Muharrem Bayraktar

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Oscar O. VersolatoGroup leader and Head of Department, Advanced Research Center for Nanolithography (ARCNL)Dirección de correo verificada de arcnl.nl
WMG UbachsProfessor of Physics, VU AmsterdamDirección de correo verificada de vu.nl
Ronnie HoekstraZernike Institute for Advanced Materials, University of GroningenDirección de correo verificada de rug.nl
Ruben SchuppARCNLDirección de correo verificada de arcnl.nl
John SheilDirección de correo verificada de arcnl.nl
Zoi BouzaPhDDirección de correo verificada de arcnl.nl
Francesco TorrettiPhD student, Advanced Research Center for NanolithographyDirección de correo verificada de arcnl.nl
Stefan WitteProfessor, Optics for Nanoscale Metrology, Delft University of TechnologyDirección de correo verificada de tudelft.nl
Fei Liu (刘飞) ORCID: 0000-0003-412...ASMLDirección de correo verificada de ucdavis.edu
Randy A. MeijerAdvanced Research Center for NanolithographyDirección de correo verificada de arcnl.nl
Guus RijndersProfessor Nano Electronic MaterialsDirección de correo verificada de utwente.nl
Meric OzcanDirección de correo verificada de sabanciuniv.edu
Klaus-Jochen BollerUniversity of TwenteDirección de correo verificada de utwente.nl
Yahia MostafaARCNLDirección de correo verificada de arcnl.nl
Zeudi MazzottaASML, Veldhoven, The NetherlandsDirección de correo verificada de asml.com
Kjeld S. E. EikemaVU University Amsterdam, LaserLaB, De Boelelaan 1081, 1081 HV Amsterdam, The NetherlandsDirección de correo verificada de vu.nl
Dmitry KurilovichASMLDirección de correo verificada de asml.com
James ColganLos Alamos National LaboratoryDirección de correo verificada de lanl.gov
Mohammadreza NematollahiInstitute of Molecules and Materials, Radboud UniversityDirección de correo verificada de science.ru.nl
Chintan ShahNASA Goddard Space Flight CenterDirección de correo verificada de nasa.gov

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Muharrem Bayraktar

Assistant Professor, University of Twente

Dirección de correo verificada de utwente.nl - Página principal

EUV Optics Piezoelectric Thin Films Adaptive Optics Wavefront Sensors Spectrometers


Título Ordenar por citas Ordenar por año Ordenar por título	Citado por Citado por	Año
Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography F Torretti, J Sheil, R Schupp, MM Basko, M Bayraktar, RA Meijer, S Witte, ... Nature communications 11 (1), 2334, 2020	106	2020
Efficient Generation of Extreme Ultraviolet Light From :YAG-Driven Microdroplet-Tin Plasma R Schupp, F Torretti, RA Meijer, M Bayraktar, J Scheers, D Kurilovich, ... Physical review applied 12 (1), 014010, 2019	67	2019
Method to calculate the far field of three-dimensional objects for computer-generated holography M Bayraktar, M Özcan Applied Optics 49 (24), 4647-4654, 2010	64	2010
Extreme ultraviolet light from a tin plasma driven by a 2-µm-wavelength laser L Behnke, R Schupp, Z Bouza, M Bayraktar, Z Mazzotta, R Meijer, J Sheil, ... Optics Express 29 (3), 4475-4487, 2021	53	2021
High-power EUV lithography: spectral purity and imaging performance M van de Kerkhof, F Liu, M Meeuwissen, X Zhang, M Bayraktar, R de Kruif, ... Journal of micro/nanolithography, MEMS, and MOEMS 19 (3), 033801-033801, 2020	37	2020
Radiation transport and scaling of optical depth in Nd: YAG laser-produced microdroplet-tin plasma R Schupp, F Torretti, RA Meijer, M Bayraktar, J Sheil, J Scheers, ... Applied physics letters 115 (12), 2019	36	2019
Characterization of angularly resolved EUV emission from 2-µm-wavelength laser-driven Sn plasmas using preformed liquid disk targets R Schupp, L Behnke, Z Bouza, Z Mazzotta, Y Mostafa, A Lassise, L Poirier, ... Journal of Physics D: Applied Physics 54, 365103, 2021	32	2021
Spectral characterization of an industrial EUV light source for nanolithography F Torretti, F Liu, M Bayraktar, J Scheers, Z Bouza, W Ubachs, R Hoekstra, ... Journal of Physics D: Applied Physics, 2019	28	2019
Characterization of 1- and 2-μm-wavelength laser-produced microdroplet-tin plasma for generating extreme-ultraviolet light R Schupp, L Behnke, J Sheil, Z Bouza, M Bayraktar, W Ubachs, ... Physical Review Research 3, 013294, 2021	27	2021
Nanosheet controlled epitaxial growth of PbZr0.52Ti0.48O3 thin films on glass substrates M Bayraktar, A Chopra, F Bijkerk, G Rijnders Applied Physics Letters 105 (13), 132904, 2014	26	2014
Digital holography image reconstruction methods M Özcan, M Bayraktar SPIE Proceedings, 72330B, 2009	25	2009
Ion‐Selective Ionic Polymer Metal Composite (IPMC) Actuator Based on Crown Ether Containing Sulfonated Poly (Arylene Ether Ketone) S Tas, B Zoetebier, OS Sukas, M Bayraktar, M Hempenius, GJ Vancso, ... Macromolecular Materials and Engineering 302 (4), 2017	22	2017
EUV spectroscopy of Sn5+–Sn10+ ions in an electron beam ion trap and laser-produced plasmas Z Bouza, J Scheers, A Ryabtsev, R Schupp, L Behnke, C Shah, J Sheil, ... Journal of Physics B: Atomic, Molecular and Optical Physics 53 (19), 195001, 2020	16	2020
EUV Mirror Arrangement, Optical System Comprising EUV Mirror Arrangement and Method for Operating an Optical System Comprising an EUV Mirror Arrangement U Dinger, F Bijkerk, M Bayraktar, O Dier WO Patent 2,012,126,954, 2012	16*	2012
Tuning of large piezoelectric response in nanosheet-buffered lead zirconate titanate films on glass substrates A Chopra, M Bayraktar, M Nijland, JE Elshof, F Bijkerk, G Rijnders Scientific Reports 7, 251, 2017	14	2017
Spectral purification and infrared light recycling in extreme ultraviolet lithography sources M Bayraktar, FA van Goor, KJ Boller, F Bijkerk Optics Express 22 (7), 8633-8639, 2014	14	2014
The spectrum of a 1-µm-wavelength-driven tin microdroplet laser-produced plasma source in the 5.5–265.5 nm wavelength range Z Bouza, J Byers, J Scheers, R Schupp, Y Mostafa, L Behnke, Z Mazzotta, ... AIP Advances 11 (12), 125003, 2021	12	2021
Broadband transmission grating spectrometer for measuring the emission spectrum of EUV sources M Bayraktar, HMJ Bastiaens, C Bruineman, B Vratzov, F Bijkerk NEVAC blad 54, 14-19, 2016	12	2016
Wavefront correction in the extreme ultraviolet wavelength range using piezoelectric thin films M Bayraktar, A Chopra, G Rijnders, K Boller, F Bijkerk Optics Express 22 (25), 30623-30632, 2014	11	2014
Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths M Bayraktar, WA Wessels, CJ Lee, FA Goor, G Koster, G Rijnders, ... Journal of Physics D: Applied physics 45, 494001, 2012	10	2012

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