| Gold and silver extraction by ammoniacal thiosulfate leaching from a rhyolite ore D Zipperian, S Raghavan, JP Wilson Hydrometallurgy 19 (3), 361-375, 1988 | 238 | 1988 |
| Potential-pH diagrams of interest to chemical mechanical planarization of copper S Tamilmani, W Huang, S Raghavan, R Small Journal of The Electrochemical Society 149 (12), G638, 2002 | 167 | 2002 |
| Modification of polyvinylidene fluoride membrane and method of filtering S Raghavan, R Chilkunda US Patent 5,531,900, 1996 | 126 | 1996 |
| The adsorption of fluoride ions by hydroxyapatite from aqueous solution J Lin, S Raghavan, DW Fuerstenau Colloids and Surfaces 3 (4), 357-370, 1981 | 123 | 1981 |
| Treatment of alumina and silica chemical mechanical polishing waste by electrodecantation and electrocoagulation BM Belongia, PD Haworth, JC Baygents, S Raghavan Journal of the Electrochemical Society 146 (11), 4124, 1999 | 122 | 1999 |
| Metallic copper corrosion rates, moisture content, and growth medium influence survival of copper ion-resistant bacteria J Elguindi, S Moffitt, H Hasman, C Andrade, S Raghavan, C Rensing Applied microbiology and biotechnology 89, 1963-1970, 2011 | 115 | 2011 |
| Electrochemical measurements during the chemical mechanical polishing of tungsten thin films EA Kneer, C Raghunath, V Mathew, S Raghavan, JS Jeon Journal of the Electrochemical Society 144 (9), 3041, 1997 | 111 | 1997 |
| Electrochemistry of chemical vapor deposited tungsten films with relevance to chemical mechanical polishing EA Kneer, C Raghunath, S Raghavan, JS Jeon Journal of the Electrochemical Society 143 (12), 4095, 1996 | 109 | 1996 |
| The adsorption of aqueous octylhydroxamate on ferric oxide S Raghavan, DW Fuerstenau Journal of colloid and interface science 50 (2), 319-330, 1975 | 103 | 1975 |
| Some aspects of the thermodynamics of flotation DW Fuerstenau, S Raghavan Flotation--A. M. Gaudin Memorial, 1976 | 92 | 1976 |
| Minimization of chemical-mechanical planarization (CMP) defects and post-CMP cleaning L Zhang, S Raghavan, M Weling Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1999 | 88 | 1999 |
| Gentamicin sulfate attachment and release from anodized Ti‐6Al‐4V orthopedic materials DS Dunn, S Raghavan, RG Volz Journal of biomedical materials research 27 (7), 895-900, 1993 | 73 | 1993 |
| Factors affecting the flotation recovery of molybdenite from porphyry copper ores S Raghavan, LL Hsu International Journal of Mineral Processing 12 (1-3), 145-162, 1984 | 71 | 1984 |
| Electrochemical investigation of copper contamination on silicon wafers from HF solutions JS Jeon, S Raghavan, HG Parks, JK Lowell, I Ali Journal of The Electrochemical Society 143 (9), 2870, 1996 | 67 | 1996 |
| Quantitative analysis of adsorbed serum albumin on segmented polyurethane using FT-IR/ATR spectroscopy JS Jeon, RP Sperline, S Raghavan Applied Spectroscopy 46 (11), 1644-1648, 1992 | 63 | 1992 |
| Etching of zirconium oxide, hafnium oxide, and hafnium silicates in dilute hydrofluoric acid solutions V Lowalekar, S Raghavan Journal of materials research 19 (4), 1149-1156, 2004 | 60 | 2004 |
| Electrochemical impedance spectroscopy of copper deposition on silicon from dilute hydrofluoric acid solutions X Cheng, G Li, EA Kneer, B Vermeire, HG Parks, S Raghavan, JS Jeon Journal of the Electrochemical Society 145 (1), 352, 1998 | 60 | 1998 |
| Characterization of highly hydrophobic coatings deposited onto pre-oxidized silicon from water dispersible organosilanes AM Almanza-Workman, S Raghavan, S Petrovic, B Gogoi, P Deymier, ... Thin Solid Films 423 (1), 77-87, 2003 | 55 | 2003 |
| Deposition of copper from a buffered oxide etchant onto silicon wafers KK Yoneshige, HG Parks, S Raghavan, JB Hiskey, PJ Resnick Journal of the Electrochemical Society 142 (2), 671, 1995 | 55 | 1995 |
| Post-chemical mechanical planarization clean-up process using post-polish scrubbing SR Roy, I Ali, GB Shinn, RC Shah, SH Peterman, S Raghavan US Patent 5,996,594, 1999 | 54 | 1999 |
