| A Robust Ni (II) α-Diimine Catalyst for High Temperature Ethylene Polymerization JL Rhinehart, LA Brown, BK Long Journal of the American Chemical Society 135 (44), 16316-16319, 2013 | 369 | 2013 |
| Semi‐Crystalline Polar Polyethylene: Ester‐Functionalized Linear Polyolefins Enabled by a Functional‐Group‐Tolerant, Cationic Nickel Catalyst BK Long, JM Eagan, M Mulzer, GW Coates Angewandte Chemie 128 (25), 7222-7226, 2016 | 224 | 2016 |
| Enhancing α-Diimine Catalysts for High-Temperature Ethylene Polymerization JL Rhinehart, NE Mitchell, BK Long ACS Catalysis 4 (8), 2501-2504, 2014 | 195 | 2014 |
| Degradable cross-linkers and strippable imaging materials for step-and-flash imprint lithography WH Heath, F Palmieri, JR Adams, BK Long, J Chute, TW Holcombe, ... Macromolecules 41 (3), 719-726, 2008 | 169 | 2008 |
| Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films RL Bruce, F Weilnboeck, T Lin, RJ Phaneuf, GS Oehrlein, BK Long, ... Journal of Applied Physics 107 (8), 084310, 2010 | 133 | 2010 |
| Redox-Active Ligands: An Advanced Tool To Modulate Polyethylene Microstructure WC Anderson Jr, JL Rhinehart, AG Tennyson, BK Long Journal of the American Chemical Society 138 (3), 774-777, 2016 | 122 | 2016 |
| Advances in polymerizations modulated by external stimuli AM Doerr, JM Burroughs, SR Gitter, X Yang, AJ Boydston, BK Long ACS Catalysis 10 (24), 14457-14515, 2020 | 92 | 2020 |
| Recent developments in redox-active olefin polymerization catalysts JM Kaiser, BK Long Coordination Chemistry Reviews 372, 141-152, 2018 | 92 | 2018 |
| Materials for step and flash imprint lithography (S-FIL®) BK Long, BK Keitz, CG Willson Journal of materials Chemistry 17 (34), 3575-3580, 2007 | 91 | 2007 |
| Study of ion and vacuum ultraviolet-induced effects on styrene-and ester-based polymers exposed to argon plasma RL Bruce, S Engelmann, T Lin, T Kwon, RJ Phaneuf, GS Oehrlein, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009 | 79 | 2009 |
| Fundamental optical properties of linear and cyclic alkanes: VUV absorbance and index of refraction EA Costner, BK Long, C Navar, S Jockusch, X Lei, P Zimmerman, ... The Journal of Physical Chemistry A 113 (33), 9337-9347, 2009 | 76 | 2009 |
| Accessing siloxane functionalized polynorbornenes via vinyl-addition polymerization for CO2 separation membranes KR Gmernicki, E Hong, CR Maroon, SM Mahurin, AP Sokolov, T Saito, ... ACS Macro Letters 5 (7), 879-883, 2016 | 67 | 2016 |
| Near-surface modification of polystyrene by Ar+: Molecular dynamics simulations and experimental validation JJ Vegh, D Nest, DB Graves, R Bruce, S Engelmann, T Kwon, RJ Phaneuf, ... Applied Physics Letters 91 (23), 233113, 2007 | 67 | 2007 |
| Substituted polynorbornene membranes: a modular template for targeted gas separations X Wang, TJ Wilson, D Alentiev, M Gringolts, E Finkelshtein, M Bermeshev, ... Polymer Chemistry 12 (20), 2947-2977, 2021 | 65 | 2021 |
| Elimination of CO2/N2 Langmuir Sorption and Promotion of “N2-Phobicity” within High-Tg Glassy Membranes CR Maroon, J Townsend, KR Gmernicki, DJ Harrigan, BJ Sundell, ... Macromolecules 52 (4), 1589-1600, 2019 | 64 | 2019 |
| Recent advances in thermally robust, late transition metal‐catalyzed olefin polymerization NE Mitchell, BK Long Polymer International 68 (1), 14-26, 2019 | 58 | 2019 |
| Effects of Ferrocenyl Proximity and Monomer Presence during Oxidation for the Redox-Switchable Polymerization of l-Lactide LA Brown, JL Rhinehart, BK Long ACS Catalysis 5 (10), 6057-6060, 2015 | 56 | 2015 |
| Molecular dynamics simulations of near-surface modification of polystyrene: Bombardment with Ar+ and Ar+/radical chemistries JJ Végh, D Nest, DB Graves, R Bruce, S Engelmann, T Kwon, RJ Phaneuf, ... Journal of Applied Physics 104 (3), 034308, 2008 | 53 | 2008 |
| Impact of tuning CO2-philicity in polydimethylsiloxane-based membranes for carbon dioxide separation T Hong, S Chatterjee, SM Mahurin, F Fan, Z Tian, D Jiang, BK Long, ... Journal of Membrane Science 530, 213-219, 2017 | 46 | 2017 |
| Design of reversible cross-linkers for step and flash imprint lithography imprint resists F Palmieri, J Adams, B Long, W Heath, P Tsiartas, CG Willson ACS nano 1 (4), 307-312, 2007 | 43 | 2007 |
Tomonori SaitoOak Ridge National LaboratoryVerified email at ornl.gov
