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Roberto Guido
Roberto Guido
Scientist/PhD Student at NaMLab gGmbH
Adresse e-mail validée de namlab.com
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Thermal Stability of the Ferroelectric Properties in 100 nm-Thick Al0.72Sc0.28N
R Guido, PD Lomenzo, MR Islam, N Wolff, M Gremmel, G Schönweger, ...
ACS Applied Materials & Interfaces 15 (5), 7030-7043, 2023
372023
Filamentary TaOx/HfO2 ReRAM Devices for Neural Networks Training with Analog In‐Memory Computing
T Stecconi, R Guido, L Berchialla, A La Porta, J Weiss, Y Popoff, M Halter, ...
Advanced electronic materials 8 (10), 2200448, 2022
312022
Discovery of Nanoscale Electric Field‐Induced Phase Transitions in ZrO2
PD Lomenzo, L Collins, R Ganser, B Xu, R Guido, A Gruverman, A Kersch, ...
Advanced Functional Materials 33 (41), 2303636, 2023
222023
Role of Defects in the Breakdown Phenomenon of Al1–xScxN: From Ferroelectric to Filamentary Resistive Switching
R Guido, T Mikolajick, U Schroeder, PD Lomenzo
Nano Letters 23 (15), 7213-7220, 2023
172023
Kinetics of N‐ to M‐Polar Switching in Ferroelectric Al1−xScxN Capacitors
R Guido, H Lu, PD Lomenzo, T Mikolajick, A Gruverman, U Schroeder
Advanced Science 11 (16), 2308797, 2024
62024
The Role of Interface Dynamics on the Reliability Performance of BEOL Integrated Ferroelectric HfO2 Capacitors
R Alcala, PD Lomenzo, T Mittmann, B Xu, R Guido, S Lancaster, ...
2022 International Electron Devices Meeting (IEDM), 32.8. 1-32.8. 4, 2022
62022
Evaluation of Imprint and Multi‐Level Dynamics in Ferroelectric Capacitors
S Vecchi, FM Puglisi, P Appelt, R Guido, X Wang, S Slesazeck, ...
Advanced Electronic Materials, 2400204, 2024
22024
Role of Conductive-Metal-Oxide to HfOx, Interfacial Layer on the Switching Properties of Bilayer TaOx/HfOx ReRAM
T Stecconi, Y Popoff, R Guido, D Falcone, M Halter, M Sousa, F Horst, ...
ESSDERC 2022-IEEE 52nd European Solid-State Device Research Conference …, 2022
22022
Equivalent electrical circuit modelling of a TaOx/HfOx based RRAM with optimized resistance window and multilevel states
T Stecconi, Y Popoff, R Guido, M Halter, D Falcone, A La Porta, F Horst, ...
2022 Device Research Conference (DRC), 1-2, 2022
22022
A CMOS-compatible bipolar analogue switching redox-based ReRAM with TaOx/HfO2 bilayer
R Guido
Politecnico di Torino, 2021
12021
Long‐Term Stability and Oxidation of Ferroelectric AlScN Devices: An Operando Hard X‐ray Photoelectron Spectroscopy Study
O Rehm, L Baumgarten, R Guido, PM Düring, A Gloskovskii, C Schlueter, ...
physica status solidi (RRL)–Rapid Research Letters, 2400307, 2024
2024
Ferroelectric Al0.85Sc0.15N and Hf0.5Zr0.5O2 Domain Switching Dynamics
R Guido, X Wang, B Xu, R Alcala, T Mikolajick, U Schroeder, PD Lomenzo
ACS Applied Materials & Interfaces 16 (32), 42415-42425, 2024
2024
Filamentary-based TaOx/HfO2 memristive synapses
T Stecconi, Y Popoff, DF Falcone, R Guido, A La Porta, F Horst, BJ Offrein, ...
European Materials Research Society (e-MRS) Spring Meeting, 2022
2022
Scalable Conductive Metal-Oxide/HfO2-Based Bilayer ReRAMs for Analog In-Memory Computing
T Stecconi, Y Popoff, DF Falcone, R Guido, A La Porta, F Horst, ...
Materials Research Society (MRS) Spring Meeting, 2022
2022
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