| Enabling future nanomanufacturing through block copolymer self-assembly: A review C Cummins, R Lundy, JJ Walsh, V Ponsinet, G Fleury, MA Morris Nano Today 35, 100936, 2020 | 197 | 2020 |
| Strategies for inorganic incorporation using neat block copolymer thin films for etch mask function and nanotechnological application C Cummins, T Ghoshal, JD Holmes, MA Morris Advanced Materials 28 (27), 5586-5618, 2016 | 172 | 2016 |
| Large Block Copolymer Self-Assembly for Fabrication of Subwavelength Nanostructures for Applications in Optics P Mokarian-Tabari, R Senthamaraikannan, C Glynn, TW Collins, ... Nano Letters 17 (5), 2973-2978, 2017 | 96 | 2017 |
| Block copolymer directed metamaterials and metasurfaces for novel optical devices A Alvarez‐Fernandez, C Cummins, M Saba, U Steiner, G Fleury, ... Advanced Optical Materials 9 (16), 2100175, 2021 | 72 | 2021 |
| Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer C Cummins, A Gangnaik, RA Kelly, D Borah, J O'Connell, N Petkov, ... Nanoscale 7 (15), 6712-6721, 2015 | 68 | 2015 |
| Controlled solvent vapor annealing of a high χ block copolymer thin film R Lundy, SP Flynn, C Cummins, SM Kelleher, MN Collins, E Dalton, ... Physical Chemistry Chemical Physics 19 (4), 2805-2815, 2017 | 67 | 2017 |
| Electrochemical sensing of hydrogen peroxide using block copolymer templated iron oxide nanopatterns SZ Bas, C Cummins, D Borah, M Ozmen, MA Morris Analytical chemistry 90 (2), 1122-1128, 2018 | 53 | 2018 |
| Using block copolymers as infiltration sites for development of future nanoelectronic devices: Achievements, barriers, and opportunities C Cummins, MA Morris Microelectronic Engineering 195, 74-85, 2018 | 52 | 2018 |
| Study of the Kinetics and Mechanism of Rapid Self-Assembly in Block Copolymer Thin Films during Solvo-Microwave Annealing P Mokarian-Tabari, C Cummins, S Rasappa, C Simao, ... Langmuir 30 (35), 10728-10739, 2014 | 46 | 2014 |
| A Novel Electrochemical Sensor Based on Metal Ion Infiltrated Block Copolymer Thin Films for Sensitive and Selective Determination of Dopamine SZ Bas, C Cummins, A Selkirk, D Borah, M Ozmen, MA Morris ACS Applied Nano Materials 2 (11), 7311-7318, 2019 | 42 | 2019 |
| Self-assembly of polystyrene-block-poly (4-vinylpyridine) block copolymer on molecularly functionalized silicon substrates: fabrication of inorganic nanostructured etchmask for … C Cummins, D Borah, S Rasappa, A Chaudhari, T Ghoshal, ... Journal of Materials Chemistry C 1 (47), 7941-7951, 2013 | 41 | 2013 |
| Solvothermal Vapor Annealing of Lamellar Poly (styrene)-block-poly (d, l-lactide) Block Copolymer Thin Films for Directed Self-Assembly Application C Cummins, P Mokarian-Tabari, P Andreazza, C Sinturel, MA Morris ACS applied materials & interfaces 8 (12), 8295-8304, 2016 | 38 | 2016 |
| Optimization and Control of Large Block Copolymer Self-Assembly via Precision Solvent Vapor Annealing A Selkirk, N Prochukhan, R Lundy, C Cummins, R Gatensby, R Kilbride, ... Macromolecules 54 (3), 1203-1215, 2021 | 32 | 2021 |
| Parallel Arrays of Sub-10 nm Aligned Germanium Nanofins from an In Situ Metal Oxide Hardmask using Directed Self-Assembly of Block Copolymers C Cummins, A Gangnaik, RA Kelly, AJ Hydes, J O’Connell, N Petkov, ... Chemistry of Materials 27 (17), 6091-6096, 2015 | 29 | 2015 |
| Formation of sub-7 nm feature size PS-b-P4VP block copolymer structures by solvent vapour process A Chaudhari, T Ghoshal, MT Shaw, C Cummins, D Borah, JD Holmes, ... Advances in Patterning Materials and Processes XXXI 9051, 905110, 2014 | 29 | 2014 |
| Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography C Cummins, AP Bell, MA Morris Nanomaterials 7 (10), 304, 2017 | 28 | 2017 |
| Optimizing Polymer Brush Coverage To Develop Highly Coherent Sub-5 nm Oxide Films by Ion Inclusion R Lundy, P Yadav, A Selkirk, E Mullen, T Ghoshal, C Cummins, MA Morris Chemistry of Materials 31 (22), 9338-9345, 2019 | 27 | 2019 |
| Enabling Large-Area Selective Deposition on Metal-Dielectric Patterns using Polymer Brush Deactivation C Cummins, T Weingärtner, MA Morris The Journal of Physical Chemistry C 122 (26), 14698-14705, 2018 | 27 | 2018 |
| Morphological evolution of lamellar forming polystyrene-block-poly (4-vinylpyridine) copolymers under solvent annealing T Ghoshal, A Chaudhari, C Cummins, MT Shaw, JD Holmes, MA Morris Soft matter 12 (24), 5429-5437, 2016 | 23 | 2016 |
| Non‐Native Block Copolymer Thin Film Nanostructures Derived from Iterative Self‐Assembly Processes N Demazy, C Cummins, K Aissou, G Fleury Advanced Materials Interfaces 7 (5), 1901747, 2020 | 22 | 2020 |
