| Towards the fabrication of high-aspect-ratio silicon gratings by deep reactive ion etching Z Shi, K Jefimovs, L Romano, M Stampanoni Micromachines 11 (9), 864, 2020 | 56 | 2020 |
| Pushing the limits of bottom-up gold filling for x-ray grating interferometry D Josell, Z Shi, K Jefimovs, L Romano, J Vila-Comamala, TP Moffat Journal of The Electrochemical Society 167 (13), 132504, 2020 | 26 | 2020 |
| High mechanical endurance RRAM based on amorphous gadolinium oxide for flexible nonvolatile memory application H Zhao, H Tu, F Wei, Z Shi, Y Xiong, Y Zhang, J Du Journal of Physics D: Applied Physics 48 (20), 205104, 2015 | 22 | 2015 |
| High aspect ratio arrays of Si nano-pillars using displacement Talbot lithography and gas-MacEtch Z Shi, K Jefimovs, M Stampanoni, L Romano Materials Science in Semiconductor Processing 157, 107311, 2023 | 19 | 2023 |
| Fabrication of x-ray gratings for interferometric imaging by conformal seedless gold electroplating K Jefimovs, J Vila-Comamala, C Arboleda, Z Wang, L Romano, Z Shi, ... Micromachines 12 (5), 517, 2021 | 19 | 2021 |
| Chemical vapor deposition growth and transport properties of MoS2–2H thin layers using molybdenum and sulfur as precursors ZT Shi, HB Zhao, XQ Chen, GM Wu, F Wei, HL Tu Rare Metals, 1-5, 2022 | 17 | 2022 |
| High aspect ratio tilted gratings through local electric field modulation in plasma etching Z Shi, K Jefimovs, A La Magna, M Stampanoni, L Romano Applied Surface Science 588, 152938, 2022 | 15 | 2022 |
| Increased dose efficiency of breast CT with grating interferometry M Rawlik, A Pereira, S Spindler, Z Wang, L Romano, K Jefimovs, Z Shi, ... Optica 10 (7), 938-943, 2023 | 14 | 2023 |
| Fast acquisition protocol for X-ray scattering tensor tomography J Kim, M Kagias, F Marone, Z Shi, M Stampanoni Scientific Reports 11 (1), 23046, 2021 | 13 | 2021 |
| Optimization of displacement Talbot lithography for fabrication of uniform high aspect ratio gratings Z Shi, K Jefimovs, L Romano, M Stampanoni Japanese Journal of Applied Physics 60 (SC), SCCA01, 2021 | 12 | 2021 |
| Bottom-up gold filling in new geometries and yet higher aspect ratio gratings for hard X-ray interferometry D Josell, Z Shi, K Jefimovs, VA Guzenko, C Beauchamp, L Peer, ... Journal of the Electrochemical Society 168 (8), 082508, 2021 | 10 | 2021 |
| Laboratory x-ray interferometry imaging with a fan-shaped source grating Z Shi, K Jefimovs, L Romano, J Vila-Comamala, M Stampanoni Optics Letters 46 (15), 3693-3696, 2021 | 9 | 2021 |
| The choice of an autocorrelation length in dark-field lung imaging S Spindler, D Etter, M Rawlik, M Polikarpov, L Romano, Z Shi, K Jefimovs, ... Scientific Reports 13 (1), 2731, 2023 | 7 | 2023 |
| Fabrication of a fractal pattern device for focus characterizations of X-ray imaging systems by Si deep reactive ion etching and bottom-up Au electroplating Z Shi, D Josell, K Jefimovs, L Romano, TP Moffat, M Stampanoni, ... Applied optics 61 (13), 3850-3854, 2022 | 7 | 2022 |
| Refraction beats attenuation in breast CT M Rawlik, A Pereira, S Spindler, Z Wang, L Romano, K Jefimovs, Z Shi, ... arXiv preprint arXiv:2301.00455, 2023 | 5 | 2023 |
| Envelope modulated x-ray grating interferometry A Pandeshwar, M Kagias, Z Shi, M Stampanoni Applied Physics Letters 120 (19), 2022 | 5 | 2022 |
| Benchmarking Reconstructive Spectrometer with Multiresonant Cavities C Yao, K Xu, T Lin, J Ma, C Yao, P Bao, Z Shi, R Penty, Q Cheng ACS photonics 11 (9), 3730-3740, 2024 | 4 | 2024 |
| Implementation of a dual-phase grating interferometer for multi-scale characterization of building materials by tunable dark-field imaging C Organista, R Tang, Z Shi, K Jefimovs, D Josell, L Romano, S Spindler, ... Scientific Reports 14 (1), 384, 2024 | 4 | 2024 |
| Optimization of the visibility of a tunable dual-phase x-ray grating interferometer C Organista, M Kagias, R Tang, Z Shi, K Jefimovs, MN Boone, ... Optics Continuum 2 (1), 232-248, 2023 | 4 | 2023 |
| Investigations on black silicon nanostructures fabricated by reactive ion etching on highly curved surfaces D Schmelz, T Käsebier, Z Shi, Q Cheng, N Sergeev, D Schelle, U Zeitner Materials Science in Semiconductor Processing 165, 107646, 2023 | 2 | 2023 |
Lucia RomanoETH Zurich & PSIE-mail megerősítve itt: psi.ch