| Low-thermal-budget (300° C) ferroelectric TiN/Hf0. 5Zr0. 5O2/TiN capacitors realized using high-pressure annealing SJ Kim, YC Jung, J Mohan, HJ Kim, SM Rho, MS Kim, JG Yoo, HR Park, ... Applied Physics Letters 119 (24), 2021 | 25 | 2021 |
| Low temperature thermal atomic layer deposition of aluminum nitride using hydrazine as the nitrogen source YC Jung, SM Hwang, DN Le, ALN Kondusamy, J Mohan, SW Kim, JH Kim, ... Materials 13 (15), 3387, 2020 | 22 | 2020 |
| Application of single-pulse charge pumping method on evaluation of indium gallium zinc oxide thin-film transistors MC Nguyen, AHT Nguyen, H Ji, J Cheon, JH Kim, KM Yu, SY Cho, ... IEEE Transactions on Electron Devices 65 (9), 3786-3790, 2018 | 19 | 2018 |
| Electrical characterization of the self-heating effect in oxide semiconductor thin-film transistors using pulse-based measurements MC Nguyen, N On, H Ji, AHT Nguyen, S Choi, J Cheon, KM Yu, SY Cho, ... IEEE Transactions on Electron Devices 65 (6), 2492-2497, 2018 | 15 | 2018 |
| Toward low-thermal-budget Hafnia-based ferroelectrics via atomic layer deposition JH Kim, T Onaya, HR Park, YC Jung, DN Le, M Lee, H Hernandez-Arriaga, ... ACS Applied Electronic Materials 5 (9), 4726-4745, 2023 | 11 | 2023 |
| Low-Temperature Fabrication of High Quality Gate Insulator in Metal–Oxide–Semiconductor Capacitor Using Laser Annealing KM Yu, HM Ji, MC Nguyen, AHT Nguyen, SJ Choi, JG Cheon, JH Kim, ... IEEE Electron Device Letters 40 (2), 167-170, 2019 | 11 | 2019 |
| Robust low-temperature (350° C) ferroelectric Hf0. 5Zr0. 5O2 fabricated using anhydrous H2O2 as the ALD oxidant YC Jung, JH Kim, H Hernandez-Arriaga, J Mohan, SM Hwang, DN Le, ... Applied Physics Letters 121 (22), 2022 | 9 | 2022 |
| Atomic layer deposition and its derivatives for extreme ultraviolet (EUV) photoresist applications DN Le, T Park, SM Hwang, JH Kim, YC Jung, N Tiwale, A Subramanian, ... Japanese Journal of Applied Physics 62 (SG), SG0812, 2023 | 8 | 2023 |
| Relaxation Induced by Imprint Phenomena in Low-Temperature (400 °C) Processed Hf0.5Zr0.5O2-Based Metal-Ferroelectric-Metal Capacitors J Mohan, YC Jung, H Hernandez-Arriaga, JH Kim, T Onaya, A Sahota, ... ACS Applied Electronic Materials 4 (4), 1405-1414, 2022 | 8 | 2022 |
| Solution-processed Rb-doped indium zinc oxide thin-film transistors SW Kim, MC Nguyen, AHT Nguyen, SJ Choi, HM Ji, JG Cheon, KM Yu, ... IEEE Electron Device Letters 39 (9), 1330-1333, 2018 | 8 | 2018 |
| Hafnium oxide-based ferroelectric devices for in-memory computing: resistive and capacitive approaches M Lee, DM Narayan, JH Kim, DN Le, S Shirodkar, S Park, J Kang, S Lee, ... ACS Applied Electronic Materials 6 (8), 5391-5401, 2024 | 6 | 2024 |
| Low-temperature dopant activation using nanosecond ultra-violet laser annealing for monolithic 3D integration JH Kim, HM Ji, MC Nguyen, AHT Nguyen, SW Kim, JY Baek, J Kim, ... Thin Solid Films 735, 138864, 2021 | 6 | 2021 |
| BEOL compatible ultra-low operating voltage (0.5 V) and preconfigured switching polarization states in effective 3 nm ferroelectric HZO capacitors M Lee, JH Kim, DN Le, S Lee, SU Song, R Choi, Y Ahn, SW Ryu, PR Cha, ... 2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and …, 2024 | 4 | 2024 |
| A Novel Combinatorial Approach to the Ferroelectric Properties in HfxZr1−xO2 Deposited by Atomic Layer Deposition YC Jung, J Mohan, SM Hwang, JH Kim, DN Le, A Sahota, N Kim, ... physica status solidi (RRL)–Rapid Research Letters 15 (5), 2100053, 2021 | 4 | 2021 |
| Silver-doped tin oxide for electrical property enhancement in p-type channel thin film transistor AHT Nguyen, MC Nguyen, H Ji, J Cheon, K Yu, J Kim, S Kim, S Cho, ... Journal of Vacuum Science & Technology B 36 (6), 2018 | 3 | 2018 |
| Strategy for low temperature HZO ferroelectric capacitors for back-end of line applications JH Kim, M Lee, S Lee, YC Jung, R Chor, HJ Kim, SJ Kim, J Kim 2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM), 1-3, 2023 | 2 | 2023 |
| Optimal Nitrogen Incorporation in Nickel Silicide for Thermally Stable Contact Formation HM Ji, MC Nguyen, AHT Nguyen, J Cheon, JH Kim, KM Yu, SW Kim, ... Journal of Nanoscience and Nanotechnology 19 (10), 6468-6472, 2019 | 2 | 2019 |
| Deposition of Fine Linewidth Silver Layer using a Modified Laser-induced Forward Transfer Technique J Cheon, MC Nguyen, AHT Nguyen, S Choi, HM Ji, SW Kim, KM Yu, ... Journal of the Korean Physical Society 73, 1279-1282, 2018 | 2 | 2018 |
| (Digital Presentation) Evaluation of the O3 and H2o Oxidants in Downscaling Eot of Ferroelectric Hf0.5Zr0.5O2 on Silicon H Hernandez-Arriaga, J Mohan, YC Jung, JH Kim, CH Rho, R Choi, J Kim Electrochemical Society Meeting Abstracts 241, 1074-1074, 2022 | 1 | 2022 |
| Effect of strontium doping on indium zinc oxide thin film transistors fabricated by low-temperature solution process JH Kim, MC Nguyen, AHT Nguyen, SW Kim, SJ Choi, JG Cheon, HM Ji, ... Journal of Vacuum Science & Technology B 37 (3), 2019 | 1 | 2019 |
Rino ChoiProfessor of Materials Science and Eng., Inha UniversityVahvistettu sähköpostiosoite verkkotunnuksessa inha.ac.kr