| Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook RA Ovanesyan, EA Filatova, SD Elliott, DM Hausmann, DC Smith, ... Journal of Vacuum Science & Technology A 37 (6), 2019 | 113 | 2019 |
| Modeling Mechanism and Growth Reactions for New Nanofabrication Processes by Atomic Layer Deposition. SD Elliott, G Dey, Y Maimaiti, H Ablat, EA Filatova, GN Fomengia Advanced Materials (Deerfield Beach, Fla.) 28 (27), 5367-5380, 2015 | 87 | 2015 |
| Understanding the mechanism of SiC plasma-enhanced chemical vapor deposition (PECVD) and developing routes toward SiC atomic layer deposition (ALD) with density functional theory EA Filatova, D Hausmann, SD Elliott ACS applied materials & interfaces 10 (17), 15216-15225, 2018 | 41 | 2018 |
| Investigating routes toward atomic layer deposition of silicon carbide: Ab initio screening of potential silicon and carbon precursors EA Filatova, D Hausmann, SD Elliott Journal of Vacuum Science & Technology A 35 (1), 2017 | 22 | 2017 |
| Area selective atomic layer deposition of Si-based materials EA Filatova University College Cork, 2019 | 1 | 2019 |
| Investigating the difference in nucleation during Si-based ALD on different surfaces for future area-selective deposition EA Filatova, A Mameli, AJM Mackus, F Roozeboom, WMM Kessels, ... 2018 IEEE 18th International Conference on Nanotechnology (IEEE-NANO), 1-2, 2018 | | 2018 |
| Investigating routes toward atomic layer deposition of silicon carbide EA Filatova, D Hausmann, SD Elliott | | 2016 |