| Modeling within-die spatial correlation effects for process-design co-optimization P Friedberg, Y Cao, J Cain, R Wang, J Rabaey, C Spanos Sixth international symposium on quality electronic design (isqed'05), 516-521, 2005 | 289 | 2005 |
| Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic PP Naulleau, KA Goldberg, E Anderson, JP Cain, P Denham, K Jackson, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 65 | 2004 |
| Decomposition strategies for self-aligned double patterning Y Ma, J Sweis, C Bencher, H Dai, Y Chen, JP Cain, Y Deng, J Kye, ... Design for Manufacturability through Design-Process Integration IV 7641, 229-241, 2010 | 57 | 2010 |
| EUV microexposures at the ALS using the 0.3-NA MET projection optics P Naulleau, KA Goldberg, E Anderson, JP Cain, P Denham, B Hoef, ... Emerging Lithographic Technologies IX 5751, 56-63, 2005 | 55 | 2005 |
| Electrical linewidth metrology for systematic CD variation characterization and causal analysis JP Cain, CJ Spanos Metrology, Inspection, and Process Control for Microlithography XVII 5038 …, 2003 | 42 | 2003 |
| Value-added metrology BD Bunday, JA Allgair, M Caldwell, EP Solecky, CN Archie, BJ Rice, ... IEEE Transactions on semiconductor manufacturing 20 (3), 266-277, 2007 | 38 | 2007 |
| Experimental and model-based study of the robustness of line-edge roughness metric extraction in the presence of noise PP Naulleau, JP Cain Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007 | 36 | 2007 |
| Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists PP Naulleau, C Rammeloo, JP Cain, K Dean, P Denham, KA Goldberg, ... Emerging Lithographic Technologies X 6151, 289-296, 2006 | 34 | 2006 |
| Lithography process control using scatterometry metrology and semi-physical modeling K Lensing, J Cain, A Prabhu, A Vaid, R Chong, R Good, B LaFontaine, ... Metrology, Inspection, and Process Control for Microlithography XXI 6518, 45-56, 2007 | 29 | 2007 |
| Modeling within-field gate length spatial variation for process-design co-optimization P Friedberg, Y Cao, J Cain, R Wang, J Rabaey, C Spanos Design and Process Integration for Microelectronic Manufacturing III 5756 …, 2005 | 23 | 2005 |
| Transistor gate shape metrology using multiple data sources JP Cain, B Singh, I Emami US Patent 7,373,215, 2008 | 22 | 2008 |
| Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source P Naulleau, JP Cain, E Anderson, K Dean, P Denham, KA Goldberg, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005 | 22 | 2005 |
| Critical dimension sensitivity to post-exposure bake temperature variations in EUV photoresists JP Cain, P Naulleau, CJ Spanos Emerging Lithographic Technologies IX 5751, 1092-1100, 2005 | 21 | 2005 |
| Methodology for analyzing and quantifying design style changes and complexity using topological patterns JP Cain, YC Lai, F Gennari, J Sweis Design-Process-Technology Co-optimization for Manufacturability X 9781, 64-76, 2016 | 20 | 2016 |
| Extreme ultraviolet lithography capabilities at the advanced light source using a 0.3-NA optic P Naulleau, KA Goldberg, JP Cain, EH Anderson, KR Dean, P Denham, ... IEEE journal of quantum electronics 42 (1), 44-50, 2006 | 20 | 2006 |
| Lithographic characterization of the field dependent astigmatism and alignment stability of a 0.3 numerical aperture extreme ultraviolet microfield optic PP Naulleau, JP Cain, KA Goldberg Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005 | 18 | 2005 |
| Pattern-based analytics to estimate and track yield risk of designs down to 7nm JP Cain, M Fakhry, P Pathak, J Sweis, FE Gennari, YC Lai Design-Process-Technology Co-optimization for Manufacturability XI 10148, 9-22, 2017 | 16 | 2017 |
| Lithographic characterization of the spherical error in an extreme-ultraviolet optic by use of a programmable pupil-fill illuminator PP Naulleau, JP Cain, KA Goldberg Applied optics 45 (9), 1957-1963, 2006 | 16 | 2006 |
| Modeling of EUV photoresists with a resist point spread function JP Cain, P Naulleau, CJ Spanos Emerging Lithographic Technologies IX 5751, 1101-1109, 2005 | 16 | 2005 |
| Optimum sampling for characterization of systematic variation in photolithography JP Cain, H Zhang, CJ Spanos Metrology, Inspection, and Process Control for Microlithography XVI 4689 …, 2002 | 15 | 2002 |
Patrick NaulleauEUV Tech Inc. and Berkeley LabAdresse e-mail validée de euvtech.com