| Effect of particle size of chemical mechanical polishing slurries for enhanced polishing with minimal defects GB Basim, JJ Adler, U Mahajan, RK Singh, BM Moudgil Journal of the Electrochemical Society 147 (9), 3523, 2000 | 289 | 2000 |
| Effect of soft agglomerates on CMP slurry performance GB Basim, BM Moudgil Journal of Colloid and Interface Science 256 (1), 137-142, 2002 | 160 | 2002 |
| Role of interaction forces in controlling the stability and polishing performance of CMP slurries GB Basim, IU Vakarelski, BM Moudgil Journal of colloid and interface science 263 (2), 506-515, 2003 | 132 | 2003 |
| Application of chemical mechanical polishing process on titanium based implants Z Ozdemir, A Ozdemir, GB Basim Materials Science and Engineering: C 68, 383-396, 2016 | 106 | 2016 |
| Fundamentals of slurry design for CMP of metal and dielectric materials RK Singh, SM Lee, KS Choi, GB Basim, W Choi, Z Chen, BM Moudgil MRS bulletin 27 (10), 752-760, 2002 | 93 | 2002 |
| Particle size analysis on wide size distribution powders; effect of sampling and characterization technique GB Basim, M Khalili Advanced Powder Technology 26 (1), 200-207, 2015 | 59 | 2015 |
| Passivation of integrated circuits containing ferroelectric capacitors and hydrogen barriers SR Summerfelt, TS Moise, GB Basim US Patent 8,384,190, 2013 | 32 | 2013 |
| Strategies for optimal chemical mechanical polishing (CMP) slurry design G Bahar Basim, SC Brown, IU Vakarelski, BM Moudgil Journal of dispersion science and technology 24 (3-4), 499-515, 2003 | 32 | 2003 |
| Stability and reliability of Ti/TiN as a thin film resistor YL Cheng, BJ Wei, FH Shih, YL Wang ECS Journal of Solid State Science and Technology 2 (1), Q12, 2012 | 24 | 2012 |
| Characterization and antibacterial properties of nanoboron powders and nanoboron powder coated textiles W Akbar, MR Noor, K Kowal, T Syed, T Soulimane, GB Basim Advanced Powder Technology 28 (2), 596-610, 2017 | 22 | 2017 |
| Effect of slurry aging on stability and performance of chemical mechanical planarization process GB Basim Advanced Powder Technology 22 (2), 257-265, 2011 | 22 | 2011 |
| Characterization of nano-scale protective oxide films: application on metal chemical mechanical planarization A Karagoz, V Craciun, GB Basim ECS Journal of Solid State Science and Technology 4 (2), P1, 2014 | 19 | 2014 |
| Tailoring Silica Nanotribology for CMP Slurry Optimization: Ca2+ Cation Competition in C12TAB Mediated Lubrication IU Vakarelski, SC Brown, GB Basim, YI Rabinovich, BM Moudgil ACS applied materials & interfaces 2 (4), 1228-1235, 2010 | 19 | 2010 |
| Slurry design for chemical mechanical polishing GB Basim, BM Moudgil KONA Powder and Particle journal 21, 178-184, 2003 | 19 | 2003 |
| A fundamental approach to electrochemical analyses on chemically modified thin films for barrier CMP optimization R Yagan, GB Basim ECS Journal of Solid State Science and Technology 8 (5), P3118, 2019 | 15 | 2019 |
| Effect of chemical mechanical polishing on surface nature of titanium implants FT-IR and wettability data of titanium implants surface after chemical mechanical polishing … Z Ozdemir, GB Basim Data in Brief 10, 20-25, 2017 | 14 | 2017 |
| Predictive method to improve within wafer CMP uniformity through optimized pad conditioning GB Basim, S Kincal, EC Davis US Patent 7,899,571, 2011 | 14 | 2011 |
| Hydrogen passivation of integrated circuits GB Basim, SR Summerfelt, TS Moise US Patent 8,669,644, 2014 | 13 | 2014 |
| Nano-boron as an antibacterial agent for functionalized textiles W Akbar, A Karagoz, GB Basim, M Noor, T Syed, J Lum, M Unluagac MRS Online Proceedings Library 1793, 53-57, 2015 | 12 | 2015 |
| Controlling germanium CMP selectivity through slurry mediation by surface active agents A Karagoz, GB Basim ECS Journal of Solid State Science and Technology 4 (11), P5097, 2015 | 12 | 2015 |
Zeynep Özdemir GülerOzyegin UniversityEmail verificata su testinium.com