Dr. Robert Kirchner

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Helmut SchiftGruppenleiter Polymere Nanotechnology, Paul Scherrer InstitutAdresse e-mail validée de psi.ch
Nachi ChidambaramApple Inc.Adresse e-mail validée de apple.com
Andreas Finnresearch associate, Robert Bosch GmbHAdresse e-mail validée de de.bosch.com
Vitaliy GuzenkoResearcher, Paul Scherrer InstituteAdresse e-mail validée de psi.ch
Rene LandgrafResearcher previously at Fraunhofer Institute for Photonic Microsystems and TU DresdenAdresse e-mail validée de ipms.fraunhofer.de
Ye Yutechnische universität dresdenAdresse e-mail validée de tu-dresden.de
Yasin EkinciPaul Scherrer InstituteAdresse e-mail validée de psi.ch
Michael MühlbergerSenior Researcher, Functional Surfaces and Nanostructures, Profactor GmbHAdresse e-mail validée de profactor.at
Dimitris KazazisPaul Scherrer InstitutAdresse e-mail validée de psi.ch
Johann W. BarthaProfessor für Halbleitertechnik, Technische Universität DresdenAdresse e-mail validée de tu-dresden.de
Johanna ReifInstitut für Halbleiter- und Mikrosystemtechnik, TU DresdenAdresse e-mail validée de tu-dresden.de
Christian WengerIHP GmbH - Leibniz institute for innovative microelectronicsAdresse e-mail validée de ihp-microelectronics.com
Stanislav GorbDepartment Functional Morphology and Biomechanics, Zoological Institute, Kiel UniversityAdresse e-mail validée de zoologie.uni-kiel.de
Daniel HeimProfessor Surface Engineering, University of Applied Sciences Upper AustriaAdresse e-mail validée de fh-wels.at
Felix WinklerRobert Bosch Semiconductor Manufacturing Dresden GmbHAdresse e-mail validée de de.bosch.com
Iacopo MochiPaul Scherrer InstitutAdresse e-mail validée de psi.ch
René HenselCarl Zeiss AG, Cooperate Research and TechnologyAdresse e-mail validée de zeiss.com
Massimo TormenAdresse e-mail validée de iom.cnr.it
Joachim BurghartzIMS CHIPSAdresse e-mail validée de ims-chips.de
Victor J CadarsoMonash UniversityAdresse e-mail validée de monash.edu

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Dr. Robert Kirchner

TU Dresden (Germany)

Adresse e-mail validée de tu-dresden.de - Page d'accueil

3D Lithography Photonics Self assembly Nanoimprint MEMS


Titre Trier par citations Trier par année Trier par titre	Citée par Citée par	Année
Thermal reflow of polymers for innovative and smart 3D structures: A review R Kirchner, H Schift Materials Science in Semiconductor Processing 92, 58-72, 2019	77	2019
Novel 3D micro-and nanofabrication method using thermally activated selective topography equilibration (TASTE) of polymers A Schleunitz, VA Guzenko, M Messerschmidt, H Atasoy, R Kirchner, ... Nano Convergence 1 (1), 7, 2014	67	2014
High fidelity 3D thermal nanoimprint with UV curable polydimethyl siloxane stamps N Chidambaram, R Kirchner, M Altana, H Schift Journal of Vacuum Science & Technology B 34 (6), 2016	44	2016
ZEP520A—A resist for electron-beam grayscale lithography and thermal reflow R Kirchner, VA Guzenko, I Vartiainen, N Chidambaram, H Schift Microelectronic Engineering 153, 71-76, 2016	43	2016
Energy-based thermal reflow simulation for 3D polymer shape prediction using Surface Evolver R Kirchner, A Schleunitz, H Schift Journal of Micromechanics and Microengineering 24 (5), 055010, 2014	43	2014
UV-NIL fabricated bio-inspired inlays for injection molding to influence the friction behavior of ceramic surfaces M Mühlberger, M Rohn, J Danzberger, E Sonntag, A Rank, L Schumm, ... Microelectronic Engineering 141, 140-144, 2015	40	2015
Selective surface smoothening of polymer microlenses by depth confined softening N Chidambaram, R Kirchner, R Fallica, L Yu, M Altana, H Schift Advanced Materials Technologies 2 (5), 1700018, 2017	39	2017
High-resolution grayscale patterning using extreme ultraviolet interference lithography R Fallica, R Kirchner, H Schift, Y Ekinci Microelectronic Engineering 177, 1-5, 2017	35	2017
Bio-inspired 3D funnel structures made by grayscale electron-beam patterning and selective topography equilibration R Kirchner, VA Guzenko, M Rohn, E Sonntag, M Mühlberger, I Bergmair, ... Microelectronic Engineering 141, 107-111, 2015	33	2015
High aspect ratio pattern collapse of polymeric UV-nano-imprint molds due to cleaning A Finn, B Lu, R Kirchner, X Thrun, K Richter, WJ Fischer Microelectronic Engineering 110, 112-118, 2013	33	2013
Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography R Fallica, D Kazazis, R Kirchner, A Voigt, I Mochi, H Schift, Y Ekinci Journal of Vacuum Science & Technology B 35 (6), 2017	29	2017
Mobility based 3D simulation of selective, viscoelastic polymer reflow using surface evolver R Kirchner, H Schift Journal of Vacuum Science & Technology B 32 (6), 06F701, 2014	27	2014
Nanoimprint assisted inkjet printing to fabricate sub-micron channel organic field effect transistors L Teng, M Plötner, A Türke, B Adolphi, A Finn, R Kirchner, WJ Fischer Microelectronic Engineering 110, 292-297, 2013	23	2013
Geometrical properties of multilayer nano-imprint-lithography molds for optical applications A Finn, R Hensel, F Hagemann, R Kirchner, A Jahn, WJ Fischer Microelectronic Engineering 98, 284-287, 2012	20	2012
Effect of nanoimprint on the elastic modulus of PMMA: Comparison between standard and ultrafast thermal NIL M Pianigiani, R Kirchner, E Sovernigo, A Pozzato, M Tormen, H Schift Microelectronic Engineering 155, 85-91, 2016	18	2016
mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning S Pfirrmann, R Kirchner, O Lohse, VA Guzenko, A Voigt, I Harder, ... Advances in Patterning Materials and Processes XXXIII 9779, 2016	18	2016
How post-processing by selective thermal reflow can reduce the roughness of 3D lithography in micro-optical lenses R Kirchner, N Chidambaram, M Altana, H Schift Proc. of SPIE Vol 10095, 1009507-1, 2017	17	2017
Direct UV-Imprinting of Hybrid-Polymer Photonic Microring Resonators and Their Characterization R Kirchner, A Finn, R Landgraf, L Nueske, L Teng, M Vogler, WJ Fischer Journal of Lightwave Technology 32 (9), 1674-1681, 2014	16	2014
Single-digit 6-nm multilevel patterns by electron beam grayscale lithography R Kirchner, VA Guzenko, H Schift Advanced Optical Technologies 8 (3-4), 175-180, 2019	15	2019
Adjustable sidewall slopes by electron-beam exposure layout C Kaspar, J Butschke, M Irmscher, S Martens, H Sailer, R Kirchner, ... Journal of Vacuum Science & Technology B 35 (6), 2017	15	2017

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