| Low temperature thermal atomic layer deposition of aluminum nitride using hydrazine as the nitrogen source YC Jung, SM Hwang, DN Le, ALN Kondusamy, J Mohan, SW Kim, JH Kim, ... Materials 13 (15), 3387, 2020 | 22 | 2020 |
| Plasma-Enhanced Atomic-Layer Deposition of Nanometer-Thick SiNx Films Using Trichlorodisilane for Etch-Resistant Coatings SM Hwang, HS Kim, DN Le, AV Ravichandran, A Sahota, J Lee, YC Jung, ... ACS Applied Nano Materials 4 (3), 2558-2564, 2021 | 12 | 2021 |
| Toward low-thermal-budget Hafnia-based ferroelectrics via atomic layer deposition JH Kim, T Onaya, HR Park, YC Jung, DN Le, M Lee, H Hernandez-Arriaga, ... ACS Applied Electronic Materials 5 (9), 4726-4745, 2023 | 11 | 2023 |
| Robust low-temperature (350° C) ferroelectric Hf0. 5Zr0. 5O2 fabricated using anhydrous H2O2 as the ALD oxidant YC Jung, JH Kim, H Hernandez-Arriaga, J Mohan, SM Hwang, DN Le, ... Applied Physics Letters 121 (22), 2022 | 9 | 2022 |
| Atomic layer deposition and its derivatives for extreme ultraviolet (EUV) photoresist applications DN Le, T Park, SM Hwang, JH Kim, YC Jung, N Tiwale, A Subramanian, ... Japanese Journal of Applied Physics 62 (SG), SG0812, 2023 | 8 | 2023 |
| Chemical reactions induced by low-energy electron exposure on a novel inorganic-organic hybrid dry EUV photoresist deposited by molecular atomic layer deposition (MALD) DN Le, SM Hwang, J Woo, S Choi, T Park, JF Veyan, N Tiwale, ... International Conference on Extreme Ultraviolet Lithography 2022 12292, 27-32, 2022 | 8 | 2022 |
| Relaxation Induced by Imprint Phenomena in Low-Temperature (400 °C) Processed Hf0.5Zr0.5O2-Based Metal-Ferroelectric-Metal Capacitors J Mohan, YC Jung, H Hernandez-Arriaga, JH Kim, T Onaya, A Sahota, ... ACS Applied Electronic Materials 4 (4), 1405-1414, 2022 | 8 | 2022 |
| Hafnium oxide-based ferroelectric devices for in-memory computing: resistive and capacitive approaches M Lee, DM Narayan, JH Kim, DN Le, S Shirodkar, S Park, J Kang, S Lee, ... ACS Applied Electronic Materials 6 (8), 5391-5401, 2024 | 6 | 2024 |
| BEOL compatible ultra-low operating voltage (0.5 V) and preconfigured switching polarization states in effective 3 nm ferroelectric HZO capacitors M Lee, JH Kim, DN Le, S Lee, SU Song, R Choi, Y Ahn, SW Ryu, PR Cha, ... 2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and …, 2024 | 4 | 2024 |
| High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1, 1, 1-tris (dimethylamino) disilane SM Hwang, HS Kim, DN Le, A Sahota, J Lee, YC Jung, SW Kim, SJ Kim, ... Journal of Vacuum Science & Technology A 40 (2), 2022 | 4 | 2022 |
| A Novel Combinatorial Approach to the Ferroelectric Properties in HfxZr1−xO2 Deposited by Atomic Layer Deposition YC Jung, J Mohan, SM Hwang, JH Kim, DN Le, A Sahota, N Kim, ... physica status solidi (RRL)–Rapid Research Letters 15 (5), 2100053, 2021 | 4 | 2021 |
| Photochemical study of metal infiltrated e-beam resist using vapor-phase infiltration for EUV applications SM Hwang, AR Gummadelly, DN Le, YC Jung, JF Veyan, NM Tiwale, ... Proc. spie 11854, 118541C, 2021 | 3 | 2021 |
| Highly reliable selection behavior with controlled Ag doping of nano-polycrystalline ZnO Layer for 3D X-Point framework A Sahota, HS Kim, J Mohan, YC Jung, H Hernandez-Arriaga, DN Le, ... IEEE Electron Device Letters 43 (1), 21-24, 2021 | 2 | 2021 |
| Nano-polycrystalline Ag-doped ZnO layer for steep-slope threshold switching selectors A Sahota, HS Kim, J Mohan, DN Le, YC Jung, SJ Kim, JS Lee, J Ahn, ... AIP Advances 11 (11), 2021 | 2 | 2021 |
| Atomic layer deposition derived organic-inorganic hybrid EUV photoresists A Subramanian, DN Le, SM Hwang, N Tiwale, WI Lee, K Kisslinger, M Lu, ... Advances in Patterning Materials and Processes XL 12498, 1249810, 2023 | 1 | 2023 |
| Impact of Tetrakis (ethylmethylamino)-based precursor and oxygen source selection on atomic layer deposition of ferroelectric HfxZr1-xO2 thin films JH Kim, S Song, DM Narayan, DN Le, TTH Chu, M Lee, G Park, S Lee, ... Applied Surface Science 686, 162197, 2025 | | 2025 |
| Electron-induced chemical transformation of vapor-phase synthesized hybrid resist materials for EUV and beyond EUV lithography DN Le, JF Veyan, TTH Chu, LA Wilson, L Pham, HD Sung, WI Lee, ... MRS Advances, 1-6, 2024 | | 2024 |
| Understanding the stability of advanced inorganic-organic hybrid thin films for advanced resist applications DN Le, TTH Chu, JH Kim, JF Veyan, WI Lee, N Tiwale, M Lee, S Choi, ... Advances in Patterning Materials and Processes XLI 12957, 31-37, 2024 | | 2024 |
Jiyoung KimProfessor, Department of Materials Science and Engineering, University of Texas at DallasVahvistettu sähköpostiosoite verkkotunnuksessa utdallas.edu