| Enhanced humidity-sensing response of metal oxide coated carbon nanotube D Jung, J Kim, GS Lee Sensors and Actuators A: Physical 223, 11-17, 2015 | 65 | 2015 |
| Exploring new metal electrodes for ferroelectric aluminum-doped hafnium oxide H Ryu, K Xu, J Kim, S Kang, J Guo, W Zhu IEEE Transactions on Electron Devices 66 (5), 2359-2364, 2019 | 46 | 2019 |
| Narrowband Attenuation at 157 GHz by a Plasma Photonic Crystal HJ Yang, J Kim, SJ Park, JG Eden Gaseous Electronics Conference 2017, 2017 | 22 | 2017 |
| Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: photoablative patterning of nanostructures and optical components in bulk polymers and thin … AE Mironov, J Kim, Y Huang, AW Steinforth, DJ Sievers, JG Eden Nanoscale 12 (32), 16796-16804, 2020 | 19 | 2020 |
| Commercialization of microcavity plasma devices and arrays: Systems for VUV photolithography and nanopatterning, disinfection of drinking water and air, and biofilm … J Kim, AE Mironov, JH Cho, DS Sievers, CM Herring, S Park, PP Sun, ... Plasma Processes and Polymers 19 (10), 2200075, 2022 | 8 | 2022 |
| 194 nm microplasma lamps driven by excitation transfer: optical sources for the 199Hg ion atomic clock and photochemistry S Park, AE Mironov, J Kim, SJ Park, JG Eden Plasma Sources Science and Technology 31 (4), 045007, 2022 | 6 | 2022 |
| Photoablative lithography of cellulose acetate at 172 nm: Subtractive 3D printing of biodegradable optical microstructures and molds for polydimethylsiloxane patterning AE Mironov, S Park, J Kim, DJ Sievers, SJ Park, S Spirk, JG Eden APL Materials 9 (11), 111115, 2021 | 5 | 2021 |
| Atomic Layer Deposition and Patterning of 15–185 nm Thick Al2O3 Films with Microplasma Arrays for Low-Temperature Growth and Sub-300 nm Lateral Feature … J Kim, AE Mironov, S Park, JG Eden ACS Applied Nano Materials 3 (5), 4025-4036, 2020 | 4 | 2020 |
| Construction of a Compact Array of Microplasma Jet Devices and Its Application for Random Mutagenesis of Rhodosporidium toruloides HG Koh, J Kim, CV Rao, SJ Park, YS Jin ACS Synthetic Biology, 2023 | 2 | 2023 |
| In-Situ Photo-Dissociation and Polymerization of Carbon Disulfide with Vacuum Ultraviolet Microplasma Flat Lamp for Organic Thin Films J Kim, SJ Park Applied Sciences 11 (6), 2597, 2021 | 2 | 2021 |
| Ultrasound harmonic generation and atomic layer deposition of multilayer, deep-UV mirrors and filters with microcavity plasma arrays J Kim, A Mironov, S Park, C Kim, SJ Park, JG Eden The European Physical Journal D 77 (5), 73, 2023 | 1 | 2023 |
| Arrays of Microplasma-assisted Atomic Layer Deposition and Etching Free Patterning of Ga2O3 Thin Film with Flexible DUV Photodetector J Kim, AE Mironov, DJ Sievers, S Park, JG Eden CLEO: Science and Innovations, JTu3A. 86, 2021 | 1 | 2021 |
| Gas-sensing properties of multi-walled carbon-nanotube sheet decorated with cobalt oxides D Jung, M Han, J Kim, G Lee 14th IEEE International Conference on Nanotechnology, 780-784, 2014 | 1 | 2014 |
| Uniform broad-area deposition and patterning of SiO2 nanofilms by 172 nm photochemical conversion of liquid tetraethoxysilane layers at 300 K J Kim, DJ Sievers, AE Mironov, SJ Park, JG Eden APL Materials 12 (1), 2024 | | 2024 |
| 172 nm patterning of optical components on polymers” SPIE Photonics West 2020 AE Mironov, DJ Sievers, J Kim, SJ Park, JG Eden SPIE Photonics West 2020, 2020 | | 2020 |
| Microplasma-driven ALD of Al2O3 etching-free patterning and Ga2O3 based flexible DUV photodetector J Kim, DJ Sievers, AE Mironov, S Park, SJ Park, JG Eden ICOPS 2020, 2020 | | 2020 |
| Excitation of Hg+ 194.2 nm line by penning ionization of mercury atom by the helium excimer S Park, AE Mironov, J Kim, SJ Park, JG Eden ICOPS 2020, 2020 | | 2020 |
| Microplasma-driven, area-selective atomic layer deposition of aluminum oxide at 300 K J Kim, AE Mironov, SJ Park, JG Eden Material Research Society 2019, 2019 | | 2019 |
| Electromagnetic and nanofabrication applications of microcavity plasmas JG Eden, J Kim, SJ Park, AE Mironov, PP Sun, W Chen, DJ Sievers iPlasmaNano-X 2019, 2019 | | 2019 |
| Photo-ablation lithographic technique at 172 nm based upon fast excimer lamps AE Mironov, DJ Sievers, J Kim, SJ Park, JG Eden SPIE Optics + Photonics 2019, 2019 | | 2019 |
