| Confinement effects on polymer crystallization: From droplets to alumina nanopores RM Michell, I Blaszczyk-Lezak, C Mijangos, AJ Müller Polymer 54 (16), 4059-4077, 2013 | 205 | 2013 |
| The crystallization of confined polymers and block copolymers infiltrated within alumina nanotube templates RM Michell, AT Lorenzo, AJ Müller, MC Lin, HL Chen, I Blaszczyk-Lezak, ... Macromolecules 45 (3), 1517-1528, 2012 | 140 | 2012 |
| Confined crystallization of polymers within anodic aluminum oxide templates RM Michell, I Blaszczyk‐Lezak, C Mijangos, AJ Müller Journal of Polymer Science Part B: Polymer Physics 52 (18), 1179-1194, 2014 | 80 | 2014 |
| One dimensional PMMA nanofibers from AAO templates. Evidence of confinement effects by dielectric and Raman analysis I Blaszczyk-Lezak, M Hernández, C Mijangos Macromolecules 46 (12), 4995-5002, 2013 | 75 | 2013 |
| Silicon Carbonitride (SiCN) Films by Remote Hydrogen Microwave Plasma CVD from Tris (dimethylamino) silane as Novel Single‐Source Precursor AM Wrobel, I Blaszczyk‐Lezak, P Uznanski, B Glebocki Chemical Vapor Deposition 16 (7‐9), 211-215, 2010 | 55 | 2010 |
| Optically active luminescent perylene thin films deposited by plasma polymerization I Blaszczyk-Lezak, FJ Aparicio, A Borrás, A Barranco, A Alvarez-Herrero, ... The Journal of Physical Chemistry C 113 (1), 431-438, 2009 | 52 | 2009 |
| Transparent nanometric organic luminescent films as UV-active components in photonic structures FJ Aparicio, M Holgado, A Borras, I Blaszczyk-Lezak, A Griol, CA Barrios, ... John Wiley & Sons, 2011 | 51 | 2011 |
| In-situ polymerization of styrene in AAO nanocavities JM Giussi, I Blaszczyk-Lezak, MS Cortizo, C Mijangos Polymer 54 (26), 6886-6893, 2013 | 48 | 2013 |
| Remote nitrogen microwave plasma chemical vapor deposition from a tetramethyldisilazane precursor. 1. Growth mechanism, structure, and surface morphology of silicon … I Blaszczyk-Lezak, AM Wrobel, T Aoki, Y Nakanishi, I Kucinska, A Tracz Thin solid films 497 (1-2), 24-34, 2006 | 48 | 2006 |
| Silicon carbonitride films produced by remote hydrogen microwave plasma CVD using a (dimethylamino) dimethylsilane precursor I Blaszczyk‐Lezak, AM Wrobel, MPM Kivitorma, IJ Vayrynen Chemical vapor deposition 11 (1), 44-52, 2005 | 41 | 2005 |
| Incorporation and Thermal Evolution of Rhodamine 6G Dye Molecules Adsorbed in Porous Columnar Optical SiO2 Thin Films JR Sánchez-Valencia, I Blaszczyk-Lezak, JP Espinós, S Hamad, ... Langmuir 25 (16), 9140-9148, 2009 | 40 | 2009 |
| Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino) dimethylsilane precursor: Characterization of the process … I Blaszczyk-Lezak, AM Wrobel, MPM Kivitorma, IJ Vayrynen, T Aoki Diamond and related materials 15 (9), 1484-1491, 2006 | 39 | 2006 |
| Silicon carbonitride by remote microwave plasma CVD from organosilicon precursor: Growth mechanism and structure of resulting Si: C: N films I Blaszczyk-Lezak, AM Wrobel, MPM Kivitorma, IJ Vayrynen, A Tracz Applied surface science 253 (17), 7211-7218, 2007 | 36 | 2007 |
| Remote Hydrogen Microwave Plasma Chemical Vapor Deposition of Amorphous Silicon Carbonitride (a‐SiCN) Coatings Derived From Tris (dimethylamino) Silane AM Wrobel, I Blaszczyk‐Lezak, P Uznanski, B Glebocki Plasma Processes and Polymers 8 (6), 542-556, 2011 | 30 | 2011 |
| Plasma Deposition of Perylene–Adamantane Nanocomposite Thin Films for NO2 Room-Temperature Optical Sensing FJ Aparicio, I Blaszczyk-Lezak, JR Sanchez-Valencia, M Alcaire, ... The Journal of Physical Chemistry C 116 (15), 8731-8740, 2012 | 28 | 2012 |
| Silicon carbonitride by remote microwave plasma CVD from organosilicon precursor: Physical and mechanical properties of deposited Si: C: N films I Blaszczyk-Lezak, AM Wrobel Applied surface science 253 (18), 7404-7411, 2007 | 27 | 2007 |
| Silicon carbonitride thin‐film coatings fabricated by remote hydrogen–nitrogen microwave plasma chemical vapor deposition from a single‐source precursor: Growth process … AM Wrobel, I Blaszczyk‐Lezak, A Walkiewicz‐Pietrzykowska Journal of applied polymer science 105 (1), 122-129, 2007 | 27 | 2007 |
| Remote nitrogen microwave plasma chemical vapor deposition from a tetramethyldisilazane precursor. 2. Properties of deposited silicon carbonitride films I Blaszczyk-Lezak, AM Wrobel, DM Bielinski Thin Solid Films 497 (1-2), 35-41, 2006 | 27 | 2006 |
| Hard and high-temperature-resistant silicon carbonitride coatings based on N-silyl-substituted cyclodisilazane rings AM Wrobel, I Blaszczyk-Lezak, A Walkiewicz-Pietrzykowska, T Aoki, ... Journal of the Electrochemical Society 155 (4), K66, 2008 | 26 | 2008 |
| Remote hydrogen microwave plasma CVD of silicon carbonitride films from a tetramethyldisilazane source. Part 1: Characterization of the process and structure of the films AM Wrobel, I Blaszczyk‐Lezak Chemical Vapor Deposition 13 (11), 595-600, 2007 | 26 | 2007 |
