate Structure
H Jang, A Kashir, T Schenk, M Habibi, M Schuster, S Oh, S Müeller, ...
ACS applied materials & interfaces 16 (41), 55627-55636, 2024
22024
Volatile threshold switching devices for hardware security primitives: Exploiting intrinsic variability as an entropy source
W Choi, O Kwon, J Lee, S Oh, S Heo, S Ban, Y Seo, D Kim, H Hwang
Applied Physics Reviews 11 (2), 2024
22024
Enhanced ON/OFF Ratio (4× 105) and Robust Endurance (> 1010) in an InGaZnO/HfxZr1-xO2 Ferroelectric Diode via Defect Engineering
L Jung, S Oh, H Jang, K Lee, W Choi, H Hwang
IEEE Transactions on Electron Devices 71 (3), 2238-2242, 2024
22024
Effects of an interfacial dead layer on the ferroelectric HfZrOx films for low thermal budget
S Oh, H Jang, H Hwang
2022 20th Non-Volatile Memory Technology Symposium (NVMTS), 1-5, 2022
22022
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Articles 1–20