Sean King

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36 articles

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Robert J. NemanichDepartment of Physics, Arizona State UniversityAdresse e-mail validée de asu.edu
Robert F. DavisCarnegie Mellon UniversityAdresse e-mail validée de andrew.cmu.edu
William A LanfordProfessor of Physics, University at Albany SUNYAdresse e-mail validée de albany.edu
Michelle M. PaquetteDepartment of Physics, University of Missouri - Kansas CityAdresse e-mail validée de umkc.edu
Markus KuhnRigaku CorporationAdresse e-mail validée de rigaku.com
P.M. LenahanDistinguished Professor of Engineering Science and Mecahnics and Co-Chair, Inter-College GraduateAdresse e-mail validée de engr.psu.edu
Patrick E. HopkinsUniversity of VirginiaAdresse e-mail validée de virginia.edu
Bradley Joseph NordellResearch Scientist, University of Missouri-Kansas CityAdresse e-mail validée de umkc.edu
John T. GaskinsCEO, Laser ThermalAdresse e-mail validée de laserthermal.com
Gheorghe StanNational Institute of Standards and TechnologyAdresse e-mail validée de nist.gov
Patrick HenryFluor Marine Propulsion, IncAdresse e-mail validée de unnpp.gov
Han LiIntel CorpAdresse e-mail validée de intel.com
Justin BrockmanAppleAdresse e-mail validée de Apple.com
Carsten RonningFriedrich Schiller University Jena, Institute of Solid State PhysicsAdresse e-mail validée de uni-jena.de
Yusuke MatsudaQuantum-SiAdresse e-mail validée de quantum-si.com
Reinhold H. DauskardtRuth G. and William K. Bowes Professor, Stanford UniversityAdresse e-mail validée de stanford.edu
Donghyi KohUniversity of Texas at AustinAdresse e-mail validée de utexas.edu
Brad BittelAdresse e-mail validée de intel.com
Prof. Dr. Marius OrlowskiVirginia Tech, Bradly Department of Electrical and Computer EngineeeringAdresse e-mail validée de vt.edu
Dhanadeep DuttaRadiochemistry Division, Bhabha Atomic Research Centre, Mumbai, IndiaAdresse e-mail validée de barc.gov.in

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Sean King

Principal Engineer

Adresse e-mail validée de intel.com

Materials Science


Titre Trier par citations Trier par année Trier par titre	Citée par Citée par	Année
Transistor having an etch stop layer including a metal compound that is selectively formed over a metal gate A Ott, S King, A Sharma US Patent 8,120,114, 2012	446	2012
Adhesion and electromigration performance at an interface between a dielectric and metal S King, J Klaus US Patent 8,178,436, 2012	433	2012
Cleaning of AlN and GaN surfaces SW King, JP Barnak, MD Bremser, KM Tracy, C Ronning, RF Davis, ... Journal of applied physics 84 (9), 5248-5260, 1998	421	1998
Selective deposition of amorphous silicon films on metal gates J Klaus, S King, W Rachmady US Patent 7,816,218, 2010	245	2010
Plasma enhanced atomic layer deposition of SiNx: H and SiO2 SW King Journal of Vacuum Science & Technology A 29 (4), 2011	214	2011
Cleaning of GaN surfaces LL Smith, SW King, RJ Nemanich, RF Davis Journal of electronic materials 25 (5), 805-810, 1996	202	1996
Dielectric barrier, etch stop, and metal capping materials for state of the art and beyond metal interconnects SW King ECS Journal of Solid State Science and Technology 4 (1), N3029, 2014	196	2014
UV photoemission study of heteroepitaxial AlGaN films grown on 6H-SiC MC Benjamin, MD Bremser, TW Weeks Jr, SW King, RF Davis, ... Applied Surface Science 104, 455-460, 1996	149	1996
Negative electron affinity surfaces of aluminum nitride and diamond RJ Nemanich, PK Baumann, MC Benjamin, ... Diamond Relat. Mater 5 (6), 790-796, 1996	138	1996
Fourier transform infrared spectroscopy investigation of chemical bonding in low-k a-SiC: H thin films SW King, M French, J Bielefeld, WA Lanford Journal of Non-Crystalline Solids 357 (15), 2970-2983, 2011	126	2011
Thermal conductivity and thermal boundary resistance of atomic layer deposited high-k dielectric aluminum oxide, hafnium oxide, and titanium oxide thin films on … EA Scott, JT Gaskins, SW King, PE Hopkins APL Materials 6 (5), 058302, 2018	124	2018
Investigation and Review of the Thermal, Mechanical, Electrical, Optical, and Structural Properties of Atomic Layer Deposited High-k Dielectrics: Beryllium Oxide, Aluminum … JT Gaskins, PE Hopkins, DR Merrill, SR Bauers, E Hadland, DC Johnson, ... ECS Journal of Solid State Science and Technology 6 (10), N189-N208, 2017	122	2017
Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes N Alimardani, SW King, BL French, C Tan, BP Lampert, JF Conley Journal of Applied Physics 116 (2), 2014	108	2014
Dependence of (0001) GaN/AlN valence band discontinuity on growth temperature and surface reconstruction SW King, C Ronning, RF Davis, MC Benjamin, RJ Nemanich Journal of applied physics 84 (4), 2086-2090, 1998	95	1998
Influence of network bond percolation on the thermal, mechanical, electrical and optical properties of high and low-k a-SiC: H thin films SW King, J Bielefeld, G Xu, WA Lanford, Y Matsuda, RH Dauskardt, N Kim, ... Journal of Non-Crystalline Solids 379, 67-79, 2013	88	2013
Selective deposition of a dielectric on a self-assembled monolayer-adsorbed metal AK Sharma, S King, D Hanken, AW Ott US Patent 7,790,631, 2010	87	2010
Interfacial Defect Vibrations Enhance Thermal Transport in Amorphous Multilayers with Ultrahigh Thermal Boundary Conductance A Giri, SW King, WA Lanford, AB Mei, D Merrill, L Li, R Oviedo, J Richards, ... Advanced Materials 30 (44), 1804097, 2018	82	2018
Research Updates: The three M's (materials, metrology, and modeling) together pave the path to future nanoelectronic technologies SW King, H Simka, D Herr, H Akinaga, M Garner APL Materials 1 (4), 040701, 2013	82	2013
Intrinsic stress effect on fracture toughness of plasma enhanced chemical vapor deposited SiN x: H films S King, R Chu, G Xu, J Huening Thin Solid Films 518 (17), 4898-4907, 2010	80	2010
Film property requirements for hermetic low-k a-SiOxCyNz: H dielectric barriers SW King, D Jacob, D Vanleuven, B Colvin, J Kelly, M French, J Bielefeld, ... ECS Journal of Solid State Science and Technology 1 (6), N115, 2012	74	2012

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