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daniel Schram
daniel Schram
Professor Physics emeritus
Email verificata su tue.nl
Titolo
Citata da
Citata da
Anno
Gas temperature determination from rotational lines in non-equilibrium plasmas: a review
PJ Bruggeman, N Sadeghi, DC Schram, V Linss
Plasma Sources Science and Technology 23 (2), 023001, 2014
5592014
Extreme hydrogen plasma densities achieved in a linear plasma generator
GJ Van Rooij, VP Veremiyenko, WJ Goedheer, B De Groot, AW Kleyn, ...
Applied physics letters 90 (12), 2007
2032007
Plasma chemistry aspects of deposition using an expanding thermal plasma
MCM Van de Sanden, RJ Severens, WMM Kessels, RFG Meulenbroeks, ...
Journal of applied physics 84 (5), 2426-2435, 1998
1721998
A combined Thomson–Rayleigh scattering diagnostic using an intensified photodiode array
MCM Van de Sanden, GM Janssen, JM De Regt, DC Schram, ...
Review of scientific instruments 63 (6), 3369-3377, 1992
1601992
High sensitivity imaging Thomson scattering for low temperature plasma
HJ Van Der Meiden, RS Al, CJ Barth, AJH Donné, R Engeln, ...
Review of Scientific Instruments 79 (1), 2008
1472008
Physics of non-equilibrium plasmas
VM Lelevkin, DK Otorbaev, DC Schram
North-Holland Publishing Company, 1992
1461992
Hydrogenated amorphous silicon deposited at very high growth rates by an expanding plasma
WMM Kessels, RJ Severens, AHM Smets, BA Korevaar, GJ Adriaenssens, ...
Journal of Applied Physics 89 (4), 2404-2413, 2001
1452001
The continuum emission of an arc plasma
ATM Wilbers, GMW Kroesen, CJ Timmermans, DC Schram
Journal of Quantitative Spectroscopy and Radiative Transfer 45 (1), 1-10, 1991
1361991
On the growth mechanism of a-Si: H
WMM Kessels, AHM Smets, DC Marra, ES Aydil, DC Schram, ...
Thin Solid Films 383 (1-2), 154-160, 2001
1272001
A theoretical study and experimental investigation of non-LTE phenomena in an inductively-coupled argon plasma—I. Characterization of the discharge
I Raaijmakers, P Boumans, B Van Der Sijde, DC Schram
Spectrochimica Acta Part B: Atomic Spectroscopy 38 (5-6), 697-706, 1983
1231983
Argon-hydrogen plasma jet investigated by active and passive spectroscopic means
RFG Meulenbroeks, AJ Van Beek, AJG Van Helvoort, ...
Physical Review E 49 (5), 4397, 1994
1161994
A two‐dimensional nonequilibrium model of cascaded arc plasma flows
JJ Beulens, D Milojevic, DC Schram, PM Vallinga
Physics of Fluids B: Plasma Physics 3 (9), 2548-2557, 1991
1161991
Recombination of argon in an expanding plasma jet
MCM Van de Sanden, JM De Regt, DC Schram
Physical review E 47 (4), 2792, 1993
1151993
Detailed study of the plasma-activated catalytic generation of ammonia in N2-H2 plasmas
JH Van Helden, W Wagemans, G Yagci, RAB Zijlmans, DC Schram, ...
Journal of applied physics 101 (4), 2007
1102007
Anomalous fast recombination in hydrogen plasmas involving rovibrational excitation
MJ De Graaf, R Severens, RP Dahiya, MCM Van de Sanden, DC Schram
Physical Review E 48 (3), 2098, 1993
1101993
Optical and mechanical properties of plasma‐beam‐deposited amorphous hydrogenated carbon
J Gielen, PRM Kleuskens, MCM Van de Sanden, LJ Van Ijzendoorn, ...
Journal of applied physics 80 (10), 5986-5995, 1996
1081996
Spectroscopic study of an atmospheric pressure dc glow discharge with a water electrode in atomic and molecular gases
T Verreycken, DC Schram, C Leys, P Bruggeman
Plasma Sources Science and Technology 19 (4), 045004, 2010
1072010
Description of a flowing cascade arc plasma
GMW Kroesen, DC Schram, JCM De Haas
Plasma chemistry and plasma processing 10, 531-551, 1990
1031990
Formation of cationic silicon clusters in a remote silane plasma and their contribution to hydrogenated amorphous silicon film growth
WMM Kessels, CM Leewis, MCM Van De Sanden, DC Schram
Journal of applied physics 86 (7), 4029-4039, 1999
991999
On the possibilities of straightforward characterization of plasma activated water
W Hoeben, PP Van Ooij, DC Schram, T Huiskamp, AJM Pemen, P Lukeš
Plasma Chemistry and Plasma Processing 39, 597-626, 2019
982019
Il sistema al momento non può eseguire l'operazione. Riprova più tardi.
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