The IMEC clean: A new concept for particle and metal removal on Si surfaces M Meuris, PW Mertens, A Opdebeeck, HF Schmidt, M Depas, G Vereecke, ... Solid State Technology 38 (7), 109-113, 1995 | 180 | 1995 |
Capturing wetting states in nanopatterned silicon XM Xu, G Vereecke, C Chen, G Pourtois, S Armini, N Verellen, WK Tsai, ... Acs Nano 8 (1), 885-893, 2014 | 66 | 2014 |
Superhydrophobic breakdown of nanostructured surfaces characterized in situ using ATR–FTIR N Vrancken, S Sergeant, G Vereecke, G Doumen, F Holsteyns, H Terryn, ... Langmuir 33 (15), 3601-3609, 2017 | 35 | 2017 |
In-situ ATR-FTIR for dynamic analysis of superhydrophobic breakdown on nanostructured silicon surfaces N Vrancken, J Li, S Sergeant, G Vereecke, G Doumen, F Holsteyns, ... Scientific reports 8 (1), 11637, 2018 | 28 | 2018 |
High-frequency acoustic for nanostructure wetting characterization S Li, S Lamant, J Carlier, M Toubal, P Campistron, X Xu, G Vereecke, ... Langmuir 30 (25), 7601-7608, 2014 | 23 | 2014 |
Partial wetting of aqueous solutions on high aspect ratio nanopillars with hydrophilic surface finish G Vereecke, XM Xu, WK Tsai, H Yang, S Armini, T Delande, G Doumen, ... ECS Journal of Solid State Science and Technology 3 (1), N3095, 2014 | 21 | 2014 |
Full wetting of plasmonic nanopores through two-component droplets C Chen, XM Xu, Y Li, H Jans, P Neutens, S Kerman, G Vereecke, ... Chemical Science 6 (11), 6564-6571, 2015 | 16 | 2015 |
Wetting challenges in cleaning of high aspect ratio nano-structures XM Xu, G Vereecke, E Van den Hoogen, J Smeers, S Armini, T Delande, ... Solid state phenomena 195, 235-238, 2013 | 16 | 2013 |
Wet etching of TiN in 1-D and 2-D confined nano-spaces of FinFET transistors G Vereecke, H De Coster, S Van Alphen, P Carolan, H Bender, K Willems, ... Microelectronic engineering 200, 56-61, 2018 | 14 | 2018 |
Pattern collapse of high-aspect-ratio silicon nanostructures-A parametric study N Vrancken, G Vereecke, S Bal, S Sergeant, G Doumen, F Holsteyns, ... Solid State Phenomena 255, 136-140, 2016 | 13 | 2016 |
Aging phenomena in the removal of nano-particles from Si wafers G Vereecke, J Veltens, KD Xu, A Eitoku, K Sano, S Arnauts, K Kenis, ... Solid State Phenomena 134, 155-158, 2008 | 12 | 2008 |
Effect of 1-D Nano-Confinement on the Kinetics of a Click-Chemistry Surface Reaction Used in Biosensors G Vereecke, H Debruyn, Q De Keyser, R Vos, A Dutta, F Holsteyns Solid State Phenomena 282, 182-189, 2018 | 11 | 2018 |
Some critical issues in pattern collapse prevention and repair XM Xu, N Vrancken, G Vereecke, S Suhard, G Pourtois, F Holsteyns Solid State Phenomena 255, 147-151, 2016 | 9 | 2016 |
Cleaning of High Aspect Ratio STI Structures for Advanced Logic Devices by Implementation of a Surface Modification Drying Technique F Sebaai, G Vereecke, XM Xu, S Baudot, F Amemiya, K Komori, ... Solid State Phenomena 282, 190-193, 2018 | 6 | 2018 |
Wetting behavior of aqueous solutions on high aspect ratio nanopillars with hydrophilic surface finish G Vereecke, XM Xu, WK Tsai, H Yang, S Armini, T Delande, G Doumen, ... ECS Transactions 58 (6), 171, 2013 | 6 | 2013 |
Evaluation of a dry laser cleaning process for the removal of surface particles G Vereecke, E Röhr, M Heyns | 5 | 1998 |
Wetting of deep hydrophilic nanoholes by aqueous solutions G Vereecke, A Darcos, H Iino, F Holsteyns, EA Sanchez Microelectronic Engineering 239, 111515, 2021 | 3 | 2021 |
The haze of a wafer: A new approach to monitor nano-sized particles K KENIS, PW MERTENS, MM HEYNS¹, C VINCKIER Particles on Surfaces: Detection, Adhesion and Removal, Volume 8 8, 47, 2003 | 3 | 2003 |
RMG Patterning by Digital Wet Etching of Polycrystalline Metal Films Y Oniki, G Vereecke, E Dentoni Litta, LÅ Ragnarsson, H Dekkers, ... Solid State Phenomena 282, 132-138, 2018 | 2 | 2018 |
Exploring wetting dynamics on superhydrophobic nanopatterned surfaces using atr-ftir N Vrancken, S Sergeant, G Vereecke, F Holsteyns, H Terryn, S De Gendt, ... Solid State Phenomena 282, 175-181, 2018 | 2 | 2018 |