| Memory improvement with high-k buffer layer in metal/SrBi2Nb2O9/Al2O3/silicon gate stack for non-volatile memory applications P Singh, RK Jha, RK Singh, BR Singh Superlattices and Microstructures 121, 55-63, 2018 | 22 | 2018 |
| Preparation and characterization of Al2O3 film deposited by RF sputtering and plasma enhanced atomic layer deposition P Singh, RK Jha, RK Singh, BR Singh Journal of Vacuum Science & Technology B 36 (4), 2018 | 22 | 2018 |
| LoRa DL: A deep learning model for enhancing the data transmission over LoRa using autoencoder B Shilpa, PR Kumar, RK Jha The Journal of Supercomputing 79 (15), 17079-17097, 2023 | 17 | 2023 |
| Brain disorders: Impact of mild SARS-CoV-2 may shrink several parts of the brain PR Kumar, B Shilpa, RK Jha Neuroscience & Biobehavioral Reviews 149, 105150, 2023 | 17 | 2023 |
| Spreading factor optimization for interference mitigation in dense indoor LoRa networks B Shilpa, PR Kumar, RK Jha 2023 IEEE IAS Global Conference on Emerging Technologies (GlobConET), 1-5, 2023 | 17 | 2023 |
| On the structural and electrical properties of metal–ferroelectric–high k dielectric–silicon structure for non-volatile memory applications P Singh, RK Jha, RK Singh, BR Singh Bulletin of Materials Science 41, 1-7, 2018 | 13 | 2018 |
| Electrical properties of Pb[Zr0.35Ti0.65]O3 on PEALD Al2O3 for NVM applications P Singh, RK Jha, RK Singh, BR Singh Microelectronics International 35 (4), 189-196, 2018 | 11 | 2018 |
| A novel end-to-end approach for epileptic seizure classification from scalp EEG data using deep learning technique PR Kumar, B Shilpa, RK Jha, SN Mohanty International Journal of Information Technology 15 (8), 4223-4231, 2023 | 9 | 2023 |
| Integration of perovskite Pb[Zr0.35Ti0.65]O3/HfO2 ferroelectric-dielectric composite film on Si substrate P Singh, RK Jha, M Goswami, BR Singh Microelectronics International 37 (3), 155-162, 2020 | 9 | 2020 |
| Electrical and ferroelectric properties of RF sputtered PZT/SBN on silicon for non-volatile memory applications P Singh, RK Jha, RK Singh, BR Singh Materials Research Express 5 (2), 026301, 2018 | 9 | 2018 |
| Impact of plasma enhanced atomic layer deposited HfO2 buffer layer on the structural, electrical and ferroelectric properties of metal/ferroelectric/insulator … RK Jha, P Singh, M Goswami, BR Singh Journal of Materials Science: Materials in Electronics 30, 15224-15235, 2019 | 8 | 2019 |
| Impact of process parameters on the structural and electrical properties of metal/PZT/Al2O3/silicon gate stack for non-volatile memory applications P Singh, RK Jha, RK Singh, BR Singh Applied Physics A 124, 1-9, 2018 | 8 | 2018 |
| Optimization of ALD process parameters for passivation of c-silicon and its implementation on industrial monocrystalline silicon solar cell A Bansal, P Singh, RK Jha, BR Singh Applied Physics B 125 (6), 114, 2019 | 7 | 2019 |
| Integration of Sr0.8Bi2.2Ta2O9/HfO2 ferroelectric/dielectric composite film on Si substrate for nonvolatile memory applications RK Jha, P Singh, M Goswami, BR Singh Ferroelectrics Letters Section 46 (4-6), 82-89, 2019 | 6 | 2019 |
| Integration of ferroelectric BIT and dielectric HfO2 on silicon substrate with high data retention and endurance for ferroelectric FET applications RK Jha, P Singh, M Goswami, BR Singh Applied Physics A 125, 1-12, 2019 | 6 | 2019 |
| Brain tissue segmentation in neurosurgery: a systematic analysis for quantitative tractography approaches PR Kumar, RK Jha, A Katti Acta Neurologica Belgica 124 (1), 1-15, 2024 | 5 | 2024 |
| Impact of HfO2 buffer layer on the electrical characteristics of ferroelectric/high-k gate stack for nonvolatile memory applications RK Jha, P Singh, U Kashniyal, M Goswami, BR Singh Applied Physics A 126, 1-11, 2020 | 5 | 2020 |
| Impact of HfO2 as a passivation layer in the solar cell efficiency enhancement in passivated emitter rear cell type RK Jha, P Singh, M Goswami, BR Singh Journal of Nanoscience and Nanotechnology 20 (6), 3718-3723, 2020 | 5 | 2020 |
| Plasma Enhanced Atomic Layer Deposited HfO2 Ferroelectric Films for Non-volatile Memory Applications RK Jha, P Singh, M Goswami, BR Singh Journal of Electronic Materials 49, 1445-1453, 2020 | 5 | 2020 |
| LoRa interference issues and solution approaches in dense IoT networks: a review B Shilpa, HP Gupta, RK Jha, SS Hashmi Telecommunication Systems 87 (2), 517-539, 2024 | 4 | 2024 |
Dr. Prashant SinghEngineer-CELL FILM-NAND at Micron Technology Inc.Potvrđena adresa e-pošte na micron.com