| EUV multilayers for solar physics DL Windt, S Donguy, JF Seely, B Kjornrattanawanich, EM Gullikson, ... Optics for EUV, X-Ray, and Gamma-Ray Astronomy 5168, 1-11, 2004 | 100 | 2004 |
| Advances in multilayer reflective coatings for extreme ultraviolet lithography JA Folta, S Bajt, TW Barbee Jr, RF Grabner, PB Mirkarimi, TD Nguyen, ... Emerging Lithographic Technologies III 3676, 702-709, 1999 | 77 | 1999 |
| Optics for element-resolved soft X-ray magneto-optical studies JB Kortright, M Rice, SK Kim, CC Walton, T Warwick Journal of magnetism and magnetic materials 191 (1-2), 79-89, 1999 | 67 | 1999 |
| Sub-70 nm extreme ultraviolet lithography at the advanced light source static microfield exposure station using the engineering test stand set-2 optic P Naulleau, KA Goldberg, EH Anderson, D Attwood, P Batson, J Bokor, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002 | 64 | 2002 |
| Cell cycle reentry triggers hyperploidization and synaptic dysfunction followed by delayed cell death in differentiated cortical neurons E Barrio-Alonso, A Hernández-Vivanco, CC Walton, G Perea, JM Frade Scientific reports 8 (1), 14316, 2018 | 58 | 2018 |
| Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography R Soufli, RM Hudyma, E Spiller, EM Gullikson, MA Schmidt, JC Robinson, ... Applied optics 46 (18), 3736-3746, 2007 | 58 | 2007 |
| Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution R Soufli, EA Spiller, MA Schmidt, C Davidson, RF Grabner, EM Gullikson, ... Emerging Lithographic Technologies V 4343, 51-59, 2001 | 57 | 2001 |
| The national ignition facility modular kirkpatrick-baez microscope LA Pickworth, J Ayers, P Bell, NF Brejnholt, JG Buscho, D Bradley, ... Review of Scientific Instruments 87 (11), 2016 | 49 | 2016 |
| Evaluation of the capability of a multibeam confocal inspection system for inspection of EUVL mask blanks AR Stivers, T Liang, MJ Penn, B Lieberman, GV Shelden, JA Folta, ... 22nd Annual BACUS Symposium on Photomask Technology 4889, 408-417, 2002 | 43 | 2002 |
| Normal-incidence reflectance of optimized W/B4C x-ray multilayers in the range 1.4 nm < λ < 2.4 nm DL Windt, EM Gullikson, CC Walton Optics letters 27 (24), 2212-2214, 2002 | 43 | 2002 |
| X-ray optical multilayers: Microstructure limits on reflectivity at ultra-short periods CC Walton, G Thomas, JB Kortright Acta materialia 46 (11), 3767-3775, 1998 | 43 | 1998 |
| A Kirkpatrick-Baez microscope for the national ignition facility LA Pickworth, T McCarville, T Decker, T Pardini, J Ayers, P Bell, D Bradley, ... Review of Scientific Instruments 85 (11), 2014 | 37 | 2014 |
| A new approach to foam-lined indirect-drive NIF ignition targets J Biener, C Dawedeit, SH Kim, T Braun, MA Worsley, AA Chernov, ... Nuclear Fusion 52 (6), 062001, 2012 | 36 | 2012 |
| Spontaneously intermixed Al-Mg barriers enable corrosion-resistant Mg/SiC multilayer coatings R Soufli, M Fernández-Perea, SL Baker, JC Robinson, J Alameda, ... Applied Physics Letters 101 (4), 2012 | 33 | 2012 |
| Tuning the rheological properties of sols for low-density aerogel coating applications C Dawedeit, SH Kim, T Braun, MA Worsley, SA Letts, KJ Wu, CC Walton, ... Soft Matter 8 (13), 3518-3521, 2012 | 31 | 2012 |
| Use of ion beams for protecting substrates from particulate defect contamination in ultra-low-defect coating processes C Walton, J Folta US Patent App. 10/254,119, 2004 | 31 | 2004 |
| Boron–carbide barrier layers in scandium–silicon multilayers AF Jankowski, CK Saw, CC Walton, JP Hayes, J Nilsen Thin Solid Films 469, 372-376, 2004 | 29 | 2004 |
| Effect of silica overlayers on laser damage of HfO2-SiO2 56 degrees incidence high reflectors CC Walton, FY Genin, R Chow, MR Kozlowski, GE Loomis, EL Pierce 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical …, 1996 | 29 | 1996 |
| Primary neurons can enter M-phase CC Walton, W Zhang, I Patiño-Parrado, E Barrio-Alonso, JJ Garrido, ... Scientific reports 9 (1), 4594, 2019 | 28 | 2019 |
| Advances in low-defect multilayers for EUVL mask blanks JA Folta, JC Davidson, CC Larson, CC Walton, PA Kearney Emerging Lithographic Technologies VI 4688, 173-181, 2002 | 28 | 2002 |