| High‐density plasma mode of an inductively coupled radio frequency discharge J Amorim, HS Maciel, JP Sudano Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1991 | 141 | 1991 |
| Nanostructured thin films based on TiO2 and/or SiC for use in photoelectrochemical cells: A review of the material characteristics, synthesis and recent applications RS Pessoa, MA Fraga, LV Santos, M Massi, HS Maciel Materials Science in Semiconductor Processing 29, 56-68, 2015 | 113 | 2015 |
| The effect of oxygen concentration on the low temperature deposition of TiO2 thin films H Toku, RS Pessoa, HS Maciel, M Massi, UA Mengui Surface and Coatings Technology 202 (10), 2126-2131, 2008 | 80 | 2008 |
| Tar reforming under a microwave plasma torch RM Eliott, MFM Nogueira, AS Silva Sobrinho, BAP Couto, HS Maciel, ... Energy & fuels 27 (2), 1174-1181, 2013 | 79 | 2013 |
| Effect of the thermal annealing on the electrical and physical properties of SiC thin films produced by RF magnetron sputtering SM Rajab, IC Oliveira, M Massi, HS Maciel, SG dos Santos Filho, ... Thin Solid Films 515 (1), 170-175, 2006 | 78 | 2006 |
| High textured AlN thin films grown by RF magnetron sputtering; composition, structure, morphology and hardness IC Oliveira, KG Grigorov, HS Maciel, M Massi, C Otani Vacuum 75 (4), 331-338, 2004 | 75 | 2004 |
| Longitudinal magnetic field effect on the electrical breakdown in low pressure gases G Petraconi, HS Maciel, RS Pessoa, G Murakami, M Massi, C Otani, ... Brazilian Journal of Physics 34, 1662-1666, 2004 | 74 | 2004 |
| Optical and morphological properties of N-doped TiO2 thin films KG Grigorov, IC Oliveira, HS Maciel, M Massi, MS Oliveira Jr, J Amorim, ... Surface Science 605 (7-8), 775-782, 2011 | 65 | 2011 |
| Adhesion of reactive magnetron sputtered TINx and TICy coatings to AISI H13 tool steel AAC Recco, IC Oliveira, M Massi, HS Maciel, AP Tschiptschin Surface and Coatings Technology 202 (4-7), 1078-1083, 2007 | 58 | 2007 |
| Structural, morphological, and optical properties of TiO2 thin films grown by atomic layer deposition on fluorine doped tin oxide conductive glass W Chiappim, GE Testoni, RS Moraes, RS Pessoa, JC Sagás, FD Origo, ... Vacuum 123, 91-102, 2016 | 56 | 2016 |
| Influence of electronegative gas on the efficiency of conventional and hollow cathode magnetron sputtering systems DA Duarte, M Massi, ASDS Sobrinho, LL Tezani, LC Fontana, HS Maciel ECS Transactions 23 (1), 143, 2009 | 56 | 2009 |
| TiO2 coatings via atomic layer deposition on polyurethane and polydimethylsiloxane substrates: Properties and effects on C. albicans growth and inactivation process RS Pessoa, VP Dos Santos, SB Cardoso, A Doria, FR Figueira, ... Applied Surface Science 422, 73-84, 2017 | 53 | 2017 |
| Effect of Process Temperature and Reaction Cycle Number on Atomic Layer Deposition of TiO2 Thin Films Using TiCl4 and H2O Precursors: Correlation Between … W Chiappim, GE Testoni, JSB De Lima, HS Medeiros, RS Pessoa, ... Brazilian journal of physics 46, 56-69, 2016 | 50 | 2016 |
| The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films M Guerino, M Massi, HS Maciel, C Otani, RD Mansano, P Verdonck, ... Diamond and related materials 13 (2), 316-319, 2004 | 47 | 2004 |
| Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering RD Mansano, M Massi, LS Zambom, P Verdonck, PM Nogueira, ... Thin Solid Films 373 (1-2), 243-246, 2000 | 47 | 2000 |
| Atomic Layer Deposited TiO2 and Al2O3 Thin Films as Coatings for Aluminum Food Packaging Application V Dias, H Maciel, M Fraga, AO Lobo, R Pessoa, FR Marciano Materials 12 (4), 682, 2019 | 45 | 2019 |
| Nanoindentation study of Ti6Al4V alloy nitrided by low intensity plasma jet process FC Barbieri, C Otani, CM Lepienski, WI Urruchi, HS Maciel, G Petraconi Vacuum 67 (3-4), 457-461, 2002 | 45 | 2002 |
| Nitrogen doping of SiC thin films deposited by RF magnetron sputtering MA Fraga, M Massi, IC Oliveira, HS Maciel, SG dos Santos Filho, ... Journal of Materials Science: Materials in Electronics 19, 835-840, 2008 | 44 | 2008 |
| Influence of the Al2O3 partial-monolayer number on the crystallization mechanism of TiO2 in ALD TiO2/Al2O3 nanolaminates and its impact on the material properties GE Testoni, W Chiappim, RS Pessoa, MA Fraga, W Miyakawa, ... Journal of Physics D: Applied Physics 49 (37), 375301, 2016 | 41 | 2016 |
| Anisotropic reactive ion etching in silicon, using a graphite electrode RD Mansano, P Verdonck, HS Maciel Sensors and Actuators A: Physical 65 (2-3), 180-186, 1998 | 40 | 1998 |
