| Recombination of chlorine atoms on plasma-conditioned stainless steel surfaces in the presence of adsorbed Cl2 L Stafford, R Khare, J Guha, VM Donnelly, JS Poirier, J Margot Journal of Physics D: Applied Physics 42 (5), 055206, 2009 | 45 | 2009 |
| Experimental and modeling study of O and Cl atoms surface recombination reactions in O2 and Cl2 plasmas L Stafford, J Guha, R Khare, S Mattei, O Boudreault, B Clain, VM Donnelly Pure and Applied Chemistry 82 (6), 1301-1315, 2010 | 31 | 2010 |
| Interactions of chlorine plasmas with silicon chloride-coated reactor walls during and after silicon etching R Khare, A Srivastava, VM Donnelly Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30 (5 …, 2012 | 20 | 2012 |
| Effect of Cu contamination on recombination of O atoms on a plasma-oxidized silicon surface J Guha, R Khare, L Stafford, VM Donnelly, S Sirard, EA Hudson Journal of Applied Physics 105 (11), 113309, 2009 | 20 | 2009 |
| Cl atom recombination on silicon oxy-chloride layers deposited on chamber walls in chlorine–oxygen plasmas R Khare, A Srivastava, VM Donnelly Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30 (5 …, 2012 | 16 | 2012 |
| Electron energy distribution functions in low-pressure oxygen plasma columns sustained by propagating surface waves L Stafford, R Khare, VM Donnelly, J Margot, M Moisan Applied Physics Letters 94 (2), 021503, 2009 | 15 | 2009 |
| Nonlocal effect of plasma resonances on the electron energy-distribution function in microwave plasma columns O Boudreault, S Mattei, L Stafford, J Margot, M Moisan, R Khare, ... Physical Review E 86 (1), 015402, 2012 | 13 | 2012 |
| Characterization of a low-pressure chlorine plasma column sustained by propagating surface waves using phase-sensitive microwave interferometry and trace-rare-gas optical … S Mattei, O Boudreault, R Khare, L Stafford, VM Donnelly Journal of Applied Physics 109 (11), 113304, 2011 | 10 | 2011 |
| Effect of titanium contamination on oxygen atom recombination probability on plasma conditioned surfaces AK Srivastava, R Khare, VM Donnelly Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 31 (6 …, 2013 | 2 | 2013 |
| Interactions of Chlorine and Oxygen-containing Plasmas with Etching Product-coated Reactor Walls, Studied by the Spinning Wall Technique R Khare University of Houston, Dissertation, 2012 | | 2012 |
| Experimental and modeling study of recombination reactions on dynamic surfaces in low-pressure plasmas L Stafford, O Boudreault, R Khare, VM Donnelly ISPC-19 proceedings, 2011 | | 2011 |
| In-situ Surface Recombination Measurement of Oxygen and Chlorine Atoms on Dynamic Stainless Steel Surfaces in Inductively Coupled O2 and Cl2 Plasmas L Stafford, R Khare, J Guha, VM Donnelly ECS Transactions 13 (8), 23-32, 2008 | | 2008 |
| Electron energy distribution function in low-pressure argon plasmas sustained by surface waves L Stafford, D Lapierre, N Eddine, R Khare, V Donnelly APS Meeting Abstracts, 2008 | | 2008 |