Shahid Rauf

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Jason KenneyApplied MaterialsVerified email at amat.com
Ken CollinsMaster, VP and Fellow at Applied MaterialsVerified email at amat.com
Mark J. KushnerUniversity of MichiganVerified email at umich.edu
Leonid DorfApplied MaterialsVerified email at amat.com
Samer BannaTechnion, Israel Institute of Technology, Applied MaterialsVerified email at amat.com
Mingfeng WuZenStone Venture CapitalVerified email at utexas.edu
Julian SchulzeProfessor (Ruhr-University Bochum)Verified email at aept.rub.de
Jun-Chieh WangApplied Materials, University of MichiganVerified email at umich.edu
Igor KaganovichPrinceton University, Princeton Plasma Physics LaboratoryVerified email at pppl.gov
S. Samukawa, Seiji SamukawaInstitute of Fluid Science and Advanced Institute for Material Research, Tohoku UniversityVerified email at ifs.tohoku.ac.jp
Thorsten LillClarycon Nanotechnology ResearchVerified email at claryconresearch.com
Syed M. AlamEverspin Technologies, Inc.Verified email at alum.mit.edu
David R. BorisResearch Physicist, U. S. Naval Research LaboratoryVerified email at nrl.navy.mil
Scott G WaltonNaval Research LaboratoryVerified email at nrl.navy.mil
Prof. Dr. Marius OrlowskiVirginia Tech, Bradly Department of Electrical and Computer EngineeeringVerified email at vt.edu
Ken HaraStanford UniversityVerified email at stanford.edu
Aaron TheanNational University of SingaporeVerified email at nus.edu.sg
Amr HaggagDistinguished Technical Staff, Corporate Quality, Freescale SemiconductorVerified email at freescale.com

Shahid Rauf

Applied Materials, Inc.

Verified email at amat.com

Plasma Science Computational Modeling Semiconductor Manufacturing


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The 2017 Plasma Roadmap: Low temperature plasma science and technology I Adamovich, SD Baalrud, A Bogaerts, PJ Bruggeman, M Cappelli, ... Journal of Physics D: Applied Physics 50 (32), 323001, 2017	1075	2017
The 2012 plasma roadmap S Samukawa, M Hori, S Rauf, K Tachibana, P Bruggeman, G Kroesen, ... Journal of Physics D: Applied Physics 45 (25), 253001, 2012	840	2012
Dual mode inductively coupled plasma reactor with adjustable phase coil assembly S Banna, VN Todorow, KS Collins, A Nguyen, MJ Salinas, Z Chen, ... US Patent App. 12/821,636, 2011	536	2011
Etch method in the manufacture of an integrated circuit TG Sparks, R Shahid US Patent App. 12/377,348, 2011	476	2011
Symmetric plasma process chamber JD Carducci, H Tavassoli, A Balakrishna, Z Chen, A Nguyen, ... US Patent 9,741,546, 2017	393	2017
Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution K Bera, S Rauf US Patent App. 12/004,448, 2009	374	2009
Process for wafer backside polymer removal and wafer front side photoresist removal KS Collins, H Hanawa, A Nguyen, S Rauf, A Balakrishna, VN Todorow, ... US Patent 7,967,996, 2011	346	2011
Inductively coupled plasma source with symmetrical RF feed JA Kenney, JD Carducci, KS Collins, R Fovell, K Ramaswamy, S Rauf US Patent 9,928,987, 2018	334	2018
Dynamics of a coplanar-electrode plasma display panel cell. I. Basic operation S Rauf, MJ Kushner Journal of applied physics 85 (7), 3460-3469, 1999	316	1999
Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding JA Kenney, JD Carducci, KS Collins, R Fovell, K Ramaswamy, S Rauf US Patent 10,170,279, 2019	292	2019
Fast atomic layer etch process using an electron beam A Agarwal, S Rauf, K Ramaswamy US Patent 9,362,131, 2016	291	2016
Plasma reactor gas distribution plate with radially distributed path splitting manifold K Bera, S Rauf US Patent 8,512,509, 2013	244	2013
Argon metastable densities in radio frequency Ar, and electrical discharges S Rauf, MJ Kushner Journal of applied physics 82 (6), 2805-2813, 1997	241	1997
Independent control of RF phases of separate coils of an inductively coupled plasma reactor KS Collins, S Kobayashi, L Wong, J Liu, Y Yang, K Ramaswamy, S Rauf US Patent 9,161,428, 2015	236	2015
Two-phase operation of plasma chamber by phase locked loop S Kobayashi, L Wong, J Liu, Y Yang, K Ramaswamy, S Rauf, SC Nevil, ... US Patent App. 13/632,302, 2013	202	2013
Feol low-k spacers KS Collins, K Ramaswamy, Y Zhang, H Chang, L Dorf, MF Wu, S Rauf US Patent App. 14/323,855, 2016	171	2016
Pulsed plasma high aspect ratio dielectric process A Agarwal, KS Collins, S Rauf, K Ramaswamy, TB Lill US Patent 8,382,999, 2013	163	2013
Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources S Rauf, MJ Kushner IEEE Transactions on Plasma Science 27 (5), 1329-1338, 1999	156	1999
Synchronized radio frequency pulsing for plasma etching B Liao, K Kawasaki, Y Pattar, SF Shoji, DD Nguyen, K Ramaswamy, ... US Patent 8,962,488, 2015	155	2015
Workpiece support for a plasma reactor with controlled apportionment of rf power to a process kit ring KS Collins, DA Buchberger Jr, K Ramaswamy, S Rauf, H Hanawa, JY Sun, ...	138	2010

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