Neural network modeling of reactive ion etching using optical emission spectroscopy data SJ Hong, GS May, DC Park IEEE Transactions on Semiconductor Manufacturing 16 (4), 598-608, 2003 | 118 | 2003 |
Fault Detection and Classification in Plasma Etch Equipment for Semiconductor Manufacturing -Diagnostics SJ Hong, WY Lim, T Cheong, GS May IEEE Transactions on Semiconductor Manufacturing 25 (1), 83-93, 2011 | 93 | 2011 |
Neural network-based real-time malfunction diagnosis of reactive ion etching using in situ metrology data SJ Hong, GS May IEEE transactions on semiconductor manufacturing 17 (3), 408-421, 2004 | 56 | 2004 |
Neural-network-based sensor fusion of optical emission and mass spectroscopy data for real-time fault detection in reactive ion etching SJ Hong, GS May IEEE Transactions on Industrial Electronics 52 (4), 1063-1072, 2005 | 50 | 2005 |
Machine learning-based process-level fault detection and part-level fault classification in semiconductor etch equipment SH Kim, CY Kim, DH Seol, JE Choi, SJ Hong IEEE Transactions on Semiconductor Manufacturing 35 (2), 174-185, 2022 | 37 | 2022 |
Use of plasma information in machine-learning-based fault detection and classification for advanced equipment control DH Kim, SJ Hong IEEE Transactions on Semiconductor Manufacturing 34 (3), 408-419, 2021 | 30 | 2021 |
Artificial immune system for fault detection and classification of semiconductor equipment H Park, JE Choi, D Kim, SJ Hong Electronics 10 (8), 944, 2021 | 29 | 2021 |
Fault detection in reactive ion etching systems using one-class support vector machines T Sarmiento, SJ Hong, GS May IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing …, 2005 | 28 | 2005 |
High-aspect ratio through-silicon vias for the integration of microfluidic cooling with 3D microsystems H Oh, JM Gu, SJ Hong, GS May, MS Bakir Microelectronic Engineering 142, 30-35, 2015 | 27 | 2015 |
Fault diagnosis in semiconductor etch equipment using Bayesian networks JM Nawaz, MZ Arshad, SJ Hong JSTS: Journal of Semiconductor Technology and Science 14 (2), 252-261, 2014 | 23 | 2014 |
Machine learning-based virtual metrology on film thickness in amorphous carbon layer deposition process JE Choi, SJ Hong Measurement: Sensors 16, 100046, 2021 | 22 | 2021 |
Surface Analysis of Chamber Coating Materials Exposed to CF4/O2 Plasma SH Park, KE Kim, SJ Hong Coatings 11 (1), 105, 2021 | 21 | 2021 |
An object-oriented neural network simulator for semiconductor manufacturing applications C Davis, S Hong, R Setia, R Pratap, T Brown, B Ku, G Triplett, G May The 8th world multi-conference on systemics cybernetics informatics 5, 365-370, 2004 | 19 | 2004 |
In-situ monitoring of multiple oxide/nitride dielectric stack PECVD deposition process DB Jang, SJ Hong Transactions on Electrical and Electronic Materials 19, 21-26, 2018 | 18 | 2018 |
Copper pillar tin bump on semiconductor chip and method of forming the same K Lee, SJ Hong US Patent 7,781,325, 2010 | 18 | 2010 |
Characterization of low-temperature SU-8 photoresist processing for MEMS applications SJ Hong, S Choi, Y Choi, M Allen, GS May 2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop …, 2004 | 18 | 2004 |
Virtual metrology for etch profile in silicon trench etching with SF₆/O₂/Ar plasma JE Choi, H Park, Y Lee, SJ Hong IEEE Transactions on Semiconductor Manufacturing 35 (1), 128-136, 2021 | 16 | 2021 |
Surface analysis of amorphous carbon thin film for etch hard mask KP Kim, WS Song, MK Park, SJ Hong Journal of Nanoscience and Nanotechnology 21 (3), 2032-2038, 2021 | 16 | 2021 |
Neural-network-based time series modeling of optical emission spectroscopy data for fault detection in reactive ion etching SJ Hong, GS May Process and Materials Characterization and Diagnostics in IC Manufacturing …, 2003 | 16 | 2003 |
Endpoint detection in low open area TSV fabrication using optical emission spectroscopy JM Gu, PA Thadesar, A Dembla, MS Bakir, GS May, SJ Hong IEEE Transactions on Components, Packaging and Manufacturing Technology 4 (7 …, 2014 | 15 | 2014 |