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Muhammad Usman, PhD
Titolo
Citata da
Citata da
Anno
Time-resolved luminescence studies of proton-implanted GaN
A Pinos, S Marcinkevičius, M Usman, A Hallén
Applied Physics Letters 95 (11), 2009
502009
Device design assessment of 4H–SiC n-IGBT–A simulation study
M Usman, M Nawaz
Solid-state electronics 92, 5-11, 2014
472014
High-k Dielectrics for 4H-Silicon Carbide: Present Status and Future Perspective
A Siddiqui, RY Khosa, M Usman
Journal of Materials Chemistry C 9, 5055-5081, 2021
382021
Toward the understanding of stacked Al-based high-k dielectrics for passivation of 4H-SiC devices
M Usman, A Hallén, T Pilvi, A Schöner, M Leskelä
Journal of The Electrochemical Society 158 (1), H75, 2010
362010
Influence of annealing environment on the ALD-Al₂O₃/4H-SiC interface studied through XPS
M Usman, M Arshad, SS Suvanam, A Hallén
Journal of Physics D: Applied Physics 51, 105111, 2018
352018
Copper phthalocyanine and metal free phthalocyanine bulk heterojunction photodetector
A Farooq, KS Karimov, N Ahmed, T Ali, MK Alamgir, M Usman
Physica B: Condensed Matter 457, 17-21, 2015
342015
Radiation-Hard Dielectrics for 4H–SiC: A Comparison Between SiO₂ and Al₂O₃
M Usman, A Hallén
IEEE Electron Device Letters 32 (12), 1653-1655, 2011
32*2011
HfO₂/Al₂O₃ bilayered high-k dielectric for passivation and gate insulator in 4H-SiC devices
M Usman, C Henkel, A Hallén
ECS Journal of Solid State Science and Technology 2 (8), N3087, 2013
28*2013
Structural, optical, and electrical characteristics of AlN: Ho thin films irradiated with 700 keV protons
M Usman, M Naeem, N ul Hassan, M Maqbool, I Ahmad, I Ahmad, ...
Applied Surface Science 357, 179-183, 2015
242015
Improved interface and electrical properties of atomic layer deposited Al₂O₃/4H-SiC
SS Suvanam, M Usman, D Martin, MG Yazdi, M Linnarsson, A Tempez, ...
Applied Surface Science 433, 108-115, 2018
222018
Surface recombination investigation in thin 4H-SiC layers
K Gulbinas, V Grivickas, HP Mahabadi, M Usman, A Hallen
Materials Science 17 (2), 119-124, 2011
222011
Low-temperature annealing of radiation-induced degradation in 4H-SiC bipolar junction transistors
A Hallén, M Nawaz, C Zaring, M Usman, M Domeij, M Östling
IEEE Electron Device Letters 31 (7), 707-709, 2010
222010
Re-crystallization of ITO films after carbon irradiation
M Usman, S Khan, M Khan, T Abbas
Applied Surface Science 392, 863-866, 2017
202017
Ion implantation induced nitrogen defects in GaN
M Usman, A Hallén, A Nazir
Journal of Physics D: Applied Physics 48 (45), 455107, 2015
202015
Synthesis and Characterization of WO₃/GO Nanocomposites for Antimicrobial Properties
T Muzaffar, RY Khosa, U Iftikhar, RM Obodo, S Sajjad, M Usman
Journal of Cluster Science 33, 1987-1996, 2022
19*2022
Investigating Local Structure of Ion-Implanted (Ni2+) and Thermally Annealed Rock Salt CoO Film by EXAFS Simulation Using Evolutionary Algorithm
LU Khan, N Jabeen, I Jabbar, S Jamil, A Kanwal, Z Akhtar, M Usman, ...
ACS Applied Energy Materials 4, 2049−2055, 2021
192021
Improving the quality of Al₂O₃/4H-SiC interface for device applications
M Usman, SS Suvanam, MK Linnarsson, A Hallén
Materials Science in Semiconductor Processing 81, 118-121, 2018
192018
Passivation of SiC device surfaces by aluminum oxide
A Hallén, M Usman, S Suvanam, C Henkel, D Martin, MK Linnarsson
IOP Conference Series: Materials Science and Engineering 56 (1), 012007, 2014
192014
Substitutional carbon doping of hexagonal multi-walled boron nitride nanotubes (h-MWBNNTs) via ion implantation
I Ahmad, M Usman, S Rabab Naqvi, J Iqbal, L Bo, Y Long, CF Dee, A Baig
Journal of nanoparticle research 16, 1-8, 2014
192014
Radiation Tolerance Comparison of Silicon and 4H-SiC Schottky Diodes
A Siddiqui, M Usman
Materials Science in Semiconductor Processing 135, 106085, 2021
182021
Il sistema al momento non può eseguire l'operazione. Riprova più tardi.
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