| Metal–semiconductor–metal metasurface for multiband infrared stealth technology using camouflage color pattern in visible range J Kim, C Park, JW Hahn Advanced Optical Materials 10 (6), 2101930, 2022 | 103 | 2022 |
| Selective emitter with engineered anisotropic radiation to minimize dual-band thermal signature for infrared stealth technology C Park, J Kim, JW Hahn ACS Applied Materials & Interfaces 12 (38), 43090-43097, 2020 | 37 | 2020 |
| Integrated infrared signature management with multispectral selective absorber via single‐port grating resonance C Park, J Kim, JW Hahn Advanced Optical Materials 9 (13), 2002225, 2021 | 18 | 2021 |
| Quantitative analysis and modeling of line edge roughness in near-field lithography: toward high pattern quality in nanofabrication D Han, C Park, S Oh, H Jung, JW Hahn Nanophotonics 8 (5), 879-888, 2019 | 11 | 2019 |
| Characterization of three-dimensional field distribution of bowtie aperture using quasi-spherical waves and surface plasmon polaritons C Park, H Jung, JW Hahn Scientific reports 7 (1), 45352, 2017 | 6 | 2017 |
| Nanoscale 2.5-dimensional surface patterning with plasmonic lithography H Jung, C Park, S Oh, JW Hahn Scientific reports 7 (1), 9721, 2017 | 5 | 2017 |
| Ultrahigh Nonlinear Responses from MXene Plasmons in the Short‐Wave Infrared Range C Park, NR Park, J Kwon, H Kim, Y Gogotsi, CM Koo, MK Kim Advanced Materials, 2309189, 2024 | 4 | 2024 |
| Theoretical analysis of high-efficient dielectric nanofocusing for the generation of a brightness light source C Park, S Oh, JW Hahn Scientific reports 9 (1), 8207, 2019 | 4 | 2019 |
| Analysis of line-edge roughness due to the stick/slip motion of a contact-mode scanning probe in plasmonic lithography C Park, J Jang, JW Hahn Journal of Micro/Nanolithography, MEMS, and MOEMS 13 (4), 043020-043020, 2014 | 2 | 2014 |
| Shortwave infrared surface plasmons in multilayered two-dimensional Ti3C2T x MXenes J Kwon, C Park, H Kim, NR Park, CM Koo, MK Kim 2D Materials 10 (3), 035028, 2023 | 1 | 2023 |
| Calibration of exposure dose for nanoscale plasmonic lithography with microsized far-field spot patterns D Han, C Park, H Jung, JW Hahn Journal of Micromechanics and Microengineering 26 (9), 095001, 2016 | 1 | 2016 |
