Mark J. Kushner

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Natalia Yu. BabaevaUniversity of MichiganAdresse e-mail validée de umich.edu
Shahid RaufApplied Materials, Inc.Adresse e-mail validée de amat.com
Robert HoekstraSandia National LaboratoriesAdresse e-mail validée de sandia.gov
Peter BruggemanErnst Eckert Professor of Mechanical Engineering, University of MinnesotaAdresse e-mail validée de umn.edu
Wei TianUniversity of Michigan, Ann ArborAdresse e-mail validée de umich.edu
Uwe KortshagenDepartment of Mechanical Engineering, University of MinnesotaAdresse e-mail validée de umn.edu
Yang YangApplied Materials IncAdresse e-mail validée de amat.com
Eric JohnsenMechanical Engineering Department, University of Michigan, Ann ArborAdresse e-mail validée de umich.edu
Chad HuardUniversity of MichiganAdresse e-mail validée de umich.edu
Ankur AgarwalMaharashtra Knowledge Corporation Limited (Business Analyst)Adresse e-mail validée de mkcl.org
Steven ShannonNorth Carolina State University, Department of Nuclear EngineeringAdresse e-mail validée de ncsu.edu
Mingmei WangLam ResearchAdresse e-mail validée de lamresearch.com
Saravanapriyan SriramanLam Research CorporationAdresse e-mail validée de lamrc.com
Yiting ZhangKLA-TencorAdresse e-mail validée de kla-tencor.com
Juline ShoebLam research corporationAdresse e-mail validée de lamrc.com
eric robertCNRS/GREMI/Université d'OrléansAdresse e-mail validée de univ-orleans.fr
Igor AdamovichOhio State UniversityAdresse e-mail validée de osu.edu
Jun-Chieh WangApplied Materials, University of MichiganAdresse e-mail validée de umich.edu
Jonathan TennysonUniversity College LondonAdresse e-mail validée de ucl.ac.uk
GS OehrleinUniversity of MarylandAdresse e-mail validée de umd.edu

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Mark J. Kushner

University of Michigan

Adresse e-mail validée de umich.edu - Page d'accueil

low temperature plasmas materials processing lasers plasmas plasma medicine


Titre Trier par citations Trier par année Trier par titre	Citée par Citée par	Année
Plasma–liquid interactions: a review and roadmap PJ Bruggeman, MJ Kushner, BR Locke, JGE Gardeniers, WG Graham, ... Plasma sources science and technology 25 (5), 053002, 2016	1699	2016
The 2017 Plasma Roadmap: Low temperature plasma science and technology I Adamovich, SD Baalrud, A Bogaerts, PJ Bruggeman, M Cappelli, ... Journal of Physics D: Applied Physics 50 (32), 323001, 2017	1084	2017
The 2012 plasma roadmap S Samukawa, M Hori, S Rauf, K Tachibana, P Bruggeman, G Kroesen, ... Journal of Physics D: Applied Physics 45 (25), 253001, 2012	847	2012
A model for the discharge kinetics and plasma chemistry during plasma enhanced chemical vapor deposition of amorphous silicon MJ Kushner Journal of applied physics 63 (8), 2532-2551, 1988	703	1988
A model for plasma modification of polypropylene using atmospheric pressure discharges R Dorai, MJ Kushner Journal of Physics D: Applied Physics 36 (6), 666, 2003	580	2003
The gaseous electronics conference radio‐frequency reference cell: a defined parallel‐plate radio‐frequency system for experimental and theoretical studies of plasma‐processing … PJ Hargis Jr, KE Greenberg, PA Miller, JB Gerardo, JR Torczynski, ... Review of Scientific Instruments 65 (1), 140-154, 1994	475	1994
Two‐dimensional modeling of high plasma density inductively coupled sources for materials processing PLG Ventzek, RJ Hoekstra, MJ Kushner Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994	458	1994
Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design MJ Kushner Journal of Physics D: Applied Physics 42 (19), 194013, 2009	448	2009
Atmospheric pressure dielectric barrier discharges interacting with liquid covered tissue W Tian, MJ Kushner Journal of Physics D: Applied Physics 47 (16), 165201, 2014	391	2014
The 2022 Plasma Roadmap: low temperature plasma science and technology I Adamovich, S Agarwal, E Ahedo, LL Alves, S Baalrud, N Babaeva, ... Journal of Physics D: Applied Physics 55 (37), 373001, 2022	368	2022
O2 (Δ1) production in He∕ O2 mixtures in flowing low pressure plasmas DS Stafford, MJ Kushner Journal of applied physics 96 (5), 2451-2465, 2004	350	2004
Numerical investigation of the kinetics and chemistry of rf glow discharge plasmas sustained in He, N₂, O₂, He/N₂/O₂, He/CF₄/O₂, and SiH₄/NH₃ using a … TJ Sommerer, MJ Kushner Journal of applied physics 71 (4), 1654-1673, 1992	334	1992
Modelling of microdischarge devices: plasma and gas dynamics MJ Kushner Journal of Physics D: Applied Physics 38 (11), 1633, 2005	317	2005
Dynamics of a coplanar-electrode plasma display panel cell. I. Basic operation S Rauf, MJ Kushner Journal of applied physics 85 (7), 3460-3469, 1999	314	1999
Large‐bore copper‐vapor lasers: Kinetics and scaling issues MJ Kushner, BE Warner Journal of Applied Physics 54 (6), 2970-2982, 1983	291	1983
Reaction chemistry and optimization of plasma remediation of N_xO_y from gas streams AC Gentile, MJ Kushner Journal of applied physics 78 (3), 2074-2085, 1995	276	1995
Monte‐Carlo simulation of electron properties in rf parallel plate capacitively coupled discharges MJ Kushner Journal of applied physics 54 (9), 4958-4965, 1983	270	1983
Distribution of ion energies incident on electrodes in capacitively coupled rf discharges MJ Kushner Journal of applied physics 58 (11), 4024-4031, 1985	260	1985
Plasma remediation of trichloroethylene in silent discharge plasmas D Evans, LA Rosocha, GK Anderson, JJ Coogan, MJ Kushner Journal of applied physics 74 (9), 5378-5386, 1993	255	1993
Argon metastable densities in radio frequency Ar, and electrical discharges S Rauf, MJ Kushner Journal of applied physics 82 (6), 2805-2813, 1997	242	1997

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