InAs-Al hybrid devices passing the topological gap protocol M Aghaee, A Akkala, Z Alam, R Ali, A Alcaraz Ramirez, M Andrzejczuk, ... Physical Review B 107 (24), 245423, 2023 | 164 | 2023 |
Area-Selective Atomic Layer Deposition of In2O3:H Using a μ-Plasma Printer for Local Area Activation A Mameli, Y Kuang, M Aghaee, CK Ande, B Karasulu, M Creatore, ... Chemistry of Materials 29 (3), 921-925, 2017 | 87 | 2017 |
Low temperature growth of gallium oxide thin films via plasma enhanced atomic layer deposition R O'Donoghue, J Rechmann, M Aghaee, D Rogalla, HW Becker, ... Dalton Transactions 46 (47), 16551-16561, 2017 | 73 | 2017 |
Low temperature temporal and spatial atomic layer deposition of TiO2 films M Aghaee, PS Maydannik, P Johansson, J Kuusipalo, M Creatore, ... Journal of Vacuum Science & Technology A 33 (4), 2015 | 58 | 2015 |
TiO2 thin film patterns prepared by chemical vapor deposition and atomic layer deposition using an atmospheric pressure microplasma printer M Aghaee, J Verheyen, AAE Stevens, WMM Kessels, M Creatore Plasma Processes and Polymers 16 (12), 1900127, 2019 | 32 | 2019 |
On the role of micro-porosity in affecting the environmental stability of atomic/molecular layer deposited (ZnO) a (Zn–O–C 6 H 4–O) b films M Aghaee, JP Niemelä, WMM Kessels, M Creatore Dalton Transactions 48 (10), 3496-3505, 2019 | 29 | 2019 |
On the Properties of Nanoporous SiO2 Films for Single Layer Antireflection Coating L Ghazaryan, Y Sekman, S Schröder, C Mühlig, I Stevanovic, R Botha, ... Advanced Engineering Materials 21 (6), 1801229, 2019 | 24 | 2019 |
Synthesis of Micro‐ and Nanomaterials in CO2 and CO Dielectric Barrier Discharges I Belov, J Vanneste, M Aghaee, S Paulussen, A Bogaerts Plasma Processes and Polymers 14 (3), 1600065, 2017 | 23 | 2017 |
A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD M Gebhard, F Mitschker, C Hoppe, M Aghaee, D Rogalla, M Creatore, ... Plasma Processes and Polymers 15 (5), 1700209, 2018 | 19 | 2018 |
Interferometric single-shot parity measurement in an InAs-Al hybrid device M Aghaee, AA Ramirez, Z Alam, R Ali, M Andrzejczuk, A Antipov, ... arXiv preprint arXiv:2401.09549, 2024 | 12 | 2024 |
Transition in layer structure of atomic/molecular layer deposited ZnO-zincone multilayers JP Niemelä, M Aghaee, WMM Kessels, M Creatore, MA Verheijen Journal of Vacuum Science & Technology A 37 (4), 2019 | 11 | 2019 |
InAs-Al hybrid devices passing the topological gap protocol.(2022) M Aghaee, A Akkala, Z Alam, R Ali, AA Ramirez, M Andrzejczuk, ... arXiv preprint arXiv:2207.02472 190, 0 | 6 | |
On the synergistic effect of inorganic/inorganic barrier layers: An ellipsometric porosimetry investigation M Aghaee, A Perrotta, SA Starostin, HW de Vries, MCM van de Sanden, ... Plasma Processes and Polymers 14 (10), 1700012, 2017 | 4 | 2017 |
Innovation and synergy in thin film deposition: from plasma-based chemical vapor deposition to atomic and molecular layer deposition M Aghaee | | 2019 |